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Nano Hafnium Oxide Powder

Product Code : ME-HfO2-5N-PO

Nano Hafnium Oxide Powder is an intermediate in some processes that give hafnium metal. Hafnia is used in optical coatings, and as a high-κ dielectric in DRAM capacitors and in advanced metal-oxide-semiconductor devices. Because of its very high melting point, hafnia is also used as a refractory material in the insulation of such devices as thermocouples, where it can operate at temperatures up to 2500℃. Multilayered films of hafnium dioxide, silica, and other materials have been developed for use in the passive cooling of buildings.

ATT specializes in producing spray dry and non-spray dry high purity Hafnium Oxide Powder with the smallest possible average grain sizes for use in preparation of pressed and bonded sputtering targets and in Chemical Vapor Deposition (CVD) and Physical Vapor Deposition (PVD) processes including Thermal and Electron Beam (E-Beam) Evaporation, Low Temperature Organic Evaporation, Atomic Layer Deposition (ALD), Metallic-Organic and Chemical Vapor Deposition (MOCVD). Powders are also useful in any application where high surface areas are desired such as water treatment and in fuel cell and solar applications. Nanoparticles also produce very high surface areas. Our standard powder particle sizes average in the range of - 325 mesh, - 100 mesh, 10-50 microns and submicron (< 1 micron) and our spray dried powder with binder provides an extremely narrow particle size distribution (PSD) for use in thermal and plasma spray guns and other coating applications. We can also provide many materials in the nanoscale range.

ATT is a professional supplier of Nano Hafnium Oxide Powder, We also produce disc, granules, ingot, pellets, pieces, powder, rod, wire, sputtering target and in numerous other forms and custom shapes. Other shapes are available by request.

Please contact us if you need customized services. We will contact you with the price and availability in 24 hours.

Product Product Code Purity Size Contact Us
Nano Hafnium Oxide Powder ME-HfO2-2N-PO 99% Customized
Nano Hafnium Oxide Powder ME-HfO2-3N-PO 99.9% Customized
Nano Hafnium Oxide Powder ME-HfO2-4N-PO 99.99% Customized
Nano Hafnium Oxide Powder ME-HfO2-5N-PO 99.999% Customized

Product Information

Nano Hafnium Oxide Powder is an intermediate in some processes that give hafnium metal. Hafnia is used in optical coatings, and as a high-κ dielectric in DRAM capacitors and in advanced metal-oxide-semiconductor devices. Because of its very high melting point, hafnia is also used as a refractory material in the insulation of such devices as thermocouples, where it can operate at temperatures up to 2500℃. Multilayered films of hafnium dioxide, silica, and other materials have been developed for use in the passive cooling of buildings.

ATT specializes in producing spray dry and non-spray dry high purity Hafnium Oxide Powder with the smallest possible average grain sizes for use in preparation of pressed and bonded sputtering targets and in Chemical Vapor Deposition (CVD) and Physical Vapor Deposition (PVD) processes including Thermal and Electron Beam (E-Beam) Evaporation, Low Temperature Organic Evaporation, Atomic Layer Deposition (ALD), Metallic-Organic and Chemical Vapor Deposition (MOCVD). Powders are also useful in any application where high surface areas are desired such as water treatment and in fuel cell and solar applications. Nanoparticles also produce very high surface areas. Our standard powder particle sizes average in the range of - 325 mesh, - 100 mesh, 10-50 microns and submicron (< 1 micron) and our spray dried powder with binder provides an extremely narrow particle size distribution (PSD) for use in thermal and plasma spray guns and other coating applications. We can also provide many materials in the nanoscale range.

ATT is a professional supplier of Nano Hafnium Oxide Powder, We also produce disc, granules, ingot, pellets, pieces, powder, rod, wire, sputtering target and in numerous other forms and custom shapes. Other shapes are available by request.


Synonyms

Hafnium(IV) oxide, Hafnium dioxide, Diketohafnium, Dioxohafnium, Hafnium tetrahydrate, Hafnium hydroxide, Hafnia

Nano Hafnium Oxide Powder

Purity99.9%
APS50nm
Specific   Surface Area(m2/g)20

Per your request or drawing

We can customized as require


Nano Hafnium Oxide Powder Specification

Purity99.9%
APS50nm
Specific   Surface Area(m2/g)20
Colorwhite
Crystal   Structurespherical
Density9.68 g/cm3, solid
Melting point2,758℃
Boiling point5,400℃


Nano Hafnium Oxide Powder Properties (Theoretical)

Compound FormulaHfO2
Molecular Weight210.49
AppearanceWhite
Melting Point2900 °C (5250 °F)
Boiling Point5,400° C(9,752° F)
Density9.7 g/cm3
Solubility in H2ON/A
Electrical Resistivity9 10x Ω-m
Specific Heat120 J/kg-K
Thermal Conductivity1.1 W/m-K
Thermal Expansion6.0 µm/m-K
Young's Modulus57 GPa
Exact Mass251.989 g/mol
Monoisotopic Mass211.936329 Da

Applications of Nano Hafnium Oxide Powder

Nano Hafnium Oxide Powder is used in optical coatings. It is also used as a refractory material in the insulation of such devices as thermocouples


Packing of Nano Hafnium Oxide Powder

Standard Packing:

Typical bulk packaging includes palletized plastic 5 gallon/25 kg. pails, fiber and steel drums to 1 ton super sacks in full container (FCL) or truck load (T/L) quantities. Research and sample quantities and hygroscopic, oxidizing or other air sensitive materials may be packaged under argon or vacuum. Solutions are packaged in polypropylene, plastic or glass jars up to palletized 440 gallon liquid totes Special package is available on request.

ATTs’Nano Hafnium Oxide Powder is carefully handled to minimize damage during storage and transportation and to preserve the quality of our products in their original condition.

Chemical Identifiers

Linear FormulaHfO2
MDL NumberMFCD00003565
EC No.235-013-2
Beilstein/Reaxys No.N/A
Pubchem CIDN/A
IUPAC NameDioxohafnium
SMILESO=[Hf]=O
InchI IdentifierInChI=1S/Hf.2O
InchI KeyCJNBYAVZURUTKZ-UHFFFAOYSA-N


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