Product Code : EM-ZnSe-5N-Cu

Zinc Selenide (ZnSe) is a wide gap II-VI semiconductor material and is used for producing windows, lenses, prisms, and mirrors for infrared spectroscopy and laser applications. A thin film of ZnSe is deposited onto a substrate, typically by physical vapor deposition (PVD), also known as evaporation.

Product Code : EM-TiN-5N-Cu

Titanium nitride (TiN) is a vapor deposition material used for a variety of applications, including optical coatings, microelectromechanical systems (MEMS), and surface hardening. It is an attractive material for many applications due to its excellent reflection, high hardness, low wear characteristics, and low-temperature processability.

Product Code : EM-SrTiO3-5N-Cu

Strontium titanate (SrTiO3) is an evaporative material used in various industrial applications. SrTiO3 is a ceramic material that has a high thermal stability, high electrical insulation and excellent mechanical strength.

Product Code : EM-Si3N4-5N-Cu

Silicon nitride is a ceramic material composed of silicon and nitrogen. It is commonly used for evaporation in vacuum systems and can be used for physical vapor deposition (PVD), chemical vapor deposition (CVD), and ion beam assisted deposition (IBAD).

Product Code : EM-SiC-5N-Cu

​Silicon Carbide evaporation material from ATT is a carbide ceramic evaporation material with the chemical formula SiC. High-purity SiC evaporation materials play a huge role in deposition processes to ensure high-quality deposited film.

Product Code : EM-PrTiO3-4N-Cu

Praseodymium titanate (PrTiO3) is a transition metal oxide with a general formula of M2+Ti4+O3. It is a cubic material which crystallizes in the parent structure with the space group Pm-3m. PrTiO3 typically has an 8 atom basis with two equivalent Pr3+ cations in the octahedral sites and four equivalent Ti4+ cations in the tetrahedral sites.