Product Code : ST-Sb-7N-Cu
Antimony (Sb) sputtering target is a material used in sputtering, a thin-film coating technique. The target material is heated up and then bombarded with a stream of ions, which causes the material to evaporate off the surface in the form of a thin film. Antimony (Sb) sputtering target is used for a variety of applications such as semiconductor device fabrication, thin film production and optical coatings. It has a low working temperature, good adhesion, good electrical properties, and a wide sputtering rate range.
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Product Information
Antimony (Sb) sputtering target is a material used in sputtering, a thin-film coating technique. The target material is heated up and then bombarded with a stream of ions, which causes the material to evaporate off the surface in the form of a thin film. Antimony (Sb) sputtering target is used for a variety of applications such as semiconductor device fabrication, thin film production and optical coatings. It has a low working temperature, good adhesion, good electrical properties, and a wide sputtering rate range.
Chemical Formula: Sb
CAS Number: 7440-36-0
Synonyms
N/A
Antimony (Sb) Sputtering Target Specification
Shape: Disc/Rectangular/Tube
Bonding: Unbonding/Bonding
Per your request or drawing
We can customized as required
Size：
| Circular Sputtering Targets | Diameter | 1.0”2.0”3.0”4.0”5.0”6.0”up to 21” |
| Rectangular Sputtering Targets | Width x Length | 5” x 12”5” x 15”5” x 20”5” x 22”6” x 20” |
| Thickness | 0.125”, 0.25” | |
Properties（Theoretical）
| Molecular Weight | 121.76 |
| Appearance | Silvery |
| Melting Point | 630.74°C |
| Boiling Point | 1950°C |
| Density | 6.691 g/cm3 |
| Solubility in H2O | N/A |
| Electrical Resistivity | 39.0 microhm-cm @ 0 °C |
| Electronegativity | 1.9 Paulings |
| Heat of Vaporization | 46.6 K-Cal/gm at om at 1950 °C |
| Poisson's Ratio | N/A |
| Specific Heat | 0.049 Cal/g/ K @ 25 K |
| Tensile Strength | N/A |
| Thermal Conductivity | 0.244 W/cm/ K @ 298.2 K |
| Thermal Expansion | (25 °C) 11 µm·m1·K1 |
| Vickers Hardness | N/A |
| Young's Modulus | 55 GPa |
Sputtering Targets Requirements
General requirements such as size, flatness, purity, impurity content, density, N/O/C/S, grain size, and defect control. Special requirements include surface roughness, resistance value, grain size uniformity, composition and tissue uniformity, magnetic conductivity, ultra-high density, ultra-fine grains, etc.
Application of Antimony (Sb) Sputtering Target
Antimony Sputtering Target is mainly used in the electronics and information industry, glass coating field, wear-resistant materials, high-temperature corrosion resistance, high-grade decorative goods, and other industries.
Packing of Antimony (Sb) Sputtering Target
Standard Packing:
Typical bulk packaging includes palletized plastic 5 gallon/25 kg. pails, fiber and steel drums to 1 ton super sacks in full container (FCL) or truck load (T/L) quantities. Research and sample quantities and hygroscopic, oxidizing or other air sensitive materials may be packaged under argon or vacuum. Solutions are packaged in polypropylene, plastic or glass jars up to palletized 440 gallon liquid totes Special package is available on request.
ATTs’Antimony (Sb) Sputtering Target is carefully handled to minimize damage during storage and transportation and to preserve the quality of our products in their original condition.
Chemical Identifiers
| Linear Formula | Sb |
| MDL Number | MFCD00134030 |
| EC No. | 231-146-5 |
| Beilstein/Reaxys No. | N/A |
| Pubchem CID | 5354495 |
| SMILES | [Sb] |
| InchI Identifier | InChI=1S/Sb |
| InchI Key | WATWJIUSRGPENY-UHFFFAOYSA-N |
