Product Code : ST-Cr/Ti-5N-Cu
Chromium titanium (Cr/Ti) sputtering targets are used in the production of thin films for various applications such as aerospace, automotive, and electronics industries. The targets are made from a high purity alloy of chromium and titanium, with different ratios of the two elements depending on the specific application requirements.
Cr/Ti sputtering targets offer excellent properties such as high hardness, wear resistance, and low coefficient of friction, making them ideal for use in applications where durability and resistance to wear and tear are critical. They are also known to have excellent adhesion properties, making them suitable for bonding with various materials.
The Cr/Ti sputtering targets are fabricated using advanced powder metallurgy techniques, such as hot isostatic pressing (HIP), vacuum melting, casting or forging. The resulting targets are usually uniform, dense, and free of porosity, ensuring they are of high quality and able to meet the stringent requirements of various applications.
These targets are available in various shapes and sizes, including circular, square, rectangular, and custom shapes, to cater to the diverse needs of different applications. In addition, Cr/Ti sputtering targets are also available in various purities to suit different application requirements.
In conclusion, Cr/Ti sputtering targets are critical components in the manufacture of thin films used in different industrial applications. They offer excellent properties such as durability, wear resistance, adhesion, and low coefficient of friction, which make them suitable for use in various industries such as aerospace, automotive, and electronics.
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Product Information
Chromium titanium (Cr/Ti) sputtering targets are used in the production of thin films for various applications such as aerospace, automotive, and electronics industries. The targets are made from a high purity alloy of chromium and titanium, with different ratios of the two elements depending on the specific application requirements.
Cr/Ti sputtering targets offer excellent properties such as high hardness, wear resistance, and low coefficient of friction, making them ideal for use in applications where durability and resistance to wear and tear are critical. They are also known to have excellent adhesion properties, making them suitable for bonding with various materials.
The Cr/Ti sputtering targets are fabricated using advanced powder metallurgy techniques, such as hot isostatic pressing (HIP), vacuum melting, casting or forging. The resulting targets are usually uniform, dense, and free of porosity, ensuring they are of high quality and able to meet the stringent requirements of various applications.
These targets are available in various shapes and sizes, including circular, square, rectangular, and custom shapes, to cater to the diverse needs of different applications. In addition, Cr/Ti sputtering targets are also available in various purities to suit different application requirements.
In conclusion, Cr/Ti sputtering targets are critical components in the manufacture of thin films used in different industrial applications. They offer excellent properties such as durability, wear resistance, adhesion, and low coefficient of friction, which make them suitable for use in various industries such as aerospace, automotive, and electronics.
Chemical Formula:Cr/Ti
Chromium Titanium (Cr/Ti) Sputtering Target Specification
Shape: Disc/Rectangular/Tube
Bonding: Unbonding/Bonding
Per your request or drawing
We can customized as required
Size：
| Circular Sputtering Targets | Diameter | 1.0”2.0”3.0”4.0”5.0”6.0”up to 21” |
| Rectangular Sputtering Targets | Width x Length | 5” x 12”5” x 15”5” x 20”5” x 22”6” x 20” |
| Thickness | 0.125”, 0.25” | |
Sputtering Targets Requirements
General requirements such as size, flatness, purity, impurity content, density, N/O/C/S, grain size, and defect control. Special requirements include surface roughness, resistance value, grain size uniformity, composition and tissue uniformity, magnetic conductivity, ultra-high density, ultra-fine grains, etc.
Application of Chromium Titanium (Cr/Ti)Sputtering Target
Chromium Titanium (Cr/Ti) Sputtering Target is mainly used in the electronics and information industry, glass coating field, wear-resistant materials, high-temperature corrosion resistance, high-grade decorative goods, and other industries.
Packing of Chromium Titanium (Cr/Ti) Sputtering Target
Standard Packing:
Typical bulk packaging includes palletized plastic 5 gallon/25 kg. pails, fiber and steel drums to 1 ton super sacks in full container (FCL) or truck load (T/L) quantities. Research and sample quantities and hygroscopic, oxidizing or other air sensitive materials may be packaged under argon or vacuum. Solutions are packaged in polypropylene, plastic or glass jars up to palletized 440 gallon liquid totes Special package is available on request.
ATTs Chromium Titanium (Cr/Ti) Sputtering Target is carefully handled to minimize damage during storage and transportation and to preserve the quality of our products in their original condition.
