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Cadmium Fuoride (CdF2) Sputtering Target

Product Code : ST-CdF2-5N-Cu

Cadmium Fluoride (CdF2) sputtering targets are used in thin film deposition processes, specifically in applications that require high-quality optical coatings and semiconductor device fabrication. CdF2 is a transparent compound with a wide bandgap, making it suitable for use in various optical and electronic applications.

Sputtering is a process where energetic ions are directed at the surface of a target material, causing atoms or molecules to be ejected and deposited onto a substrate, forming a thin film. CdF2 sputtering targets are typically made from high-purity CdF2 material, ensuring consistency and reliability in the thin film deposition process.

CdF2 sputtering targets are available in different sizes and shapes, depending on the specific deposition system requirements. These targets are commonly used in physical vapor deposition (PVD) techniques, such as magnetron sputtering or ion beam sputtering, to achieve precise and controlled deposition of CdF2 thin films.

Careful handling and proper storage of CdF2 sputtering targets are necessary to prevent contamination and damage. Additionally, proper sputtering parameters and deposition conditions are important to achieve high-quality thin films with desirable properties.

Overall, CdF2 sputtering targets are essential in the production of optical coatings and semiconductor devices, making them important components in industries such as optics, electronics, and materials science.


Please contact us if you need customized services. We will contact you with the price and availability in 24 hours.

Product Product Code Purity Size Contact Us
Cadmium Fuoride (CdF2) Sputtering Target ST-CdF2-2N-Cu 99% Customize
Cadmium Fuoride (CdF2) Sputtering Target ST-CdF2-3N-Cu 99.9% Customize
Cadmium Fuoride (CdF2) Sputtering Target ST-CdF2-4N-Cu 99.99% Customize
Cadmium Fuoride (CdF2) Sputtering Target ST-CdF2-5N-Cu 99.999% Customize

Product Information

Cadmium Fluoride (CdF2) sputtering targets are used in thin film deposition processes, specifically in applications that require high-quality optical coatings and semiconductor device fabrication. CdF2 is a transparent compound with a wide bandgap, making it suitable for use in various optical and electronic applications.

Sputtering is a process where energetic ions are directed at the surface of a target material, causing atoms or molecules to be ejected and deposited onto a substrate, forming a thin film. CdF2 sputtering targets are typically made from high-purity CdF2 material, ensuring consistency and reliability in the thin film deposition process.

CdF2 sputtering targets are available in different sizes and shapes, depending on the specific deposition system requirements. These targets are commonly used in physical vapor deposition (PVD) techniques, such as magnetron sputtering or ion beam sputtering, to achieve precise and controlled deposition of CdF2 thin films.

Careful handling and proper storage of CdF2 sputtering targets are necessary to prevent contamination and damage. Additionally, proper sputtering parameters and deposition conditions are important to achieve high-quality thin films with desirable properties.

Overall, CdF2 sputtering targets are essential in the production of optical coatings and semiconductor devices, making them important components in industries such as optics, electronics, and materials science.

Chemical Formula: CdF2



Cadmium Fuoride (CdF2) Sputtering Target Specification

Shape: Disc/Rectangular/Tube

Bonding: Unbonding/Bonding

Per your request or drawing

We can customized as required

Size:

Circular   Sputtering TargetsDiameter1.0”2.0”3.0”4.0”5.0”6.0”up to 21”
Rectangular   Sputtering TargetsWidth x Length5” x 12”5” x 15”5” x 20”5” x 22”6” x 20”
Thickness0.125”, 0.25”



Sputtering Targets Requirements

General requirements such as size, flatness, purity, impurity content, density, N/O/C/S, grain size, and defect control. Special requirements include surface roughness, resistance value, grain size uniformity, composition and tissue uniformity, magnetic conductivity, ultra-high density, ultra-fine grains, etc.


Application of Cadmium Fuoride (CdF2)  Sputtering Target

Cadmium Fuoride (CdF2)  Sputtering Target is mainly used in the electronics and information industry, glass coating field, wear-resistant materials, high-temperature corrosion resistance, high-grade decorative goods, and other industries.


Packing of Cadmium Fuoride (CdF2) Sputtering Target

Standard Packing:

Typical bulk packaging includes palletized plastic 5 gallon/25 kg. pails, fiber and steel drums to 1 ton super sacks in full container (FCL) or truck load (T/L) quantities. Research and sample quantities and hygroscopic, oxidizing or other air sensitive materials may be packaged under argon or vacuum. Solutions are packaged in polypropylene, plastic or glass jars up to palletized 440 gallon liquid totes Special package is available on request.

ATTs’Cadmium Fuoride (CdF2)  Sputtering Target is carefully handled to minimize damage during storage and transportation and to preserve the quality of our products in their original condition.


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