Product Code : ST-Ta-5N-Cu

Tantalum sputtering target is used in integrated circuits and Thin Film Transistor Liquid Crystal Display (TFT-LCD). SAM specializes in producing high purity Sputtering Targets with the highest possible density and smallest possible average grain sizes.

Product Code : ST-Mo-3N5-Cu

Molybdenum sputtering target shares properties with its source material, either pure molybdenum or molybdenum alloy. Molybdenum metal is silvery-white and very hard. Its melting point is 2623°C (4753°F), which is only lower than tantalum, osmium, rhenium, tungsten among natural elements.

Product Code : ME-W-5N-SP

Tungsten and tungsten sheet is made by rolling high-purity tungsten metal.The purity of tungsten sheet ≥ 99.95%.Tungsten plates with different surface treatments: hot-rolled alkaline cleaning, electrolytic polish, machined, or polished.

Product Code : ST- Ta2O5-5N-Cu

Tantalum oxide sputtering target from ATT is an oxide sputtering material containing Ta and O. Tantalum is a chemical element that originated from King Tantalus, the father of Niobe from Greek mythology. It was first mentioned in 1802 and observed by G. Ekeberg. “Ta” is the canonical chemical symbol of tantalum.

Product Code : EM-Ta-5N-Cu

Tantalum has a melting point of 3,017°C, a density of 16.6 g/cc, and vapor pressure of 10-4 Torr at 2,590°C. It is a dark blue-gray metal that is very heavy, ductile and hard and has high corrosion resistance. Tantalum is especially resistant to chemicals at temperatures below 150 °C and can only be dissolved with hydrofluoric acid.

Product Code : ME-Ta-5N-CU

Tantalum capillary, also named tantalum micro tubing and tantalum fine tube. Tantalum Capillary tube is often used to make medical instruments, special instruments, etc.