Product Code : ST-Ba0.5Sr0.5TiO3-5N-Cu
Barium Strontium Titanate (Ba0.5Sr0.5TiO3) is a complex perovskite oxide with a high dielectric constant and ferroelectric properties, making it suitable for use in a variety of electronic applications such as capacitors, resonators, and tunable filters. To produce thin films of Barium Strontium Titanate, sputtering is a widely used technique. Sputtering is the physical deposition of a thin film of a material onto a substrate by bombarding the target material with energetic ions.
A Barium Strontium Titanate sputtering target is a specialized, circular-shaped disc made of highly pure Ba0.5Sr0.5TiO3 ceramic material. The target is mounted in a sputtering chamber and subjected to a high-energy bombardment of ions, typically either noble gases or oxygen, causing some of the atoms on the target surface to be ejected with high energy. These ejected atoms or ionized particles are then deposited onto a substrate to form a thin film.
A high-quality Barium Strontium Titanate sputtering target is essential to ensure high yield and good film quality. The production of pure and homogeneous sputtering targets for Barium Strontium Titanate involves several steps, including powder preparation, pressing, sintering, and post-processing. The target material must be uniform and free from impurities to avoid defects in the thin film and ensure good electrical properties.
Overall, Barium Strontium Titanate sputtering targets play a key role in the high-performance electronic device industry, enabling the production of thin films with unique and valuable properties.
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Product Information
Barium Strontium Titanate (Ba0.5Sr0.5TiO3) is a complex perovskite oxide with a high dielectric constant and ferroelectric properties, making it suitable for use in a variety of electronic applications such as capacitors, resonators, and tunable filters. To produce thin films of Barium Strontium Titanate, sputtering is a widely used technique. Sputtering is the physical deposition of a thin film of a material onto a substrate by bombarding the target material with energetic ions.
A Barium Strontium Titanate sputtering target is a specialized, circular-shaped disc made of highly pure Ba0.5Sr0.5TiO3 ceramic material. The target is mounted in a sputtering chamber and subjected to a high-energy bombardment of ions, typically either noble gases or oxygen, causing some of the atoms on the target surface to be ejected with high energy. These ejected atoms or ionized particles are then deposited onto a substrate to form a thin film.
A high-quality Barium Strontium Titanate sputtering target is essential to ensure high yield and good film quality. The production of pure and homogeneous sputtering targets for Barium Strontium Titanate involves several steps, including powder preparation, pressing, sintering, and post-processing. The target material must be uniform and free from impurities to avoid defects in the thin film and ensure good electrical properties.
Overall, Barium Strontium Titanate sputtering targets play a key role in the high-performance electronic device industry, enabling the production of thin films with unique and valuable properties.
Chemical Formula:Ba0.5Sr0.5TiO3
CAS Number: 12430-73-8
Synonyms
BST, BaO4SrTi, Ba0.5Sr0.5TiO3, BaSrTiO3
Barium Strontium Titanate (Ba0.5Sr0.5TiO3) Sputtering Target Specification
Shape: Disc/Rectangular/Tube
Bonding: Unbonding/Bonding
Per your request or drawing
We can customized as required
Size：
| Circular Sputtering Targets | Diameter | 1.0”2.0”3.0”4.0”5.0”6.0”up to 21” |
| Rectangular Sputtering Targets | Width x Length | 5” x 12”5” x 15”5” x 20”5” x 22”6” x 20” |
| Thickness | 0.125”, 0.25” | |
Properties（Theoretical）
| Compound Formula | BaxSr(1-x)TiO3 |
| Molecular Weight | 336.81 |
| Appearance | solid |
| Melting Point | N/A |
| Boiling Point | N/A |
| Density | N/A |
| Solubility in H2O | N/A |
| Exact Mass | 337.738461 |
| Monoisotopic Mass | 337.738461 |
Sputtering Targets Requirements
General requirements such as size, flatness, purity, impurity content, density, N/O/C/S, grain size, and defect control. Special requirements include surface roughness, resistance value, grain size uniformity, composition and tissue uniformity, magnetic conductivity, ultra-high density, ultra-fine grains, etc.
Application of Barium Strontium Titanate (Ba0.5Sr0.5TiO3) Sputtering Target
Barium Strontium Titanate (Ba0.5Sr0.5TiO3) Sputtering Target is mainly used in the electronics and information industry, glass coating field, wear-resistant materials, high-temperature corrosion resistance, high-grade decorative goods, and other industries.
Packing of Barium Strontium Titanate (Ba0.5Sr0.5TiO3) Sputtering Target
Standard Packing:
Typical bulk packaging includes palletized plastic 5 gallon/25 kg. pails, fiber and steel drums to 1 ton super sacks in full container (FCL) or truck load (T/L) quantities. Research and sample quantities and hygroscopic, oxidizing or other air sensitive materials may be packaged under argon or vacuum. Solutions are packaged in polypropylene, plastic or glass jars up to palletized 440 gallon liquid totes Special package is available on request.
ATTs’Barium Strontium Titanate (Ba0.5Sr0.5TiO3) Sputtering Target is carefully handled to minimize damage during storage and transportation and to preserve the quality of our products in their original condition.
Chemical Identifiers
| Linear Formula | BaxSr(1-x)TiO3 |
| MDL Number | N/A |
| EC No. | 235-659-5 |
| Beilstein/Reaxys No. | N/A |
| Pubchem CID | 166703 |
| IUPAC Name | strontium; barium(2+); oxygen(2-); titanium(4+) |
| SMILES | [Ba+2].[Sr+2].[O-][Ti]([O-])([O-])[O-] |
| InchI Identifier | InChI=1S/Ba.4O.Sr.Ti/q+2;4*-1;+2; |
| InchI Key | PAQYLWUHUWDVQG-UHFFFAOYSA-N |
