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Antimony Oxide (Sb2O3) Sputtering Target

Product Code : ST-Sb2O3-5N-Cu

Antimony oxide (Sb2O3) sputtering targets are widely used in the semiconductor industry for applications in the production of thin films, including microelectronics and photovoltaics. Sb2O3 has unique optical and electrical properties that make it ideal for use in the production of high-performance electronics, including transparent conductive coatings, thin-film solar cells, and anti-reflective coatings.

At our company, we specialize in the manufacturing of high-quality Antimony oxide sputtering targets. Our sputtering targets are made using advanced technology and high-purity materials, ensuring exceptional performance and reliability. We offer a range of sizes and shapes of targets, and we can also customize targets according to customer requirements.

Our sputtering targets undergo rigorous quality control processes to ensure that they meet the highest standards of purity, consistency, and performance. We are committed to providing our customers with competitive pricing and exceptional customer service. Our team is dedicated to helping our customers find the best solutions for their specific needs and requirements.

If you are looking for high-quality Antimony oxide sputtering targets, please don't hesitate to contact us. We would be happy to discuss your needs and requirements and help you find the best solution.


Please contact us if you need customized services. We will contact you with the price and availability in 24 hours.

Product Product Code Purity Size Contact Us
Antimony Oxide (Sb2O3) Sputtering TargetST-Sb2O3-2N-Cu 99%Customize
Antimony Oxide (Sb2O3) Sputtering TargetST-Sb2O3-3N-Cu 99.9%Customize
Antimony Oxide (Sb2O3) Sputtering TargetST-Sb2O3-4N-Cu 99.99%Customize
Antimony Oxide (Sb2O3) Sputtering TargetST-Sb2O3-5N-Cu 99.999%Customize

Product Information

Antimony oxide (Sb2O3) sputtering targets are widely used in the semiconductor industry for applications in the production of thin films, including microelectronics and photovoltaics. Sb2O3 has unique optical and electrical properties that make it ideal for use in the production of high-performance electronics, including transparent conductive coatings, thin-film solar cells, and anti-reflective coatings.

At our company, we specialize in the manufacturing of high-quality Antimony oxide sputtering targets. Our sputtering targets are made using advanced technology and high-purity materials, ensuring exceptional performance and reliability. We offer a range of sizes and shapes of targets, and we can also customize targets according to customer requirements.

Our sputtering targets undergo rigorous quality control processes to ensure that they meet the highest standards of purity, consistency, and performance. We are committed to providing our customers with competitive pricing and exceptional customer service. Our team is dedicated to helping our customers find the best solutions for their specific needs and requirements.

If you are looking for high-quality Antimony oxide sputtering targets, please don't hesitate to contact us. We would be happy to discuss your needs and requirements and help you find the best solution.

Chemical Formula: Sb2O3

CAS Number:  1309-64-4

Synonyms

Antimony(III) Oxide, Antimony Trioxide, Dioxodistiboxane, Stibine oxide, triphenyl, Dioxodistiboxane, Antimony sesquioxide, Antimony White, Stibine oxide,Diantimony trioxide, Flowers of antimony,Oxo-oxostibanyloxystibane,


Antimony Oxide (Sb2O3)  Sputtering Target Specification

Shape: Disc/Rectangular/Tube

Bonding: Unbonding/Bonding

Per your request or drawing

We can customized as required

Size:

Circular   Sputtering TargetsDiameter1.0”2.0”3.0”4.0”5.0”6.0”up to 21”
Rectangular   Sputtering TargetsWidth x Length5” x 12”5” x 15”5” x 20”5” x 22”6” x 20”
Thickness0.125”, 0.25”


Properties(Theoretical)

Compound FormulaO3Sb2
Molecular Weight291.52
Appearancewhite solid
Melting Point656 °C
Boiling Point1425 °C (sublimes)
Density5.2 g/cm3
Solubility in H2ON/A
Exact Mass368.016 g/mol
Monoisotopic Mass289.792388 Da




Sputtering Targets Requirements

General requirements such as size, flatness, purity, impurity content, density, N/O/C/S, grain size, and defect control. Special requirements include surface roughness, resistance value, grain size uniformity, composition and tissue uniformity, magnetic conductivity, ultra-high density, ultra-fine grains, etc.


Application of Antimony Oxide (Sb2O3) Sputtering Target

Antimony Oxide (Sb2O3)  Sputtering Target is mainly used in the electronics and information industry, glass coating field, wear-resistant materials, high-temperature corrosion resistance, high-grade decorative goods, and other industries.


Packing of Antimony Oxide (Sb2O3) Sputtering Target

Standard Packing:

Typical bulk packaging includes palletized plastic 5 gallon/25 kg. pails, fiber and steel drums to 1 ton super sacks in full container (FCL) or truck load (T/L) quantities. Research and sample quantities and hygroscopic, oxidizing or other air sensitive materials may be packaged under argon or vacuum. Solutions are packaged in polypropylene, plastic or glass jars up to palletized 440 gallon liquid totes Special package is available on request.

ATTs’Antimony Oxide (Sb2O3) Sputtering Target is carefully handled to minimize damage during storage and transportation and to preserve the quality of our products in their original condition.


Chemical Identifiers

Linear FormulaSb2O3
MDL NumberMFCD00011214
EC No.215-175-0
Beilstein/Reaxys No.N/A
Pubchem CID27652
IUPAC Nameoxo(oxostibanyloxy)stibane
SMILESO=[Sb]O[Sb]=O
InchI IdentifierInChI=1S/3O.2Sb
InchI KeyADCOVFLJGNWWNZ-UHFFFAOYSA-N






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