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Chromium Carbide (Cr3C2) Sputtering Target

Product Code : ST-Cr3C2-5N-Cu

Chromium Carbide (Cr3C2) sputtering target is a high-performance material that is used in the thin film coating industry for its excellent hardness, wear-resistance, and corrosion-resistance properties. It is a ceramic material made of chromium and carbon, and it is commonly used as a target material in the process of sputtering.

In sputtering, a cathode made of Cr3C2 material is bombarded by positive ions, which cause the release of chromium and carbon atoms from the target surface. These atoms then deposit on a substrate placed in front of the target, forming a thin film coating. The Cr3C2 sputtering target is used in the production of hard coatings, such as cutting tools, wear-resistant coatings, and decorative coatings.

The Cr3C2 sputtering target is available in various sizes and shapes, including round, rectangular, and custom shapes, to meet the specific requirements of different manufacturing processes. Its high purity and uniformity ensure consistent and reliable deposition of the desired coatings.

Cr3C2 sputtering targets have exceptional mechanical and thermal stability, high corrosion resistance, and excellent gas barrier properties. This makes them ideal for protective coatings and applications in the aerospace, automotive, and chemical industries.


Please contact us if you need customized services. We will contact you with the price and availability in 24 hours.

Product Product Code Purity Size Contact Us
Chromium Carbide (Cr3C2) Sputtering Target ST-Cr3C2-2N-Cu 99% Customize
Chromium Carbide (Cr3C2) Sputtering Target ST-Cr3C2-3N-Cu 99.9% Customize
Chromium Carbide (Cr3C2) Sputtering Target ST-Cr3C2-4N-Cu 99.99% Customize
Chromium Carbide (Cr3C2) Sputtering Target ST-Cr3C2-5N-Cu 99.999% Customize

Product Information

Chromium Carbide (Cr3C2) sputtering target is a high-performance material that is used in the thin film coating industry for its excellent hardness, wear-resistance, and corrosion-resistance properties. It is a ceramic material made of chromium and carbon, and it is commonly used as a target material in the process of sputtering.

In sputtering, a cathode made of Cr3C2 material is bombarded by positive ions, which cause the release of chromium and carbon atoms from the target surface. These atoms then deposit on a substrate placed in front of the target, forming a thin film coating. The Cr3C2 sputtering target is used in the production of hard coatings, such as cutting tools, wear-resistant coatings, and decorative coatings.

The Cr3C2 sputtering target is available in various sizes and shapes, including round, rectangular, and custom shapes, to meet the specific requirements of different manufacturing processes. Its high purity and uniformity ensure consistent and reliable deposition of the desired coatings.

Cr3C2 sputtering targets have exceptional mechanical and thermal stability, high corrosion resistance, and excellent gas barrier properties. This makes them ideal for protective coatings and applications in the aerospace, automotive, and chemical industries.

Chemical Formula:Cr3C2

CAS Number:   12012-35-0



Chromium Carbide (Cr3C2) Sputtering Target Specification

Shape: Disc/Rectangular/Tube

Bonding: Unbonding/Bonding

Per your request or drawing

We can customized as required

Size:

Circular   Sputtering TargetsDiameter1.0”2.0”3.0”4.0”5.0”6.0”up to 21”
Rectangular   Sputtering TargetsWidth x Length5” x 12”5” x 15”5” x 20”5” x 22”6” x 20”
Thickness0.125”, 0.25”


Properties(Theoretical)

Compound FormulaC2Cr3
Molecular Weight180.01
Appearancegray crystals
Melting Point1,895° C (3,443° F)
Boiling PointN/A
Density6.68 g/cm3
Solubility in H2ON/A
Exact Mass179.821536
Monoisotopic Mass179.821536




Sputtering Targets Requirements

General requirements such as size, flatness, purity, impurity content, density, N/O/C/S, grain size, and defect control. Special requirements include surface roughness, resistance value, grain size uniformity, composition and tissue uniformity, magnetic conductivity, ultra-high density, ultra-fine grains, etc.


Application of Chromium Carbide (Cr3C2) Sputtering Target

Chromium Carbide (Cr3C2) Sputtering Target is mainly used in the electronics and information industry, glass coating field, wear-resistant materials, high-temperature corrosion resistance, high-grade decorative goods, and other industries.


Packing of  Chromium Carbide (Cr3C2) Sputtering Target

Standard Packing:

Typical bulk packaging includes palletized plastic 5 gallon/25 kg. pails, fiber and steel drums to 1 ton super sacks in full container (FCL) or truck load (T/L) quantities. Research and sample quantities and hygroscopic, oxidizing or other air sensitive materials may be packaged under argon or vacuum. Solutions are packaged in polypropylene, plastic or glass jars up to palletized 440 gallon liquid totes Special package is available on request.

ATTs’Chromium Carbide (Cr3C2) Sputtering Target is carefully handled to minimize damage during storage and transportation and to preserve the quality of our products in their original condition.


Chemical Identifiers

Linear FormulaCr3C2
MDL NumberMFCD00016041
EC No.234-576-1
Beilstein/Reaxys No.N/A
Pubchem CID3650773
IUPAC NameN/A
SMILES[Cr]#C[Cr]C#[Cr]
InchI IdentifierInChI=1S/2C.3Cr
InchI KeyUFGZSIPAQKLCGR-UHFFFAOYSA-N




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