Black Iron Oxide (Fe3O4) Sputtering Target

Product Information

Black Iron Oxide (Fe3O4) sputtering target is a solid material that is used as a source of Fe3O4 in sputtering processes. It is commonly used to produce highly uniform and high-quality thin films for various applications, including magnetic data storage, magnetic sensors, and biomedical imaging.

The manufacturing process of Fe3O4 sputtering targets involves the preparation of a target powder mixture of iron oxide (Fe2O3) and iron (Fe) through a process known as solid-state or sol-gel route. The powder mixture is then compacted and sintered to form a homogeneous, dense, and uniform sputtering target.

During sputtering, the Fe3O4 target is bombarded with high-energy ions, causing Fe3O4 atoms or ions to be ejected from its surface and deposited onto the substrate. The resulting thin film is highly uniform, and its thickness and properties can be accurately controlled.

Fe3O4 sputtering targets are widely used in the manufacture of magnetic materials, magnetic sensors, and biomedical applications. These materials are useful in various applications, such as magnetic data storage, imaging, and sensing. Additionally, Fe3O4 has high biocompatibility making it useful in various biomedical applications such as magnetic hyperthermia and drug delivery.

In summary, Fe3O4 sputtering targets are essential components in the deposition of highly uniform and controllable thin films for various applications. With the continuous development of new technologies, the potential uses of Fe3O4 thin films are only growing.

Chemical Formula:Fe3O4

CAS Number:   1317-61-9

Black Iron Oxide (Fe3O4) Sputtering Target Specification

Shape: Disc/Rectangular/Tube

Bonding: Unbonding/Bonding

Per your request or drawing

We can customized as required

Size：

Properties（Theoretical）

Sputtering Targets Requirements

General requirements such as size, flatness, purity, impurity content, density, N/O/C/S, grain size, and defect control. Special requirements include surface roughness, resistance value, grain size uniformity, composition and tissue uniformity, magnetic conductivity, ultra-high density, ultra-fine grains, etc.

Application of Black Iron Oxide (Fe3O4) Sputtering Target

Black Iron Oxide (Fe3O4) Sputtering Target is mainly used in the electronics and information industry, glass coating field, wear-resistant materials, high-temperature corrosion resistance, high-grade decorative goods, and other industries.

Packing of  Black Iron Oxide (Fe3O4) Sputtering Target

Standard Packing:

Typical bulk packaging includes palletized plastic 5 gallon/25 kg. pails, fiber and steel drums to 1 ton super sacks in full container (FCL) or truck load (T/L) quantities. Research and sample quantities and hygroscopic, oxidizing or other air sensitive materials may be packaged under argon or vacuum. Solutions are packaged in polypropylene, plastic or glass jars up to palletized 440 gallon liquid totes Special package is available on request.

ATTs’Black Iron Oxide (Fe3O4) Sputtering Target is carefully handled to minimize damage during storage and transportation and to preserve the quality of our products in their original condition.

Chemical Identifiers