Product Code : ST-Al/Cr-5N-Cu
Aluminum Chromium (Al/Cr) sputtering targets are widely used in physical vapor deposition (PVD) techniques to deposit thin films of Al/Cr alloys onto surfaces. A combination of aluminum (Al) and chromium (Cr) is used to create an alloy that is more resistant to corrosion and wear than either metal alone.
The creation of Al/Cr sputtering targets involves techniques like powder metallurgy, where Al and Cr powders are blended and compacted using high pressure. The resulting target is then sintered in a vacuum furnace to create a dense, homogeneous slab of the desired size and shape. The sputtering target is often mounted onto a backing plate and installed in a sputtering chamber.
During the sputtering process, the Al/Cr target is bombarded with high-energy ions which cause Al/Cr atoms to be ejected from the target surface and deposited onto a substrate to form a thin film. The resulting film is highly uniform and adherent due to the homogeneous composition of the target material.
Aluminum Chromium (Al/Cr) sputtering targets are commonly used in various applications such as aerospace industry, electronics, and decorative coatings. The use of Al/Cr alloy coatings provides excellent corrosion resistance, wear resistance, and thermal stability. Additionally, Al/Cr thin films possess unique electrical and optical properties that can be tailored using different deposition parameters.
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Product Information
Aluminum Chromium (Al/Cr) sputtering targets are widely used in physical vapor deposition (PVD) techniques to deposit thin films of Al/Cr alloys onto surfaces. A combination of aluminum (Al) and chromium (Cr) is used to create an alloy that is more resistant to corrosion and wear than either metal alone.
The creation of Al/Cr sputtering targets involves techniques like powder metallurgy, where Al and Cr powders are blended and compacted using high pressure. The resulting target is then sintered in a vacuum furnace to create a dense, homogeneous slab of the desired size and shape. The sputtering target is often mounted onto a backing plate and installed in a sputtering chamber.
During the sputtering process, the Al/Cr target is bombarded with high-energy ions which cause Al/Cr atoms to be ejected from the target surface and deposited onto a substrate to form a thin film. The resulting film is highly uniform and adherent due to the homogeneous composition of the target material.
Aluminum Chromium (Al/Cr) sputtering targets are commonly used in various applications such as aerospace industry, electronics, and decorative coatings. The use of Al/Cr alloy coatings provides excellent corrosion resistance, wear resistance, and thermal stability. Additionally, Al/Cr thin films possess unique electrical and optical properties that can be tailored using different deposition parameters.
Chemical Formula:Al/Cr)
Synonyms
CrAl
Aluminum Chromium (Al/Cr) Sputtering Target Specification
Shape: Disc/Rectangular/Tube
Bonding: Unbonding/Bonding
Per your request or drawing
We can customized as required
Size：
| Circular Sputtering Targets | Diameter | 1.0”2.0”3.0”4.0”5.0”6.0”up to 21” |
| Rectangular Sputtering Targets | Width x Length | 5” x 12”5” x 15”5” x 20”5” x 22”6” x 20” |
| Thickness | 0.125”, 0.25” | |
Sputtering Targets Requirements
General requirements such as size, flatness, purity, impurity content, density, N/O/C/S, grain size, and defect control. Special requirements include surface roughness, resistance value, grain size uniformity, composition and tissue uniformity, magnetic conductivity, ultra-high density, ultra-fine grains, etc.
Application of Aluminum Chromium (Al/Cr)Sputtering Target
Aluminum Chromium (Al/Cr) Sputtering Target is mainly used in the electronics and information industry, glass coating field, wear-resistant materials, high-temperature corrosion resistance, high-grade decorative goods, and other industries.
Packing of Aluminum Chromium (Al/Cr)Sputtering Target
Standard Packing:
Typical bulk packaging includes palletized plastic 5 gallon/25 kg. pails, fiber and steel drums to 1 ton super sacks in full container (FCL) or truck load (T/L) quantities. Research and sample quantities and hygroscopic, oxidizing or other air sensitive materials may be packaged under argon or vacuum. Solutions are packaged in polypropylene, plastic or glass jars up to palletized 440 gallon liquid totes Special package is available on request.
ATTs Aluminum Chromium (Al/Cr) Sputtering Target is carefully handled to minimize damage during storage and transportation and to preserve the quality of our products in their original condition.
