Product Code : ME-HfO2-5N-PO
Nano Hafnium Oxide Powder is an intermediate in some processes that give hafnium metal. Hafnia is used in optical coatings, and as a high-κ dielectric in DRAM capacitors and in advanced metal-oxide-semiconductor devices. Because of its very high melting point, hafnia is also used as a refractory material in the insulation of such devices as thermocouples, where it can operate at temperatures up to 2500℃. Multilayered films of hafnium dioxide, silica, and other materials have been developed for use in the passive cooling of buildings.
ATT specializes in producing spray dry and non-spray dry high purity Hafnium Oxide Powder with the smallest possible average grain sizes for use in preparation of pressed and bonded sputtering targets and in Chemical Vapor Deposition (CVD) and Physical Vapor Deposition (PVD) processes including Thermal and Electron Beam (E-Beam) Evaporation, Low Temperature Organic Evaporation, Atomic Layer Deposition (ALD), Metallic-Organic and Chemical Vapor Deposition (MOCVD). Powders are also useful in any application where high surface areas are desired such as water treatment and in fuel cell and solar applications. Nanoparticles also produce very high surface areas. Our standard powder particle sizes average in the range of - 325 mesh, - 100 mesh, 10-50 microns and submicron (< 1 micron) and our spray dried powder with binder provides an extremely narrow particle size distribution (PSD) for use in thermal and plasma spray guns and other coating applications. We can also provide many materials in the nanoscale range.
ATT is a professional supplier of Nano Hafnium Oxide Powder, We also produce disc, granules, ingot, pellets, pieces, powder, rod, wire, sputtering target and in numerous other forms and custom shapes. Other shapes are available by request.
Please contact us if you need customized services. We will contact you with the price and availability in 24 hours.
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Product Information
Nano Hafnium Oxide Powder is an intermediate in some processes that give hafnium metal. Hafnia is used in optical coatings, and as a high-κ dielectric in DRAM capacitors and in advanced metal-oxide-semiconductor devices. Because of its very high melting point, hafnia is also used as a refractory material in the insulation of such devices as thermocouples, where it can operate at temperatures up to 2500℃. Multilayered films of hafnium dioxide, silica, and other materials have been developed for use in the passive cooling of buildings.
ATT specializes in producing spray dry and non-spray dry high purity Hafnium Oxide Powder with the smallest possible average grain sizes for use in preparation of pressed and bonded sputtering targets and in Chemical Vapor Deposition (CVD) and Physical Vapor Deposition (PVD) processes including Thermal and Electron Beam (E-Beam) Evaporation, Low Temperature Organic Evaporation, Atomic Layer Deposition (ALD), Metallic-Organic and Chemical Vapor Deposition (MOCVD). Powders are also useful in any application where high surface areas are desired such as water treatment and in fuel cell and solar applications. Nanoparticles also produce very high surface areas. Our standard powder particle sizes average in the range of - 325 mesh, - 100 mesh, 10-50 microns and submicron (< 1 micron) and our spray dried powder with binder provides an extremely narrow particle size distribution (PSD) for use in thermal and plasma spray guns and other coating applications. We can also provide many materials in the nanoscale range.
ATT is a professional supplier of Nano Hafnium Oxide Powder, We also produce disc, granules, ingot, pellets, pieces, powder, rod, wire, sputtering target and in numerous other forms and custom shapes. Other shapes are available by request.
Synonyms
Hafnium(IV) oxide, Hafnium dioxide, Diketohafnium, Dioxohafnium, Hafnium tetrahydrate, Hafnium hydroxide, Hafnia
Nano Hafnium Oxide Powder
Purity | 99.9% |
APS | 50nm |
Specific Surface Area(m2/g) | 20 |
Per your request or drawing
We can customized as require
Nano Hafnium Oxide Powder Specification
Purity | 99.9% |
APS | 50nm |
Specific Surface Area(m2/g) | 20 |
Color | white |
Crystal Structure | spherical |
Density | 9.68 g/cm3, solid |
Melting point | 2,758℃ |
Boiling point | 5,400℃ |
Nano Hafnium Oxide Powder Properties (Theoretical)
Compound Formula | HfO2 |
Molecular Weight | 210.49 |
Appearance | White |
Melting Point | 2900 °C (5250 °F) |
Boiling Point | 5,400° C(9,752° F) |
Density | 9.7 g/cm3 |
Solubility in H2O | N/A |
Electrical Resistivity | 9 10x Ω-m |
Specific Heat | 120 J/kg-K |
Thermal Conductivity | 1.1 W/m-K |
Thermal Expansion | 6.0 µm/m-K |
Young's Modulus | 57 GPa |
Exact Mass | 251.989 g/mol |
Monoisotopic Mass | 211.936329 Da |
Applications of Nano Hafnium Oxide Powder
Nano Hafnium Oxide Powder is used in optical coatings. It is also used as a refractory material in the insulation of such devices as thermocouples
Packing of Nano Hafnium Oxide Powder
Standard Packing:
Typical bulk packaging includes palletized plastic 5 gallon/25 kg. pails, fiber and steel drums to 1 ton super sacks in full container (FCL) or truck load (T/L) quantities. Research and sample quantities and hygroscopic, oxidizing or other air sensitive materials may be packaged under argon or vacuum. Solutions are packaged in polypropylene, plastic or glass jars up to palletized 440 gallon liquid totes Special package is available on request.
ATTs’Nano Hafnium Oxide Powder is carefully handled to minimize damage during storage and transportation and to preserve the quality of our products in their original condition.
Chemical Identifiers
Linear Formula | HfO2 |
MDL Number | MFCD00003565 |
EC No. | 235-013-2 |
Beilstein/Reaxys No. | N/A |
Pubchem CID | N/A |
IUPAC Name | Dioxohafnium |
SMILES | O=[Hf]=O |
InchI Identifier | InChI=1S/Hf.2O |
InchI Key | CJNBYAVZURUTKZ-UHFFFAOYSA-N |