Cerium Oxide Sputtering Target, CeO2

Product Information

Cerium is a chemical element that originated from Ceres, the Roman God of agriculture. It was first mentioned in 1803 and observed by H. Klaproth, J. Berzelius, and W. Hisinger. The isolation was later accomplished and announced by G. Mosander. “Ce” is the canonical chemical symbol of cerium. Its atomic number in the periodic table of elements is 58 with a location at Period 6 and Group 3, belonging to the f-block. The relative atomic mass of cerium is 140.116(1) Dalton, the number in the brackets indicating the uncertainty.

Oxygen is a chemical element that originated from the Greek ‘oxy’ and ‘genes’ meaning acid-forming. It was first mentioned in 1771 and observed by W. Scheele. The isolation was later accomplished and announced by W. Scheele. “O” is the canonical chemical symbol of oxygen. Its atomic number in the periodic table of elements is 8 with a location at Period 2 and Group 16, belonging to the p-block. The relative atomic mass of oxygen is 15.9994(3) Dalton, the number in the brackets indicating the uncertainty.

ATT provides high-quality Cerium Oxide Sputtering Target for research and industry purposes at competitive prices. We can provide  Cerium Oxide Sputtering Target with different purity, size, and density according to your requirements.

Chemical Formula: CeO2
CAS Number: 1306-38-3

Synonyms

Ceric oxide, Dioxocerium, Cerium dioxide, Needlal, Ceria, Cerium(IV) oxide, Cerium(IV) hydroxide, Opaline, Cerium (IV) dioxide, Ceric dioxide, Cerium(IV)dioxide, Nidoral, Diketocerium, Dioxocerium

Cerium Oxide Sputtering Target Specification

Size：

Purity: 99.9%, 99.95%, 99.99%

Shape: Disc/Rectangular/Tube

Bonding: Unbonding/Bonding

Per your request or drawing

We can customized as required

Properties（Theoretical）

Sputtering Targets Requirements

General requirements such as size, flatness, purity, impurity content, density, N/O/C/S, grain size, and defect control. Special requirements include surface roughness, resistance value, grain size uniformity, composition and tissue uniformity, magnetic conductivity, ultra-high density, ultra-fine grains, etc.

Application of  Cerium Oxide Sputtering Target

The cerium oxide sputtering target is used for thin film deposition, decoration, semiconductor, display, LED and photovoltaic devices, functional coating as nicely as other optical information storage space industry, glass coating industry like car glass and architectural glass, optical communication, etc.

packing of Cerium Oxide Sputtering Target

Standard Packing:

Typical bulk packaging includes palletized plastic 5 gallon/25 kg. pails, fiber and steel drums to 1 ton super sacks in full container (FCL) or truck load (T/L) quantities. Research and sample quantities and hygroscopic, oxidizing or other air sensitive materials may be packaged under argon or vacuum. Solutions are packaged in polypropylene, plastic or glass jars up to palletized 440 gallon liquid totes Special package is available on request.

ATTs’Cerium Oxide  Sputtering Target is carefully handled to minimize damage during storage and transportation and to preserve the quality of our products in their original condition.

Chemical Identifiers