Product Code : ST-Co/Fe-5N-Cu
Cobalt Iron (Co/Fe) sputtering target is a type of thin film deposition target that is used in physical vapor deposition (PVD) processes to produce thin film coatings on various substrates. The Co/Fe sputtering target is made by blending cobalt and iron metal powders in a specific ratio, which is then pressed and sintered to produce a high-density target with superior purity and uniformity.
Co/Fe sputtering targets find a wide range of applications in the manufacturing of magnetic recording media for hard disk drives (HDDs), magnetic sensors, and magnetic memory devices. The Co/Fe thin films exhibit excellent magnetic properties, such as high magnetic moment, low coercivity, and high perpendicular magnetic anisotropy, making them ideal for use in various magnetic devices.
In the manufacturing of HDDs, Co/Fe thin films are used as a magnetic recording layer. The Co/Fe layer provides a high magnetic moment and low coercivity, which leads to stable magnetization and enhanced recording density. Additionally, Co/Fe thin films are used in the production of magnetic sensors, such as magneto-resistive sensors, where they provide high sensitivity and resolution.
Co/Fe sputtering targets are also used in the production of magnetic memory devices, such as magnetic random-access memory (MRAM) and spin-transfer torque magnetic random-access memory (STT-MRAM). These devices use the magnetic properties of Co/Fe thin films to store and read data, providing high-speed read and write operations, low power consumption, and non-volatility.
In summary, Co/Fe sputtering targets are a crucial material in the production of various magnetic devices. They provide excellent magnetic properties, high purity, and uniformity, making them ideal for use in various thin film deposition applications.
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Product Information
Cobalt Iron (Co/Fe) sputtering target is a type of thin film deposition target that is used in physical vapor deposition (PVD) processes to produce thin film coatings on various substrates. The Co/Fe sputtering target is made by blending cobalt and iron metal powders in a specific ratio, which is then pressed and sintered to produce a high-density target with superior purity and uniformity.
Co/Fe sputtering targets find a wide range of applications in the manufacturing of magnetic recording media for hard disk drives (HDDs), magnetic sensors, and magnetic memory devices. The Co/Fe thin films exhibit excellent magnetic properties, such as high magnetic moment, low coercivity, and high perpendicular magnetic anisotropy, making them ideal for use in various magnetic devices.
In the manufacturing of HDDs, Co/Fe thin films are used as a magnetic recording layer. The Co/Fe layer provides a high magnetic moment and low coercivity, which leads to stable magnetization and enhanced recording density. Additionally, Co/Fe thin films are used in the production of magnetic sensors, such as magneto-resistive sensors, where they provide high sensitivity and resolution.
Co/Fe sputtering targets are also used in the production of magnetic memory devices, such as magnetic random-access memory (MRAM) and spin-transfer torque magnetic random-access memory (STT-MRAM). These devices use the magnetic properties of Co/Fe thin films to store and read data, providing high-speed read and write operations, low power consumption, and non-volatility.
In summary, Co/Fe sputtering targets are a crucial material in the production of various magnetic devices. They provide excellent magnetic properties, high purity, and uniformity, making them ideal for use in various thin film deposition applications.
Chemical Formula:Co/Fe
Synonyms
Iron-cobalt, FeCo, cobalt-iron, CoFe, Fe-Co, Co-Fe Alloy , Permendur Alloy, Fe-Co 50/50, 50Fe-50Co, VACODUR 50, VACOFLUX 50, VACOFLUX 17, VACOFLUX 48, soft magnetic alloys, UNS R30155, Grade 661
Cobalt Iron (Co/Fe) Sputtering Target Specification
Shape: Disc/Rectangular/Tube
Bonding: Unbonding/Bonding
Per your request or drawing
We can customized as required
Size：
| Circular Sputtering Targets | Diameter | 1.0”2.0”3.0”4.0”5.0”6.0”up to 21” |
| Rectangular Sputtering Targets | Width x Length | 5” x 12”5” x 15”5” x 20”5” x 22”6” x 20” |
| Thickness | 0.125”, 0.25” | |
Properties（Theoretical）
| Appearance | Target |
| Melting Point | N/A |
| Boiling Point | N/A |
| Density | 8.6 g/cm3 |
| Solubility in H2O | N/A |
| Poisson's Ratio | 0.29 |
| Specific Heat | 430 J/kg-K |
| Tensile Strength | 870 MPa (Ultimate)/ 400 MPa (Yield) |
| Thermal Expansion | 13 µm/m-K |
| Young's Modulus | 230 GPa |
Sputtering Targets Requirements
General requirements such as size, flatness, purity, impurity content, density, N/O/C/S, grain size, and defect control. Special requirements include surface roughness, resistance value, grain size uniformity, composition and tissue uniformity, magnetic conductivity, ultra-high density, ultra-fine grains, etc.
Application of Cobalt Iron (Co/Fe) Sputtering Target
Cobalt Iron (Co/Fe) Sputtering Target is mainly used in the electronics and information industry, glass coating field, wear-resistant materials, high-temperature corrosion resistance, high-grade decorative goods, and other industries.
Packing of Cobalt Iron (Co/Fe) Sputtering Target
Standard Packing:
Typical bulk packaging includes palletized plastic 5 gallon/25 kg. pails, fiber and steel drums to 1 ton super sacks in full container (FCL) or truck load (T/L) quantities. Research and sample quantities and hygroscopic, oxidizing or other air sensitive materials may be packaged under argon or vacuum. Solutions are packaged in polypropylene, plastic or glass jars up to palletized 440 gallon liquid totes Special package is available on request.
ATTs’Cobalt Iron (Co/Fe) Sputtering Target is carefully handled to minimize damage during storage and transportation and to preserve the quality of our products in their original condition.
