Chromium Fluoride (CrF3) Sputtering Target

Product Information

Chromium Fluoride (CrF3) Sputtering Target is a specialized thin film deposition material used in physical vapor deposition (PVD) processes. It is commonly employed in semiconductor, optical coating, and thin film research industries.

CrF3 sputtering targets are made of high-purity CrF3 material and are designed to be compatible with various sputtering systems, such as magnetron sputtering and RF sputtering. These targets are typically circular or rectangular in shape and are available in different sizes and dimensions.

Chromium fluoride is a compound with the chemical formula CrF3, consisting of chromium and fluorine. It possesses excellent thermal stability and can be used in high-temperature deposition processes. CrF3 targets are used to deposit thin films of chromium fluoride onto substrates, providing them with properties such as corrosion resistance, wear resistance, and optical transparency.

Some notable characteristics and advantages of CrF3 sputtering targets include high purity, good film adhesion, uniform film deposition, and excellent film quality. These targets are engineered to have controlled impurity levels and grain structures, ensuring reliable and reproducible film properties.

In summary, CrF3 sputtering targets play a vital role in the production of advanced coatings and films, enabling the development of high-performance electronic and optical devices.

Chemical Formula: CrF3

CAS Number:  7788-97-8

Chromium Fluoride (CrF3) Sputtering Target Specification

Shape: Disc/Rectangular/Tube

Bonding: Unbonding/Bonding

Per your request or drawing

We can customized as required

Size：

Porperties（Theoretical）

Sputtering Targets Requirements

General requirements such as size, flatness, purity, impurity content, density, N/O/C/S, grain size, and defect control. Special requirements include surface roughness, resistance value, grain size uniformity, composition and tissue uniformity, magnetic conductivity, ultra-high density, ultra-fine grains, etc.

Application of Chromium Fluoride (CrF3) Sputtering Target

Chromium Fluoride (CrF3) Sputtering Target is mainly used in the electronics and information industry, glass coating field, wear-resistant materials, high-temperature corrosion resistance, high-grade decorative goods, and other industries.

Packing of  Chromium Fluoride (CrF3)Sputtering Target

Standard Packing:

Typical bulk packaging includes palletized plastic 5 gallon/25 kg. pails, fiber and steel drums to 1 ton super sacks in full container (FCL) or truck load (T/L) quantities. Research and sample quantities and hygroscopic, oxidizing or other air sensitive materials may be packaged under argon or vacuum. Solutions are packaged in polypropylene, plastic or glass jars up to palletized 440 gallon liquid totes Special package is available on request.

ATTs’Chromium Fluoride (CrF3) Sputtering Target is carefully handled to minimize damage during storage and transportation and to preserve the quality of our products in their original condition.

Chemical Identifier