Product Code : EM-Ta2O5-5N-Cu
Tantalum pentoxide (Ta2O5) is a dielectric evaporation material that is commonly used in thin film deposition processes. It is a hard, inert material that is insoluble in water and non-volatile. It is an excellent material for use in the fabrication of capacitors due to its high dielectric constant, high breakdown voltage, and good dielectric strength. It has recently become very popular in the semiconductor industry due to its low thermal expansion coefficient and excellent compatibility with Si-based integrated circuits. Additionally, Ta2O5 can be used for the fabrication of a wide range of thin films, including thin-film transistors, dielectric mirrors, and optical coatings.
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Product Information
Tantalum pentoxide (Ta2O5) is a dielectric evaporation material that is commonly used in thin film deposition processes. It is a hard, inert material that is insoluble in water and non-volatile. It is an excellent material for use in the fabrication of capacitors due to its high dielectric constant, high breakdown voltage, and good dielectric strength. It has recently become very popular in the semiconductor industry due to its low thermal expansion coefficient and excellent compatibility with Si-based integrated circuits. Additionally, Ta2O5 can be used for the fabrication of a wide range of thin films, including thin-film transistors, dielectric mirrors, and optical coatings.
Material Type: Tantalum pentoxide
Symbol: Ta2O5
Synonyms
N/A
Tantalum Pentoxide (Ta2O5) Evaporation Material Specification
Size:Pellet / Wire / Rod / Slug / Tablet / Customized
Per your request or drawing
We can customized as required
Properties(Theoretical)
Compound Formula O5Ta2 Molecular Weight 441.89 Appearance White Powder Melting Point 1872 °C Boiling Point N/A Density 8.2 g/mL at 25 °C Solubility in H2O N/A Exact Mass 441.870565 Monoisotopic Mass 441.870565
Application of Tantalum Pentoxide (Ta2O5) Evaporation Material
• Used in deposition processes including semiconductor deposition, chemical vapor deposition (CVD) and physical vapor deposition (PVD)
• Used for optics including wear protection, decorative coatings, and displays.
Packing of Tantalum Pentoxide (Ta2O5) Evaporation Material
Standard Packing:
Typical bulk packaging includes palletized plastic 5 gallon/25 kg. pails, fiber and steel drums to 1 ton super sacks in full container (FCL) or truck load (T/L) quantities. Research and sample quantities and hygroscopic, oxidizing or other air sensitive materials may be packaged under argon or vacuum. Solutions are packaged in polypropylene, plastic or glass jars up to palletized 440 gallon liquid totes Special package is available on request. They are vacuum sealed. The MSDS and Material Certification Sheets will be packed with the product.
ATTs’Tantalum Pentoxide (Ta2O5) Evaporation Material is carefully handled to minimize damage during storage and transportation and to preserve the quality of our products in their original condition.
Chemical Identifiers
Linear Formula | Ta2O5 |
MDL Number | MFCD00011254 |
EC No. | 215-238-2 |
Beilstein/Reaxys No. | N/A |
Pubchem CID | 518712 |
IUPAC Name | dioxotantaliooxy(dioxo)tantalum |
SMILES | O=[Ta](=O)O[Ta](=O)=O |
InchI Identifier | InChI=1S/5O.2Ta |
InchI Key | PBCFLUZVCVVTBY-UHFFFAOYSA-N |