Product Code : ST-Bi3Fe5O12-5N-Cu
Bismuth Iron Oxide (Bi3Fe5O12) sputtering targets are high-purity materials used in the production of thin films and coatings. These targets are manufactured using advanced techniques to ensure high uniformity and good density. Bi3Fe5O12 is a type of garnet material that has magnetic properties, making it ideal for applications in the field of magneto-optical systems, spintronics, and magnetic storage media. Bi3Fe5O12 sputtering targets have high thermal and chemical stability and are suitable for use in various deposition processes, including reactive sputtering and magnetron sputtering. They offer excellent resistance to wear and possess remarkable physical and chemical properties which make them an excellent material for use in thin film deposition.
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Product Information
Bismuth Iron Oxide (Bi3Fe5O12) sputtering targets are high-purity materials used in the production of thin films and coatings. These targets are manufactured using advanced techniques to ensure high uniformity and good density. Bi3Fe5O12 is a type of garnet material that has magnetic properties, making it ideal for applications in the field of magneto-optical systems, spintronics, and magnetic storage media. Bi3Fe5O12 sputtering targets have high thermal and chemical stability and are suitable for use in various deposition processes, including reactive sputtering and magnetron sputtering. They offer excellent resistance to wear and possess remarkable physical and chemical properties which make them an excellent material for use in thin film deposition.
Chemical Formula:Bi3Fe5O12
Bismuth Iron Oxide (Bi3Fe5O12) Sputtering Target Specification
Shape: Disc/Rectangular/Tube
Bonding: Unbonding/Bonding
Per your request or drawing
We can customized as required
Size：
| Circular Sputtering Targets | Diameter | 1.0”2.0”3.0”4.0”5.0”6.0”up to 21” |
| Rectangular Sputtering Targets | Width x Length | 5” x 12”5” x 15”5” x 20”5” x 22”6” x 20” |
| Thickness | 0.125”, 0.25” | |
Sputtering Targets Requirements
General requirements such as size, flatness, purity, impurity content, density, N/O/C/S, grain size, and defect control. Special requirements include surface roughness, resistance value, grain size uniformity, composition and tissue uniformity, magnetic conductivity, ultra-high density, ultra-fine grains, etc.
Application of Bismuth Iron Oxide (Bi3Fe5O12) Sputtering Target
Bismuth Iron Oxide (Bi3Fe5O12) Sputtering Target is mainly used in the electronics and information industry, glass coating field, wear-resistant materials, high-temperature corrosion resistance, high-grade decorative goods, and other industries.
Packing of Bismuth Iron Oxide (Bi3Fe5O12) Sputtering Target
Standard Packing:
Typical bulk packaging includes palletized plastic 5 gallon/25 kg. pails, fiber and steel drums to 1 ton super sacks in full container (FCL) or truck load (T/L) quantities. Research and sample quantities and hygroscopic, oxidizing or other air sensitive materials may be packaged under argon or vacuum. Solutions are packaged in polypropylene, plastic or glass jars up to palletized 440 gallon liquid totes Special package is available on request.
ATTs’Bismuth Iron Oxide (Bi3Fe5O12) Sputtering Target is carefully handled to minimize damage during storage and transportation and to preserve the quality of our products in their original condition.
