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Silicon Dioxide (SiO2) Evaporation Material

Product Code : EM-SiO2-5N-Cu

Silicon dioxide (SiO2) is a highly useful evaporation material used in vacuum systems. It is the most common oxide used in thin film deposition and has excellent thermal stability and optical properties. This makes it ideal for use in a variety of applications, such as optical coatings, dielectric films, and transparent coatings. In addition, its high melting temperature makes it an excellent choice for encapsulation and passivation layers in electronics. Since SiO2 has low porosity and is chemically stable, it is used in a wide range of manufacturing processes, such as ion implantation and sputtering.

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Product Product Code Purity Size Contact Us
Silicon Dioxide (SiO2) Evaporation Material EM-SiO2-2N-Cu 99% Customize
Silicon Dioxide (SiO2) Evaporation Material EM-SiO2-3N-Cu 99.9% Customize
Silicon Dioxide (SiO2) Evaporation Material EM-SiO2-4N-Cu 99.99% Customize
Silicon Dioxide (SiO2) Evaporation Material EM-SiO2-5N-Cu 99.999% Customize

Product Information

Silicon dioxide (SiO2) is a highly useful evaporation material used in vacuum systems. It is the most common oxide used in thin film deposition and has excellent thermal stability and optical properties. This makes it ideal for use in a variety of applications, such as optical coatings, dielectric films, and transparent coatings. In addition, its high melting temperature makes it an excellent choice for encapsulation and passivation layers in electronics. Since SiO2 has low porosity and is chemically stable, it is used in a wide range of manufacturing processes, such as ion implantation and sputtering.

Material Type: Silicon dioxide
Symbol: SiO2

CAS :

 7631-86-9


Synonyms

N/A





Silicon Dioxide (SiO2) Evaporation Material Specification

Size:Pellet / Wire / Rod / Slug / Tablet / Customized

Per your request or drawing

We can customized as required


Properties(Theoretical)

Compound FormulaO2Si
Molecular Weight60.09
AppearanceWhite Powder
Melting Point1,600° C   (2,912° F)
Boiling Point2,230° C   (4,046° F)
Density2533 kg/m-3
Solubility in H2ON/A
Exact Mass59.9668 g/mol
Monoisotopic Mass59.967 Da






Application of Silicon Dioxide (SiO2)Evaporation Material

• Used in deposition processes including semiconductor deposition, chemical vapor deposition (CVD) and physical vapor deposition (PVD)
• Used for optics including wear protection, decorative coatings, and displays.


Packing of Silicon Dioxide (SiO2) Evaporation Material

Standard Packing:

Typical bulk packaging includes palletized plastic 5 gallon/25 kg. pails, fiber and steel drums to 1 ton super sacks in full container (FCL) or truck load (T/L) quantities. Research and sample quantities and hygroscopic, oxidizing or other air sensitive materials may be packaged under argon or vacuum. Solutions are packaged in polypropylene, plastic or glass jars up to palletized 440 gallon liquid totes Special package is available on request. They are vacuum sealed. The MSDS and Material Certification Sheets will be packed with the product.

ATTs’Silicon Dioxide (SiO2) Evaporation Material is carefully handled to minimize damage during storage and transportation and to preserve the quality of our products in their original condition.










Chemical Identifiers

Linear FormulaSiO2
MDL NumberMFCD00011232
EC No.262-373-8
Beilstein/Reaxys No.N/A
Pubchem CIDN/A
IUPAC NameDioxosilane
SMILESO=[Si]=O
InchI IdentifierInChI=1S/O2Si/c1-3-2
InchI KeyVYPSYNLAJGMNEJ-UHFFFAOYSA-N




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