Product Code : EM-Ti3O5-5N-Cu

Titanium Pentoxide, also known as Ti3O5, is a metal oxide powder used as an evaporation material in thin film deposition processes. It is composed of a titanium oxide lattice structure with oxygen available to form bonds with other substances.

Product Code : EM-TiO-5N-Cu

Titanium monoxide (TiO) is an inorganic compound and evaporation material used in thin film deposition. It is a white powder that is insoluble in water and has a molecular weight of 79.9. TiO is a versatile material used in a variety of industrial and scientific processes such as battery fabrication, optical filters, and semiconductor devices.

Product Code : EM-TiO2-5N-Cu

Titanium dioxide (TiO2) is a crystalline white pigment material, which contains a variety of uses in many industries, including in cosmetics, automotive and aerospace applications. Due to its excellent dielectric properties, titanium dioxide (TiO2) is commonly used as an evaporation material in thin-film deposition.

Product Code : EM-Ta2O5-5N-Cu

Tantalum pentoxide (Ta2O5) is a dielectric evaporation material that is commonly used in thin film deposition processes. It is a hard, inert material that is insoluble in water and non-volatile.

Product Code : EM-SiO-5N-Cu

Silicon monoxide (SiO) is an inorganic, white solid substance with a silvery sheen. It is used as an evaporative material in Thin Film Deposition (TFD) processes. It is sometimes referred to as monosilicon dioxide or quasisilicon dioxide. SiO is found in nature primarily as sand and quartz, but can also be synthesized in laboratories.

Product Code : EM-SiO2-5N-Cu

Silicon dioxide (SiO2) is a highly useful evaporation material used in vacuum systems. It is the most common oxide used in thin film deposition and has excellent thermal stability and optical properties. This makes it ideal for use in a variety of applications, such as optical coatings, dielectric films, and transparent coatings.