Product Code : ST-Cr/Co-5N-Cu
Chromium Cobalt (Cr/Co) Sputtering Targets are a type of material used in the manufacturing of thin-film coatings for electronic and optical devices. Sputtering is a process used to deposit thin films of material onto a substrate. The process involves the use of a sputtering target, which is bombarded with energetic ions that knock atoms off the surface of the target material. These atoms then deposit onto the substrate material, forming a thin film.
Cr/Co sputtering targets are used in a variety of applications, including the manufacture of hard disks for data storage, optical coatings for lenses and filters, and electronic devices such as photovoltaic cells and flat panel displays. The combination of chromium and cobalt provides a high resistance to wear and corrosion, making it an ideal material for these applications.
Cr/Co sputtering targets are typically made using a powder metallurgy process, where powders of chromium and cobalt are mixed and then compressed into a solid disc. The resulting disc is then heated and sintered to form a dense, homogeneous target material. Targets can be produced in a range of sizes and shapes to meet the specific needs of different sputtering systems.
Overall, Cr/Co sputtering targets play a critical role in the manufacturing of advanced electronic and optical devices, helping to provide high-quality thin-film coatings with exceptional resistance and durability.
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Product Information
Chromium Cobalt (Cr/Co) Sputtering Targets are a type of material used in the manufacturing of thin-film coatings for electronic and optical devices. Sputtering is a process used to deposit thin films of material onto a substrate. The process involves the use of a sputtering target, which is bombarded with energetic ions that knock atoms off the surface of the target material. These atoms then deposit onto the substrate material, forming a thin film.
Cr/Co sputtering targets are used in a variety of applications, including the manufacture of hard disks for data storage, optical coatings for lenses and filters, and electronic devices such as photovoltaic cells and flat panel displays. The combination of chromium and cobalt provides a high resistance to wear and corrosion, making it an ideal material for these applications.
Cr/Co sputtering targets are typically made using a powder metallurgy process, where powders of chromium and cobalt are mixed and then compressed into a solid disc. The resulting disc is then heated and sintered to form a dense, homogeneous target material. Targets can be produced in a range of sizes and shapes to meet the specific needs of different sputtering systems.
Overall, Cr/Co sputtering targets play a critical role in the manufacturing of advanced electronic and optical devices, helping to provide high-quality thin-film coatings with exceptional resistance and durability.
Chemical Formula:Cr/Co
Synonyms
UNS R30605 (L605, Alloy 25, 2.4964) Alloy
Chromium Cobalt (Cr/Co) Sputtering Target Specification
Shape: Disc/Rectangular/Tube
Bonding: Unbonding/Bonding
Per your request or drawing
We can customized as required
Size：
| Circular Sputtering Targets | Diameter | 1.0”2.0”3.0”4.0”5.0”6.0”up to 21” |
| Rectangular Sputtering Targets | Width x Length | 5” x 12”5” x 15”5” x 20”5” x 22”6” x 20” |
| Thickness | 0.125”, 0.25” | |
Properties（Theoretical）
| Appearance | Target |
| Melting Point | 1330 °C (2430 °F) |
| Boiling Point | N/A |
| Density | 10 g/cm3 |
| Solubility in H2O | N/A |
| Electrical Resistivity | -6 10x Ω-m |
| Poisson's Ratio | 0.29 |
| Specific Heat | 390 J/kg-K |
| Tensile Strength | 1130 to 1900 MPa (Ultimate)/ 470 to 1600 MPa (Yield) |
| Thermal Conductivity | 9.4 W/m-K |
| Thermal Expansion | 12 µm/m-K |
| Young's Modulus | 210 GPa |
Sputtering Targets Requirements
General requirements such as size, flatness, purity, impurity content, density, N/O/C/S, grain size, and defect control. Special requirements include surface roughness, resistance value, grain size uniformity, composition and tissue uniformity, magnetic conductivity, ultra-high density, ultra-fine grains, etc.
Application of Chromium Cobalt (Cr/Co) Sputtering Target
Chromium Cobalt (Cr/Co) Sputtering Target is mainly used in the electronics and information industry, glass coating field, wear-resistant materials, high-temperature corrosion resistance, high-grade decorative goods, and other industries.
Packing of Chromium Cobalt (Cr/Co) Sputtering Target
Standard Packing:
Typical bulk packaging includes palletized plastic 5 gallon/25 kg. pails, fiber and steel drums to 1 ton super sacks in full container (FCL) or truck load (T/L) quantities. Research and sample quantities and hygroscopic, oxidizing or other air sensitive materials may be packaged under argon or vacuum. Solutions are packaged in polypropylene, plastic or glass jars up to palletized 440 gallon liquid totes Special package is available on request.
ATTs Chromium Cobalt (Cr/Co) Sputtering Target is carefully handled to minimize damage during storage and transportation and to preserve the quality of our products in their original condition.
