Product Code : ST-Cr/V-5N-Cu
Chromium vanadium (Cr/V) sputtering targets are widely used in the production of thin films for various industrial applications such as semiconductor and optical coatings. The targets are made from high purity chromium vanadium alloys with different ratios of the two metals, depending on the specific application.
Cr/V sputtering targets offer excellent properties such as high hardness, good corrosion resistance, and excellent thermal conductivity. These properties make them ideal for use in applications where high temperature and pressure environments are encountered. They are also compatible with other materials, including silicon, germanium, and oxides.
The production process of Cr/V sputtering targets involves powder metallurgy techniques such as hot pressing, vacuum melting, and forging, followed by machining to achieve the desired shape and dimensions. The resulting targets are uniform, dense, and free from porosity, ensuring good bonding with the substrate and high sputtering rates.
Cr/V sputtering targets are available in a wide range of shapes and sizes, including round, rectangular, and custom-designed shapes, to meet the diverse needs of different applications. They are also available in various purities to meet different application requirements.
In conclusion, Cr/V sputtering targets are essential components in the manufacture of thin films for various industrial applications. They offer excellent properties, high temperature resistance, good corrosion resistance, and compatibility with other materials, making them ideal for use in applications such as semiconductor and optical coatings.
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Product Information
Chromium vanadium (Cr/V) sputtering targets are widely used in the production of thin films for various industrial applications such as semiconductor and optical coatings. The targets are made from high purity chromium vanadium alloys with different ratios of the two metals, depending on the specific application.
Cr/V sputtering targets offer excellent properties such as high hardness, good corrosion resistance, and excellent thermal conductivity. These properties make them ideal for use in applications where high temperature and pressure environments are encountered. They are also compatible with other materials, including silicon, germanium, and oxides.
The production process of Cr/V sputtering targets involves powder metallurgy techniques such as hot pressing, vacuum melting, and forging, followed by machining to achieve the desired shape and dimensions. The resulting targets are uniform, dense, and free from porosity, ensuring good bonding with the substrate and high sputtering rates.
Cr/V sputtering targets are available in a wide range of shapes and sizes, including round, rectangular, and custom-designed shapes, to meet the diverse needs of different applications. They are also available in various purities to meet different application requirements.
In conclusion, Cr/V sputtering targets are essential components in the manufacture of thin films for various industrial applications. They offer excellent properties, high temperature resistance, good corrosion resistance, and compatibility with other materials, making them ideal for use in applications such as semiconductor and optical coatings.
Chemical Formula:Cr/V
CAS Number: 89559-65-9
Synonyms
Chromium-vanadium steel, CrV metal, chrome vanadium, CV
Chromium Vanadium (Cr/V) Sputtering Target Specification
Shape: Disc/Rectangular/Tube
Bonding: Unbonding/Bonding
Per your request or drawing
We can customized as required
Size：
| Circular Sputtering Targets | Diameter | 1.0”2.0”3.0”4.0”5.0”6.0”up to 21” |
| Rectangular Sputtering Targets | Width x Length | 5” x 12”5” x 15”5” x 20”5” x 22”6” x 20” |
| Thickness | 0.125”, 0.25” | |
Properties（Theoretical）
| Compound Formula | CrV |
| Molecular Weight | 102.94 |
| Appearance | Gray Target |
| Melting Point | N/A |
| Boiling Point | N/A |
| Density | N/A |
| Solubility in H2O | N/A |
| Exact Mass | 102.884 g/mol |
| Monoisotopic Mass | 102.884 g/mol |
Sputtering Targets Requirements
General requirements such as size, flatness, purity, impurity content, density, N/O/C/S, grain size, and defect control. Special requirements include surface roughness, resistance value, grain size uniformity, composition and tissue uniformity, magnetic conductivity, ultra-high density, ultra-fine grains, etc.
Application of Chromium Vanadium (Cr/V) Sputtering Target
Chromium Vanadium (Cr/V) Sputtering Target is mainly used in the electronics and information industry, glass coating field, wear-resistant materials, high-temperature corrosion resistance, high-grade decorative goods, and other industries.
Packing of Chromium Vanadium (Cr/V) Sputtering Target
Standard Packing:
Typical bulk packaging includes palletized plastic 5 gallon/25 kg. pails, fiber and steel drums to 1 ton super sacks in full container (FCL) or truck load (T/L) quantities. Research and sample quantities and hygroscopic, oxidizing or other air sensitive materials may be packaged under argon or vacuum. Solutions are packaged in polypropylene, plastic or glass jars up to palletized 440 gallon liquid totes Special package is available on request.
ATTs Chromium Vanadium (Cr/V) Sputtering Target is carefully handled to minimize damage during storage and transportation and to preserve the quality of our products in their original condition.
Chemical Identifiers
| Linear Formula | Cr-V |
| MDL Number | N/A |
| EC No. | N/A |
| Pubchem CID | 10285781 |
| IUPAC Name | chromium; vanadium |
| SMILES | [V].[Cr] |
| InchI Identifier | InChI=1S/Cr.V |
| InchI Key | WFISYBKOIKMYLZ-UHFFFAOYSA-N |
