Barium Zirconate (BaZrO3) Sputtering Target

Product Information

Barium Zirconate (BaZrO3) is a perovskite oxide that exhibits unique properties such as high melting point, good thermal stability, and low dielectric loss, making it an ideal material for various optical, electronic, and energy applications in thin film form. Sputtering is a popular method for producing high-quality thin films of BaZrO3.

A BaZrO3 sputtering target is a cylindrical disk made of pure and high-density BaZrO3 powder. The target is mounted on a rotating cathode in a sputtering chamber and bombarded with ions of noble gases such as argon at high energy. The sputtering process leads to the removal of surface atoms from the target material, which then deposits on a substrate in a thin-film form.

The production of a BaZrO3 sputtering target involves several steps. First, pure BaZrO3 powder is synthesized through methods such as solid-state reactions, sol-gel processing, or chemical vapor deposition. Next, the powder is pressed into a compact cylindrical shape and sintered at high temperature to form a dense, uniform, and defect-free target.

The quality of the BaZrO3 sputtering target plays a crucial role in the quality of the resulting thin film. A high-density target results in minimal defects in the deposited film, while impurities in the target can lead to undesired properties of the thin film. Therefore, it is essential to use high-quality BaZrO3 sputtering targets to enable the fabrication of thin films with excellent properties, such as high refractive index, low optical scattering, and excellent optical stability.

Overall, BaZrO3 sputtering targets play a vital role in the production of high-quality thin films for various applications, including optical coatings, electronic devices, and fuel cells.

Chemical Formula:BaZrO3
CAS Number: 12009-21-1

Synonyms

Barium zirconium oxide, barium zirconium(IV) oxide, barium zirconium trioxide

Barium Zirconate (BaZrO3) Sputtering Target Specification

Shape: Disc/Rectangular/Tube

Bonding: Unbonding/Bonding

Per your request or drawing

We can customized as required

Size：

Properties（Theoretical）

Sputtering Targets Requirements

General requirements such as size, flatness, purity, impurity content, density, N/O/C/S, grain size, and defect control. Special requirements include surface roughness, resistance value, grain size uniformity, composition and tissue uniformity, magnetic conductivity, ultra-high density, ultra-fine grains, etc.

Application of Barium Zirconate (BaZrO3) Sputtering Target

Barium Zirconate (BaZrO3) Sputtering Target is mainly used in the electronics and information industry, glass coating field, wear-resistant materials, high-temperature corrosion resistance, high-grade decorative goods, and other industries.

Packing of  Barium Zirconate (BaZrO3) Sputtering Target

Standard Packing:

Typical bulk packaging includes palletized plastic 5 gallon/25 kg. pails, fiber and steel drums to 1 ton super sacks in full container (FCL) or truck load (T/L) quantities. Research and sample quantities and hygroscopic, oxidizing or other air sensitive materials may be packaged under argon or vacuum. Solutions are packaged in polypropylene, plastic or glass jars up to palletized 440 gallon liquid totes Special package is available on request.

ATTs’Barium Zirconate (BaZrO3) Sputtering Target is carefully handled to minimize damage during storage and transportation and to preserve the quality of our products in their original condition.

Chemical Identifiers