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Barium (Ba) Sputtering Target

Product Code : ST-Ba-5N-Cu

Barium (Ba) sputtering targets are used in physical vapor deposition (PVD) processes to deposit thin films of barium onto substrates such as glass or silicon. Barium is a chemical element with atomic number 56 and symbol Ba. It is a soft, silvery-white metal that oxidizes quickly in air.

Barium sputtering targets are typically made of high-purity barium metal or barium oxide (BaO) powder. They come in various shapes and sizes depending on the specific application, and are often used in conjunction with other sputtering targets such as titanium or aluminum to create multilayer thin films.

During the sputtering process, an inert gas such as argon is ionized and accelerated towards the target material, causing atoms to be ejected from the surface and deposit onto the substrate, forming a thin film. The properties of the resulting barium thin film can be adjusted by varying the sputtering conditions such as gas pressure, power, and target-to-substrate distance.


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Product Product Code Purity Size Contact Us
Barium (Ba) Sputtering Target Sputtering Target ST-Ba-2N-Cu 99% Customize
Barium (Ba) Sputtering Target Sputtering Target ST-Ba-3N-Cu 99.9% Customize
Barium (Ba) Sputtering Target Sputtering Target ST-Ba-4N-Cu 99.99% Customize
Barium (Ba) Sputtering Target Sputtering Target ST-Ba-5N-Cu 99.999% Customize

Product Information

Barium (Ba) sputtering targets are used in physical vapor deposition (PVD) processes to deposit thin films of barium onto substrates such as glass or silicon. Barium is a chemical element with atomic number 56 and symbol Ba. It is a soft, silvery-white metal that oxidizes quickly in air.

Barium sputtering targets are typically made of high-purity barium metal or barium oxide (BaO) powder. They come in various shapes and sizes depending on the specific application, and are often used in conjunction with other sputtering targets such as titanium or aluminum to create multilayer thin films.

During the sputtering process, an inert gas such as argon is ionized and accelerated towards the target material, causing atoms to be ejected from the surface and deposit onto the substrate, forming a thin film. The properties of the resulting barium thin film can be adjusted by varying the sputtering conditions such as gas pressure, power, and target-to-substrate distance.

Chemical Formula: Ba
CAS Number:  7440-39-3


Synonyms

N/A


Barium (Ba) Sputtering Target Specification

Shape: Disc/Rectangular/Tube

Bonding: Unbonding/Bonding

Per your request or drawing

We can customized as required

Size:

Circular   Sputtering TargetsDiameter1.0”2.0”3.0”4.0”5.0”6.0”up to 21”
Rectangular   Sputtering TargetsWidth x Length5” x 12”5” x 15”5” x 20”5” x 22”6” x 20”
Thickness0.125”, 0.25”


Properties(Theoretical)

Molecular Weight137.327
AppearanceSolid
Melting Point727 °C
Boiling Point1845 °C
Density3.51 g/cm3 (°C)
Solubility in H2ON/A
Crystal Phase / Structurebody-centered cubic (bcc)
Electrical Resistivity332 nΩ·m (20 °C)
Electronegativity0.89 Paulings
Heat of Fusion7.12 kJ/mol
Heat of Vaporization142 kJ/mol
Poisson's Ratio0.28
Specific Heat192 J/K·kg
Thermal Conductivity18.4 W/m·K
Thermal Expansion20.6 µm/m·K (25 °C)
Young's Modulus13 GPa




Sputtering Targets Requirements

General requirements such as size, flatness, purity, impurity content, density, N/O/C/S, grain size, and defect control. Special requirements include surface roughness, resistance value, grain size uniformity, composition and tissue uniformity, magnetic conductivity, ultra-high density, ultra-fine grains, etc.


Application of Barium (Ba)Sputtering Target

Barium (Ba) Sputtering Target is mainly used in the electronics and information industry, glass coating field, wear-resistant materials, high-temperature corrosion resistance, high-grade decorative goods, and other industries.


Packing of  Barium (Ba)Sputtering Target

Standard Packing:

Typical bulk packaging includes palletized plastic 5 gallon/25 kg. pails, fiber and steel drums to 1 ton super sacks in full container (FCL) or truck load (T/L) quantities. Research and sample quantities and hygroscopic, oxidizing or other air sensitive materials may be packaged under argon or vacuum. Solutions are packaged in polypropylene, plastic or glass jars up to palletized 440 gallon liquid totes Special package is available on request.

ATTs’Barium (Ba) Sputtering Target is carefully handled to minimize damage during storage and transportation and to preserve the quality of our products in their original condition.


Chemical Identifiers

Linear FormulaBa
MDL NumberMFCD00134031
EC No.231-149-1
Beilstein/Reaxys No.N/A
Pubchem CID5355457
SMILES[Ba]
InchI IdentifierInChI=1S/Ba
InchI KeyDSAJWYNOEDNPEQ-UHFFFAOYSA-N




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