Product Code : ST-BiFeO3-5N-Cu
Bismuth ferrite (BiFeO3) sputtering targets are high-purity materials used for thin film deposition in various applications like semiconductor industries and microelectronics. BiFeO3 sputtering targets are manufactured using advanced techniques to ensure the targets' high purity, uniformity and good density. These targets exhibit dependable properties such as ferroelectric, magnetic, and multiferroic, ideal for deposition of high-quality thin films used in advanced devices. Bismuth ferrite is lead-free and eco-friendly, making it a preferred material for sputtering targets. The targets made from bismuth ferrite are characterized by high resistance to wear and excellent physical and chemical properties that ensure optimal performance in the deposition process.
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Product Information
Bismuth ferrite (BiFeO3) sputtering targets are high-purity materials used for thin film deposition in various applications like semiconductor industries and microelectronics. BiFeO3 sputtering targets are manufactured using advanced techniques to ensure the targets' high purity, uniformity and good density. These targets exhibit dependable properties such as ferroelectric, magnetic, and multiferroic, ideal for deposition of high-quality thin films used in advanced devices. Bismuth ferrite is lead-free and eco-friendly, making it a preferred material for sputtering targets. The targets made from bismuth ferrite are characterized by high resistance to wear and excellent physical and chemical properties that ensure optimal performance in the deposition process.
Chemical Formula:BiFeO3
CAS Number: 12010-42-3
Synonyms
BFO target, Bismuth Iron Oxide Sputtering Target
Bismuth Ferrite (BiFeO3) Sputtering Target Specification
Shape: Disc/Rectangular/Tube
Bonding: Unbonding/Bonding
Per your request or drawing
We can customized as required
Size:
Circular Sputtering Targets | Diameter | 1.0”2.0”3.0”4.0”5.0”6.0”up to 21” |
Rectangular Sputtering Targets | Width x Length | 5” x 12”5” x 15”5” x 20”5” x 22”6” x 20” |
Thickness | 0.125”, 0.25” |
Properties(Theoretical)
Compound Formula | BiFeO3 |
Molecular Weight | 312.82 |
Appearance | Target |
Melting Point | N/A |
Boiling Point | N/A |
Density | N/A |
Solubility in H2O | N/A |
Crystal Phase / Structure | perovskite |
Sputtering Targets Requirements
General requirements such as size, flatness, purity, impurity content, density, N/O/C/S, grain size, and defect control. Special requirements include surface roughness, resistance value, grain size uniformity, composition and tissue uniformity, magnetic conductivity, ultra-high density, ultra-fine grains, etc.
Application of Bismuth Ferrite (BiFeO3) Sputtering Target
Bismuth Ferrite (BiFeO3) Sputtering Target is mainly used in the electronics and information industry, glass coating field, wear-resistant materials, high-temperature corrosion resistance, high-grade decorative goods, and other industries.
Packing of Bismuth Ferrite (BiFeO3) Sputtering Target
Standard Packing:
Typical bulk packaging includes palletized plastic 5 gallon/25 kg. pails, fiber and steel drums to 1 ton super sacks in full container (FCL) or truck load (T/L) quantities. Research and sample quantities and hygroscopic, oxidizing or other air sensitive materials may be packaged under argon or vacuum. Solutions are packaged in polypropylene, plastic or glass jars up to palletized 440 gallon liquid totes Special package is available on request.
ATTs’Bismuth Ferrite (BiFeO3) Sputtering Target is carefully handled to minimize damage during storage and transportation and to preserve the quality of our products in their original condition.
Chemical Identifiers
Linear Formula | BiFeO3 |
MDL Number | N/A |
EC No. | N/A |