Product Code : ST-BeO-5N-Cu
Beryllium oxide (BeO) sputtering target is a high-purity material used for thin film deposition in various industries including electronics, aerospace, and telecommunications. BeO sputtering targets are manufactured using advanced powder metallurgy techniques to ensure uniformity and high density. The resulting targets exhibit excellent thermal conductivity, chemical resistance, and mechanical strength, making them ideal for deposition of high-quality thin films. Beryllium oxide has a high percentage of beryllium, which is a toxic element, and proper safety measures must be taken during target manufacturing and handling.
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Product Information
Beryllium oxide (BeO) sputtering target is a high-purity material used for thin film deposition in various industries including electronics, aerospace, and telecommunications. BeO sputtering targets are manufactured using advanced powder metallurgy techniques to ensure uniformity and high density. The resulting targets exhibit excellent thermal conductivity, chemical resistance, and mechanical strength, making them ideal for deposition of high-quality thin films. Beryllium oxide has a high percentage of beryllium, which is a toxic element, and proper safety measures must be taken during target manufacturing and handling.
Chemical Formula:BeO
CAS Number: 1304-56-9
Synonyms
Beryllia, Beryllium monoxide, oxoberyllium
Beryllium Oxide (BeO) Sputtering Target Specification
Shape: Disc/Rectangular/Tube
Bonding: Unbonding/Bonding
Per your request or drawing
We can customized as required
Size:
Circular Sputtering Targets | Diameter | 1.0”2.0”3.0”4.0”5.0”6.0”up to 21” |
Rectangular Sputtering Targets | Width x Length | 5” x 12”5” x 15”5” x 20”5” x 22”6” x 20” |
Thickness | 0.125”, 0.25” |
Properties(Theoretical)
Compound Formula | BeO |
Molecular Weight | 25.01 |
Appearance | White |
Melting Point | 2507 °C (4545 °F) |
Boiling Point | 3900 °C (7052 °F) |
Density | 2.9 g/cm3 |
Solubility in H2O | N/A |
Electrical Resistivity | 13 10x Ω-m |
Poisson's Ratio | 0.26 |
Specific Heat | 1050 J/kg-K |
Tensile Strength | 140 MPa (Ultimate) |
Thermal Conductivity | 270 W/m-K |
Thermal Expansion | 8.0 µm/m-K |
Young's Modulus | 350 GPa |
Exact Mass | 25.0071 g/mol |
Monoisotopic Mass | 25.007097 Da |
Sputtering Targets Requirements
General requirements such as size, flatness, purity, impurity content, density, N/O/C/S, grain size, and defect control. Special requirements include surface roughness, resistance value, grain size uniformity, composition and tissue uniformity, magnetic conductivity, ultra-high density, ultra-fine grains, etc.
Application of Beryllium Oxide (BeO) Sputtering Target
Beryllium Oxide (BeO) Sputtering Target is mainly used in the electronics and information industry, glass coating field, wear-resistant materials, high-temperature corrosion resistance, high-grade decorative goods, and other industries.
Packing of Beryllium Oxide (BeO) Sputtering Target
Standard Packing:
Typical bulk packaging includes palletized plastic 5 gallon/25 kg. pails, fiber and steel drums to 1 ton super sacks in full container (FCL) or truck load (T/L) quantities. Research and sample quantities and hygroscopic, oxidizing or other air sensitive materials may be packaged under argon or vacuum. Solutions are packaged in polypropylene, plastic or glass jars up to palletized 440 gallon liquid totes Special package is available on request.
ATTs’Beryllium Oxide (BeO) Sputtering Target is carefully handled to minimize damage during storage and transportation and to preserve the quality of our products in their original condition.
Chemical Identifiers
Linear Formula | BeO |
MDL Number | MFCD00003457 |
EC No. | 215-133-1 |
Beilstein/Reaxys No. | 3902801 |
Pubchem CID | 14775 |
IUPAC Name | Oxoberyllium |
SMILES | [Be]=O |
InchI Identifier | InChI=1S/Be.O |
InchI Key | LTPBRCUWZOMYOC-UHFFFAOYSA-N |