Cerium Fluoride (CeF3) Sputtering Target

Product Information

Cerium Fluoride (CeF3) sputtering targets are used in thin film deposition processes, particularly in applications that require high-performance optical coatings, scintillators, and phosphor materials. CeF3 is a transparent compound with excellent optical properties, making it suitable for applications in the ultraviolet (UV) and visible light regions.

Sputtering is a deposition technique where high-energy ions bombard the surface of a target material, causing atoms or molecules to be ejected and deposited onto a substrate, forming a thin film. CeF3 sputtering targets are typically made from high-purity CeF3 material to ensure consistent and reliable film deposition.

CeF3 sputtering targets are available in various sizes and shapes to meet the specific requirements of different deposition systems. They are commonly used in physical vapor deposition (PVD) techniques like magnetron sputtering, ion beam sputtering, or electron beam evaporation to achieve precise and controlled deposition of CeF3 thin films.

Proper handling and storage of CeF3 sputtering targets are necessary to maintain their purity and prevent contamination. Additionally, optimizing the sputtering parameters and deposition conditions is crucial for obtaining high-quality thin films with desired optical properties.

Overall, CeF3 sputtering targets are critical in the production of optical coatings, scintillators, and phosphor materials, making them essential components in industries such as optics, medical imaging, lighting, and display technologies.

Chemical Formula: CeF3

CAS Number:  7758-88-5

Cerium Fluoride (CeF3) Sputtering Target Specification

Shape: Disc/Rectangular/Tube

Bonding: Unbonding/Bonding

Per your request or drawing

We can customized as required

Size：

Porperties（Theoretical）

Sputtering Targets Requirements

General requirements such as size, flatness, purity, impurity content, density, N/O/C/S, grain size, and defect control. Special requirements include surface roughness, resistance value, grain size uniformity, composition and tissue uniformity, magnetic conductivity, ultra-high density, ultra-fine grains, etc.

Application of Cerium Fluoride (CeF3) Sputtering Target

Cerium Fluoride (CeF3)  Sputtering Target is mainly used in the electronics and information industry, glass coating field, wear-resistant materials, high-temperature corrosion resistance, high-grade decorative goods, and other industries.

Packing of  Cerium Fluoride (CeF3) Sputtering Target

Standard Packing:

Typical bulk packaging includes palletized plastic 5 gallon/25 kg. pails, fiber and steel drums to 1 ton super sacks in full container (FCL) or truck load (T/L) quantities. Research and sample quantities and hygroscopic, oxidizing or other air sensitive materials may be packaged under argon or vacuum. Solutions are packaged in polypropylene, plastic or glass jars up to palletized 440 gallon liquid totes Special package is available on request.

ATTs’Cerium Fluoride (CeF3) Sputtering Target is carefully handled to minimize damage during storage and transportation and to preserve the quality of our products in their original condition.

Chemical Identifier