Barium Titanate Sputtering Target, BaTiO3

Product Information

Barium titanate sputtering target from ATT is an oxide sputtering material with the formula BaTiO3.

Barium is the fifth element in group 2 and is a soft, silvery alkaline earth metal. Because of its high chemical reactivity, barium is never found in nature as a free element. Its hydroxide, known in pre-modern times as baryta, does not occur as a mineral, but can be prepared by heating barium carbonate. The most common naturally occurring minerals of barium are barite (barium sulfate, BaSO4) and witherite (barium carbonate, BaCO3), both insoluble in water. The name barium originates from the alchemical derivative “baryta”, from Greek βαρύς (barys), meaning “heavy.”

Titanium is a chemical element that originated from Titans, the sons of the Earth goddess of Greek mythology. It was first mentioned in 1791 and observed by W. Gregor. The isolation was later accomplished and announced by J. Berzelius. “Ti” is the canonical chemical symbol of titanium. Its atomic number in the periodic table of elements is 22 with a location at Period 4 and Group 4, belonging to the d-block. The relative atomic mass of titanium is 47.867(1) Dalton, the number in the brackets indicating the uncertainty.

Oxygen is a chemical element that originated from the Greek ‘oxy’ and ‘genes’ meaning acid-forming. It was first mentioned in 1771 and observed by W. Scheele. The isolation was later accomplished and announced by W. Scheele. “O” is the canonical chemical symbol of oxygen. Its atomic number in the periodic table of elements is 8 with location at Period 2 and Group 16, belonging to the p-block. The relative atomic mass of oxygen is 15.9994(3) Dalton, the number in the brackets indicating the uncertainty.

ATT provides high-quality Barium Titanate Sputtering Target for research and industry purposes at competitive prices. We can provide Barium Titanate Sputtering Target with different purity, size, and density according to your requirements.

Chemical Formula: BaTiO3
CAS Number: 12047-27-7

Synonyms

N/A

Barium Titanate Sputtering Target Specification

Size：

Shape: Disc/Rectangular/Tube

Bonding: Unbonding/Bonding

Per your request or drawing

We can customized as required

Properties（Theoretical）

Sputtering Targets Requirements

General requirements such as size, flatness, purity, impurity content, density, N/O/C/S, grain size, and defect control. Special requirements include surface roughness, resistance value, grain size uniformity, composition and tissue uniformity, magnetic conductivity, ultra-high density, ultra-fine grains, etc.

Application of Barium Titanate Sputtering Target

The barium titanate sputtering target is used for thin film deposition, decoration, semiconductor, display, LED and photovoltaic devices, functional coating as nicely as other optical information storage space industry, glass coating industry like car glass and architectural glass, optical communication, etc.

Barium Titanate Sputtering Target Handling Notes

1. Elastomer bonding is recommended for BaTiO3 sputtering target, due to some of its characteristics not amenable to sputtering like brittleness, low thermal conductivity, etc.

 2. This material has a low thermal conductivity are susceptible to thermal shock.

Packing of  Barium Titanate Sputtering Target

Standard Packing:

Typical bulk packaging includes palletized plastic 5 gallon/25 kg. pails, fiber and steel drums to 1 ton super sacks in full container (FCL) or truck load (T/L) quantities. Research and sample quantities and hygroscopic, oxidizing or other air sensitive materials may be packaged under argon or vacuum. Solutions are packaged in polypropylene, plastic or glass jars up to palletized 440 gallon liquid totes Special package is available on request.

ATTs’Barium Titanate Sputtering Target is carefully handled to minimize damage during storage and transportation and to preserve the quality of our products in their original condition.

Chemical Identifiers