Zirconium Oxide Sputtering Target, Zirconia ZrO2

Product Information

Zirconium oxide sputtering target from ATT contains Zr and O. Zirconium dioxide sputtering target, sometimes known as zirconia sputter target, is a white crystalline oxide of zirconium. The most naturally occurring form of ZrO2, with a monoclinic crystalline structure, is the mineral baddeleyite. A dopant stabilized cubic structured zirconia, cubic zirconia, is synthesized in various colors for use as a gemstone and a diamond simulant.

Three phases of ZrO2 are known: monoclinic below 1170 °C, tetragonal between 1170 °C and 2370 °C, and cubic above 2370 °C. The trend is for higher symmetry at higher temperatures, as is usually the case. A small percentage of the oxides of calcium or yttrium stabilize in the cubic phase. The very rare mineral tazheranite, (Zr, Ti, Ca)O2, is cubic. Unlike TiO2, which features six-coordinated titanium in all phases, monoclinic zirconia consists of seven-coordinated zirconium centers. This difference is attributed to the larger size of the zirconium atom relative to the titanium atom.

ATT provides high-quality Zirconium oxide Sputtering Target for research and industry purposes at competitive prices. We can provide Zirconium oxide Sputtering Target with different purity, size, and density according to your requirements.

Chemical Formula: ZrO2
CAS Number: 1314-23-4

Zirconium Oxide Sputtering Target Specification

Size：

Purity: 99.9%, 99.95%, 99.99%

Shape: Disc/Rectangular/Tube

Bonding: Unbonding/Bonding

Per your request or drawing

We can customized as required

Properties（Theoretical）

Sputtering Targets Requirements

General requirements such as size, flatness, purity, impurity content, density, N/O/C/S, grain size, and defect control. Special requirements include surface roughness, resistance value, grain size uniformity, composition and tissue uniformity, magnetic conductivity, ultra-high density, ultra-fine grains, etc.

Application of  Zirconium Oxide Sputtering Target

The main use of zirconia is in the production of hard ceramics, such as in dentistry, with other uses including as a protective coating on particles of titanium dioxide pigments, as a refractory material, as a thin film coating material, in insulation, fuel cell, abrasives and enamels. Zirconia sputtering target is used for thin film deposition, typically for fuel cell, decoration, semiconductor, display, LED and photovoltaic devices, glass coating, etc.

Stabilized zirconia is used in oxygen sensors and fuel cell membranes because it has the ability to allow oxygen ions to move freely through the crystal structure at high temperatures. This high ionic conductivity (and a low electronic conductivity) makes it one of the most useful electroceramics. Zirconium dioxide is also used as the solid electrolyte in electrochromic devices. Zirconia is a precursor to the electroceramic lead zirconate titanate (PZT), which is a high-K dielectric, which is found in myriad components.

packing of Zirconium Oxide Sputtering Target

Standard Packing:

Typical bulk packaging includes palletized plastic 5 gallon/25 kg. pails, fiber and steel drums to 1 ton super sacks in full container (FCL) or truck load (T/L) quantities. Research and sample quantities and hygroscopic, oxidizing or other air sensitive materials may be packaged under argon or vacuum. Solutions are packaged in polypropylene, plastic or glass jars up to palletized 440 gallon liquid totes Special package is available on request.

ATTs’Zirconium Oxide  Sputtering Target is carefully handled to minimize damage during storage and transportation and to preserve the quality of our products in their original condition.

Chemical Identifiers