Product Code : ST-Sb2O3-5N-Cu
Antimony oxide (Sb2O3) sputtering targets are widely used in the semiconductor industry for applications in the production of thin films, including microelectronics and photovoltaics. Sb2O3 has unique optical and electrical properties that make it ideal for use in the production of high-performance electronics, including transparent conductive coatings, thin-film solar cells, and anti-reflective coatings.
At our company, we specialize in the manufacturing of high-quality Antimony oxide sputtering targets. Our sputtering targets are made using advanced technology and high-purity materials, ensuring exceptional performance and reliability. We offer a range of sizes and shapes of targets, and we can also customize targets according to customer requirements.
Our sputtering targets undergo rigorous quality control processes to ensure that they meet the highest standards of purity, consistency, and performance. We are committed to providing our customers with competitive pricing and exceptional customer service. Our team is dedicated to helping our customers find the best solutions for their specific needs and requirements.
If you are looking for high-quality Antimony oxide sputtering targets, please don't hesitate to contact us. We would be happy to discuss your needs and requirements and help you find the best solution.
Please contact us if you need customized services. We will contact you with the price and availability in 24 hours.
Product | Product Code | Purity | Size | Contact Us |
Product Information
Antimony oxide (Sb2O3) sputtering targets are widely used in the semiconductor industry for applications in the production of thin films, including microelectronics and photovoltaics. Sb2O3 has unique optical and electrical properties that make it ideal for use in the production of high-performance electronics, including transparent conductive coatings, thin-film solar cells, and anti-reflective coatings.
At our company, we specialize in the manufacturing of high-quality Antimony oxide sputtering targets. Our sputtering targets are made using advanced technology and high-purity materials, ensuring exceptional performance and reliability. We offer a range of sizes and shapes of targets, and we can also customize targets according to customer requirements.
Our sputtering targets undergo rigorous quality control processes to ensure that they meet the highest standards of purity, consistency, and performance. We are committed to providing our customers with competitive pricing and exceptional customer service. Our team is dedicated to helping our customers find the best solutions for their specific needs and requirements.
If you are looking for high-quality Antimony oxide sputtering targets, please don't hesitate to contact us. We would be happy to discuss your needs and requirements and help you find the best solution.
Chemical Formula: Sb2O3
CAS Number: 1309-64-4
Synonyms
Antimony(III) Oxide, Antimony Trioxide, Dioxodistiboxane, Stibine oxide, triphenyl, Dioxodistiboxane, Antimony sesquioxide, Antimony White, Stibine oxide,Diantimony trioxide, Flowers of antimony,Oxo-oxostibanyloxystibane,
Antimony Oxide (Sb2O3) Sputtering Target Specification
Shape: Disc/Rectangular/Tube
Bonding: Unbonding/Bonding
Per your request or drawing
We can customized as required
Size:
Circular Sputtering Targets | Diameter | 1.0”2.0”3.0”4.0”5.0”6.0”up to 21” |
Rectangular Sputtering Targets | Width x Length | 5” x 12”5” x 15”5” x 20”5” x 22”6” x 20” |
Thickness | 0.125”, 0.25” |
Properties(Theoretical)
Compound Formula | O3Sb2 |
Molecular Weight | 291.52 |
Appearance | white solid |
Melting Point | 656 °C |
Boiling Point | 1425 °C (sublimes) |
Density | 5.2 g/cm3 |
Solubility in H2O | N/A |
Exact Mass | 368.016 g/mol |
Monoisotopic Mass | 289.792388 Da |
Sputtering Targets Requirements
General requirements such as size, flatness, purity, impurity content, density, N/O/C/S, grain size, and defect control. Special requirements include surface roughness, resistance value, grain size uniformity, composition and tissue uniformity, magnetic conductivity, ultra-high density, ultra-fine grains, etc.
Application of Antimony Oxide (Sb2O3) Sputtering Target
Antimony Oxide (Sb2O3) Sputtering Target is mainly used in the electronics and information industry, glass coating field, wear-resistant materials, high-temperature corrosion resistance, high-grade decorative goods, and other industries.
Packing of Antimony Oxide (Sb2O3) Sputtering Target
Standard Packing:
Typical bulk packaging includes palletized plastic 5 gallon/25 kg. pails, fiber and steel drums to 1 ton super sacks in full container (FCL) or truck load (T/L) quantities. Research and sample quantities and hygroscopic, oxidizing or other air sensitive materials may be packaged under argon or vacuum. Solutions are packaged in polypropylene, plastic or glass jars up to palletized 440 gallon liquid totes Special package is available on request.
ATTs’Antimony Oxide (Sb2O3) Sputtering Target is carefully handled to minimize damage during storage and transportation and to preserve the quality of our products in their original condition.
Chemical Identifiers
Linear Formula | Sb2O3 |
MDL Number | MFCD00011214 |
EC No. | 215-175-0 |
Beilstein/Reaxys No. | N/A |
Pubchem CID | 27652 |
IUPAC Name | oxo(oxostibanyloxy)stibane |
SMILES | O=[Sb]O[Sb]=O |
InchI Identifier | InChI=1S/3O.2Sb |
InchI Key | ADCOVFLJGNWWNZ-UHFFFAOYSA-N |