Product Code : 3D-Ta-CU-PO1
We provide spherical tantalum (Ta) powder with high purity hypoxia, high sphericity, smooth surface, no satellite, uniform particle size distribution, excellent flow performance, and high loose density and vibrational density. With its excellent biocompatibility, tantalum implants formed by 3D printing have the closest elastic modulus to human cartilage tissue and are the most ideal orthopedic implants. Spherical tantalum powder is suitable for laser/electron beam augmentation, hot isostatic pressing, laser cladding, hot/cold spraying, and so on.
Tantalum Powder has excellent thermal and electrical conductivity properties. Tantalum Powder has the fourth-highest melting point of all metals and is highly suitable for applications in optics and electronics. Tantalum Powder also has great fatigue resistance, making it more robust than glass and graphic systems. Tantalum powder is produced in high purity minimally sized grains and also can be used to produce sputtering targets. is highly suitable for numerous applications in the optics and electronics industries. It is used in alloying, electronics, sputtering targets, capacitors and super alloys.
Please contact us if you need customized services. We will contact you with the price and availability in 24 hours.
| Product | Product Code | Purity | Size | Contact Us |
Synonyms
Ta spherical particles, tantalum spherical particles, tantalum spherical powders, tantalum metal spherical powder
Spherical Tantalum Powder characteristics
High purity (≥99.9%)
low oxygen (≤300ppm),
high sphericity (≥98%)
smooth surface
No satellite spheres,
uniform particle size distribution,
and excellent flow properties (≤6.0s/50g),
And high bulk density (≥9.5g/cm3) and tap density (≥10.5g/cm3).
Spherical Tantalum Powder Particle Size
0-15μm, 5-25μm, 15-45μm, 15-53μm, 45-75μm, 45-105μm, 45-150μm, 75-150μm.
(Various granularities can be customized according to customer requirements)
Spherical Tantalum Powder Applicable processes
Laser/electron beam additive manufacturing (SLM/EBM, 3D printing)
Direct laser deposition (DLD)
Powder hot isostatic pressing (HIP)
Metal injection molding (MIM)
Powder metallurgy (PM)
Laser cladding (LC), etc.
Spherical Tantalum Powder Chemical Composition
| Chemical Composition: | Wt % |
| Ta | ≥ 99.95 |
| Ti | ＜0.01 |
| Mo | ＜0.005 |
| W | ＜0.01 |
| Nb | ＜0.01 |
| Si | ＜0.005 |
| Ni | ＜0.005 |
| Fe | ＜0.01 |
| Mg | ＜0.001 |
| Cu | ＜0.001 |
| Al | ＜0.001 |
| Ca | ＜0.001 |
| Gas Impurites | |
| O | ≤0.03 |
| N | ≤0.001 |
| C | ≤0.001 |
| H | ≤0.001 |
Spherical Tantalum Powder Physical Properties
| Form: | Powder | ||||
| Color: | Black | ||||
| Melting Point: | 2996°C | ||||
| Boiling Point: | 5425°C | ||||
| Density: | 16.68 g/cm3 | ||||
| Density (g/cm3) | Hall Flow Rate (s/50g) | ||||
| Apparent Density | Tap Density | Value | |||
| >9.5 | >10.5 | </= 6.5 | |||
Spherical Tantalum Powder Particle Size Description
● 0-15μm (D10=3~5μm, D50=6~10μm, D90=12~14μm)
● 5-25μm (D10=5~10μm, D50=15~20μm, D90=20~25μm)
● 15-45μm (D10=15~20μm, D50=25~30μm, D90=35~40μm)
● 15-53μm (D10=15~20μm, D50=25~35μm, D90=45~50μm)
● 45-75μm (D10=45~55μm, D50=55~65μm, D90=70~75μm)
● 45-105μm (D10=50~60μm, D50=75~85μm, D90=95~105μm)
● 45-150μm (D10=55~70μm, D50=110~120μm, D90=140~150μm)
● 75-150μm (D10=80~90μm, D50=110~125μm, D90=135~150μm)
Spherical Tantalum Powder Packaging
Standard Packing: Vacuum packaging, 1 kg/bag or 2 kg/bag. Iron drums lined with a plastic bag, 25 kg/drum. Special package is available on request.
APPLICATION
Aerospace, Alloys, Electronics, Medical, Military, Defense, Optics, Medical Device
Chemical Identifiers
| Linear Formula | Ta |
| CAS | 7440-25-7 |
| MDL Number | MFCD00011252 |
| EC No. | 231-135-5 |
| Beilstein/Reaxys No. | N/A |
| Pubchem CID | 23956 |
| SMILES | [Ta] |
| InchI Identifier | InChI=1S/Ta |
| InchI Key | GUVRBAGPIYLISA-UHFFFAOYSA-N |
