Product Code : ST-Bi2O3-5N-Cu
Bismuth oxide (Bi2O3) sputtering targets are high-purity materials used for thin film deposition in various industries including electronics, optics, and photonics. These targets are manufactured using advanced techniques to ensure high purity, uniformity, and good density. Bismuth oxide is an excellent material for sputtering targets and thin film deposition due to its unique and desirable properties such as high refractive index, good chemical stability, and excellent electrical conductivity. Bi2O3 sputtering targets are suitable for various deposition processes, including reactive sputtering and magnetron sputtering. They offer outstanding resistance to wear and possess remarkable physical and chemical properties that make them the ideal material for use in thin film deposition.
Please contact us if you need customized services. We will contact you with the price and availability in 24 hours.
Product | Product Code | Purity | Size | Contact Us |
Product Information
Bismuth oxide (Bi2O3) sputtering targets are high-purity materials used for thin film deposition in various industries including electronics, optics, and photonics. These targets are manufactured using advanced techniques to ensure high purity, uniformity, and good density. Bismuth oxide is an excellent material for sputtering targets and thin film deposition due to its unique and desirable properties such as high refractive index, good chemical stability, and excellent electrical conductivity. Bi2O3 sputtering targets are suitable for various deposition processes, including reactive sputtering and magnetron sputtering. They offer outstanding resistance to wear and possess remarkable physical and chemical properties that make them the ideal material for use in thin film deposition.
Chemical Formula:Bi2O3
CAS Number: 1304-76-3
Synonyms
Dibismuth trioxide, Bismuth trioxide, Bismutum-oxydatum, Dioxodibismoxane, Bismuth(III) oxide, Keto-ketobismuthanyloxy-bismuthane, Bismuth sesquioxide, Bismuth Yellow, Bismuth(3+) oxide
Bismuth Oxide (Bi2O3) Sputtering Target Specification
Shape: Disc/Rectangular/Tube
Bonding: Unbonding/Bonding
Per your request or drawing
We can customized as required
Size:
Circular Sputtering Targets | Diameter | 1.0”2.0”3.0”4.0”5.0”6.0”up to 21” |
Rectangular Sputtering Targets | Width x Length | 5” x 12”5” x 15”5” x 20”5” x 22”6” x 20” |
Thickness | 0.125”, 0.25” |
Properties(Theoretical)
Compound Formula | Bi2O3 |
Molecular Weight | 465.96 |
Appearance | Yellow Target |
Melting Point | 817° C(1,503° F) |
Boiling Point | 1890 °C(3434 °F) |
Density | 8.9 g/cm3 |
Solubility in H2O | N/A |
Exact Mass | 465.945 g/mol |
Monoisotopic Mass | 465.945544 Da |
Sputtering Targets Requirements
General requirements such as size, flatness, purity, impurity content, density, N/O/C/S, grain size, and defect control. Special requirements include surface roughness, resistance value, grain size uniformity, composition and tissue uniformity, magnetic conductivity, ultra-high density, ultra-fine grains, etc.
Application of Bismuth Oxide (Bi2O3) Sputtering Target
Bismuth Oxide (Bi2O3) Sputtering Target is mainly used in the electronics and information industry, glass coating field, wear-resistant materials, high-temperature corrosion resistance, high-grade decorative goods, and other industries.
Packing of Bismuth Oxide (Bi2O3) Sputtering Target
Standard Packing:
Typical bulk packaging includes palletized plastic 5 gallon/25 kg. pails, fiber and steel drums to 1 ton super sacks in full container (FCL) or truck load (T/L) quantities. Research and sample quantities and hygroscopic, oxidizing or other air sensitive materials may be packaged under argon or vacuum. Solutions are packaged in polypropylene, plastic or glass jars up to palletized 440 gallon liquid totes Special package is available on request.
ATTs’Bismuth Oxide (Bi2O3) Sputtering Target is carefully handled to minimize damage during storage and transportation and to preserve the quality of our products in their original condition.
Chemical Identifiers
Linear Formula | Bi2O3 |
MDL Number | MFCD00003462 |
EC No. | 215-134-7 |
Beilstein/Reaxys No. | N/A |
Pubchem CID | 14776 |
IUPAC Name | Oxo(oxobismuthanyloxy)bismuthane |
SMILES | O=[Bi]O[Bi]=O |
InchI Identifier | InChI=1S/2Bi.3O |
InchI Key | WMWLMWRWZQELOS-UHFFFAOYSA-N |