Product Code : ST-Ca-5N-Cu
Calcium (Ca) sputtering targets are commonly used in physical vapor deposition (PVD) processes for depositing thin films of calcium onto a substrate. These sputtering targets are made of high-purity calcium metal and are available in various shapes and sizes, such as round disks, rectangular tiles, and custom shapes.
The process of sputtering involves bombarding the target material with high-energy ions, which dislodge atoms from the target surface and deposit them onto a substrate to form a thin film. In the case of calcium sputtering, the thin film can be used for a variety of applications, such as in the manufacture of electronic devices, solar cells, and biomedical implants.
Calcium sputtering targets are typically manufactured using powder metallurgy techniques, where high-purity calcium metal is processed into a fine powder and then pressed into a solid shape under high pressure. The resulting sputtering targets are highly durable and can provide consistent, high-quality thin films in PVD processes.
Some of the key properties of calcium sputtering targets include high thermal conductivity, low electrical resistivity, and good adhesion to substrates. These properties make them an ideal choice for a wide range of applications, including electronics, optics, and energy storage.
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Product Information
Calcium (Ca) sputtering targets are commonly used in physical vapor deposition (PVD) processes for depositing thin films of calcium onto a substrate. These sputtering targets are made of high-purity calcium metal and are available in various shapes and sizes, such as round disks, rectangular tiles, and custom shapes.
The process of sputtering involves bombarding the target material with high-energy ions, which dislodge atoms from the target surface and deposit them onto a substrate to form a thin film. In the case of calcium sputtering, the thin film can be used for a variety of applications, such as in the manufacture of electronic devices, solar cells, and biomedical implants.
Calcium sputtering targets are typically manufactured using powder metallurgy techniques, where high-purity calcium metal is processed into a fine powder and then pressed into a solid shape under high pressure. The resulting sputtering targets are highly durable and can provide consistent, high-quality thin films in PVD processes.
Some of the key properties of calcium sputtering targets include high thermal conductivity, low electrical resistivity, and good adhesion to substrates. These properties make them an ideal choice for a wide range of applications, including electronics, optics, and energy storage.
Chemical Formula: Ca
CAS Number: 7440-70-2
Synonyms
N/A
Calcium (Ca) Sputtering Target Specification
Shape: Disc/Rectangular/Tube
Bonding: Unbonding/Bonding
Per your request or drawing
We can customized as required
Size：
| Circular Sputtering Targets | Diameter | 1.0”2.0”3.0”4.0”5.0”6.0”up to 21” |
| Rectangular Sputtering Targets | Width x Length | 5” x 12”5” x 15”5” x 20”5” x 22”6” x 20” |
| Thickness | 0.125”, 0.25” | |
Properties（Theoretical）
| Molecular Weight | 40.07 |
| Appearance | Silvery |
| Melting Point | 839°C |
| Boiling Point | 1484°C |
| Density | 1.55 g/cm3 |
| Solubility in H2O | N/A |
| Electrical Resistivity | 3.91 microhm-cm @ 0 °C |
| Electronegativity | 1.0 Paulings |
| Heat of Vaporization | 36.74 K-Cal/gm atom at 2467°C |
| Poisson's Ratio | 0.31 |
| Specific Heat | 0.156 Cal/g/K @ 25°C |
| Tensile Strength | N/A |
| Thermal Conductivity | 2.01 W/cm/K @ 298.2 K |
| Thermal Expansion | (25 °C) 22.3 µm·m-1·K-1 |
| Vickers Hardness | N/A |
| Young's Modulus | 20 GPa |
Sputtering Targets Requirements
General requirements such as size, flatness, purity, impurity content, density, N/O/C/S, grain size, and defect control. Special requirements include surface roughness, resistance value, grain size uniformity, composition and tissue uniformity, magnetic conductivity, ultra-high density, ultra-fine grains, etc.
Application of Calcium (Ca) Sputtering Target
Calcium (Ca) Sputtering Target is mainly used in the electronics and information industry, glass coating field, wear-resistant materials, high-temperature corrosion resistance, high-grade decorative goods, and other industries.
Packing of Calcium (Ca) Sputtering Target
Standard Packing:
Typical bulk packaging includes palletized plastic 5 gallon/25 kg. pails, fiber and steel drums to 1 ton super sacks in full container (FCL) or truck load (T/L) quantities. Research and sample quantities and hygroscopic, oxidizing or other air sensitive materials may be packaged under argon or vacuum. Solutions are packaged in polypropylene, plastic or glass jars up to palletized 440 gallon liquid totes Special package is available on request.
ATTs’Calcium (Ca) Sputtering Target is carefully handled to minimize damage during storage and transportation and to preserve the quality of our products in their original condition.
Chemical Identifiers
| Linear Formula | Ca |
| MDL Number | MFCD00085314 |
| EC No. | 231-179-5 |
| Beilstein/Reaxys No. | 4241647 |
| Pubchem CID | 5460341 |
| SMILES | [Ca] |
| InchI Identifier | InChI=1S/Ca |
| InchI Key | OYPRJOBELJOOCE-UHFFFAOYSA-N |
