Product Code : ST-Cr/Ni-5N-Cu
Chromium nickel (Cr/Ni) sputtering targets are widely used in the manufacture of thin films for various applications in the semiconductor, solar panel, and electronics industries. The targets are made from a high purity alloy of chromium and nickel, with different ratios of the two elements depending on the specific application requirements.
The properties of the Cr/Ni sputtering targets include high thermal stability, excellent hardness, good corrosion resistance, and high electrical conductivity, making them ideal for use in various applications. The targets are available in different shapes and sizes, including round, rectangle, and custom-designed shapes, to meet the specific requirements of different applications.
The process involved in the production of Cr/Ni sputtering targets involves powder metallurgy techniques or mechanical alloying processes. During production, the materials are refined to eliminate porosity, improve the microstructure, and ensure uniformity of the target. This results in a high-quality target that delivers superior performance in the targeted applications.
In conclusion, Cr/Ni sputtering targets are critical components in the manufacture of thin films for various industrial applications. They offer excellent properties, high purity, and precision design, which enable them to deliver exceptional performance in applications such as semiconductors, solar panels, and electronics.
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Product Information
Chromium nickel (Cr/Ni) sputtering targets are widely used in the manufacture of thin films for various applications in the semiconductor, solar panel, and electronics industries. The targets are made from a high purity alloy of chromium and nickel, with different ratios of the two elements depending on the specific application requirements.
The properties of the Cr/Ni sputtering targets include high thermal stability, excellent hardness, good corrosion resistance, and high electrical conductivity, making them ideal for use in various applications. The targets are available in different shapes and sizes, including round, rectangle, and custom-designed shapes, to meet the specific requirements of different applications.
The process involved in the production of Cr/Ni sputtering targets involves powder metallurgy techniques or mechanical alloying processes. During production, the materials are refined to eliminate porosity, improve the microstructure, and ensure uniformity of the target. This results in a high-quality target that delivers superior performance in the targeted applications.
In conclusion, Cr/Ni sputtering targets are critical components in the manufacture of thin films for various industrial applications. They offer excellent properties, high purity, and precision design, which enable them to deliver exceptional performance in applications such as semiconductors, solar panels, and electronics.
Chemical Formula:Cr/Ni
Chromium Nickel (Cr/Ni) Sputtering Target Specification
Shape: Disc/Rectangular/Tube
Bonding: Unbonding/Bonding
Per your request or drawing
We can customized as required
Size：
| Circular Sputtering Targets | Diameter | 1.0”2.0”3.0”4.0”5.0”6.0”up to 21” |
| Rectangular Sputtering Targets | Width x Length | 5” x 12”5” x 15”5” x 20”5” x 22”6” x 20” |
| Thickness | 0.125”, 0.25” | |
Sputtering Targets Requirements
General requirements such as size, flatness, purity, impurity content, density, N/O/C/S, grain size, and defect control. Special requirements include surface roughness, resistance value, grain size uniformity, composition and tissue uniformity, magnetic conductivity, ultra-high density, ultra-fine grains, etc.
Application of Chromium Nickel (Cr/Ni) Sputtering Target
Chromium Nickel (Cr/Ni) Sputtering Target is mainly used in the electronics and information industry, glass coating field, wear-resistant materials, high-temperature corrosion resistance, high-grade decorative goods, and other industries.
Packing of Chromium Nickel (Cr/Ni) Sputtering Target
Standard Packing:
Typical bulk packaging includes palletized plastic 5 gallon/25 kg. pails, fiber and steel drums to 1 ton super sacks in full container (FCL) or truck load (T/L) quantities. Research and sample quantities and hygroscopic, oxidizing or other air sensitive materials may be packaged under argon or vacuum. Solutions are packaged in polypropylene, plastic or glass jars up to palletized 440 gallon liquid totes Special package is available on request.
ATTs Chromium Nickel (Cr/Ni) Sputtering Target is carefully handled to minimize damage during storage and transportation and to preserve the quality of our products in their original condition.
