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Antimony-doped tin oxide (SnO2/Sb) sputtering target is a material used in the manufacturing of transparent conductive coatings. It is made by mixing antimony and tin oxide and then sintering the mixture into a solid form. The target is then used in a sputtering process to deposit thin films of SnO2/Sb onto a substrate. This process produces a transparent conductive coating that is used in a variety of applications, including touchscreens, solar cells, and energy-efficient windows. The addition of antimony to tin oxide improves its electrical conductivity and stability, making it a highly effective material for transparent conductive coatings.
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Product Information
Antimony-doped tin oxide (SnO2/Sb) sputtering target is a material used in the manufacturing of transparent conductive coatings. It is made by mixing antimony and tin oxide and then sintering the mixture into a solid form. The target is then used in a sputtering process to deposit thin films of SnO2/Sb onto a substrate. This process produces a transparent conductive coating that is used in a variety of applications, including touchscreens, solar cells, and energy-efficient windows. The addition of antimony to tin oxide improves its electrical conductivity and stability, making it a highly effective material for transparent conductive coatings.
Chemical Formula: SnO2/Sb
CAS Number: 128221-48-7
Synonyms
ATO, antimony doped tin oxide, antimony-doped tin oxide, Sb-Sn-O, antimony stannate, tin antimonate, tin(IV) antimonate, CAS 12673-86-8, CAS 68187-54-2
Copper Zinc (Cu/Zn) Sputtering Target Specification
Shape: Disc/Rectangular/Tube
Bonding: Unbonding/Bonding
Per your request or drawing
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Size:
Circular Sputtering Targets | Diameter | 1.0”2.0”3.0”4.0”5.0”6.0”up to 21” |
Rectangular Sputtering Targets | Width x Length | 5” x 12”5” x 15”5” x 20”5” x 22”6” x 20” |
Thickness | 0.125”, 0.25” |
Properties(Theoretical)
Molecular Weight | 444.23 |
Appearance | Blue Powder |
Melting Point | N/A |
Boiling Point | N/A |
Density | N/A |
True Density | 6.8 g/cm3 |
Size Range | N/A |
Average Particle Size | 15 nm |
Specific Surface Area | 47 m2/g |
Morphology | Tetragonal |
Solubility in H2O | N/A |
Crystal Phase / Structure | N/A |
Sputtering Targets Requirements
General requirements such as size, flatness, purity, impurity content, density, N/O/C/S, grain size, and defect control. Special requirements include surface roughness, resistance value, grain size uniformity, composition and tissue uniformity, magnetic conductivity, ultra-high density, ultra-fine grains, etc.
Application of Antimony-doped Tin Oxide (SnO2/Sb) Sputtering Target
Antimony-doped Tin Oxide (SnO2/Sb) Sputtering Target is mainly used in the electronics and information industry, glass coating field, wear-resistant materials, high-temperature corrosion resistance, high-grade decorative goods, and other industries.
Packing of Antimony-doped Tin Oxide (SnO2/Sb)Sputtering Target
Standard Packing:
Typical bulk packaging includes palletized plastic 5 gallon/25 kg. pails, fiber and steel drums to 1 ton super sacks in full container (FCL) or truck load (T/L) quantities. Research and sample quantities and hygroscopic, oxidizing or other air sensitive materials may be packaged under argon or vacuum. Solutions are packaged in polypropylene, plastic or glass jars up to palletized 440 gallon liquid totes Special package is available on request.
ATTs’Antimony-doped Tin Oxide (SnO2/Sb) Sputtering Target is carefully handled to minimize damage during storage and transportation and to preserve the quality of our products in their original condition.
Chemical Identifiers
Linear Formula | Sb2O3 • SnO2 |
MDL Number | MFCD00799153 |
EC No. | N/A |
Pubchem CID | 162241987 |
IUPAC Name | dioxotin; oxo(oxostibanyloxy)stibane |
SMILES | O=[Sn]=O.O=[Sb]O[Sb]=O |
InchI Identifier | InChI=1S/5O.2Sb.Sn |
InchI Key | DCEPJBOKQZTMOG-UHFFFAOYSA-N |