Cobalt Nickel (Co/Ni) Sputtering Target

Product Information

Cobalt Nickel (Co/Ni) sputtering target is a type of thin film deposition target utilized in physical vapor deposition (PVD) processes to fabricate thin film coatings on different substrates. The Co/Ni sputtering target was created by blending cobalt and nickel metal powders in a particular ratio, which was then pressed and sintered to achieve a high-density target with superior purity and uniformity.

Co/Ni sputtering targets are utilized in the production of magnetic recording media for hard disk drives (HDDs). Co/Ni thin films are applied as a magnetic recording layer, providing increased areal density and reducing noise and cross-talk on the disk, which leads to improved performance of the HDD.

Co/Ni sputtering targets are also utilized in the production of magnetic sensor devices such as magnetic field sensors and magneto-resistive sensors. In these applications, Co/Ni thin films are used as a sensing layer, providing high sensitivity, resolution, and low noise characteristics in the sensor device.

Co/Ni sputtering targets are also used in electroplating applications, where a thin Co/Ni coating is plated onto various substrates to provide enhanced corrosion resistance, wear resistance, and adhesion. These coatings are used in automotive and aerospace industries to improve part performance and longevity.

In conclusion, Co/Ni sputtering targets are a crucial material in the production of various magnetic and electroplating devices and offer excellent magnetic properties, high purity, and homogeneous structure, making them ideal for thin film deposition applications.

Chemical Formula:Co/Ni

Synonyms

Cobalt-nickel superalloy, CAS 89088-09-5, CoNi, NiColoy, NiHard

Scandium (Sc) Sputtering Target Specification

Shape: Disc/Rectangular/Tube

Bonding: Unbonding/Bonding

Per your request or drawing

We can customized as required

Size：

Sputtering Targets Requirements

General requirements such as size, flatness, purity, impurity content, density, N/O/C/S, grain size, and defect control. Special requirements include surface roughness, resistance value, grain size uniformity, composition and tissue uniformity, magnetic conductivity, ultra-high density, ultra-fine grains, etc.

Application of Cobalt Nickel (Co/Ni) Sputtering Target

Cobalt Nickel (Co/Ni)  Sputtering Target is mainly used in the electronics and information industry, glass coating field, wear-resistant materials, high-temperature corrosion resistance, high-grade decorative goods, and other industries.

Packing of  Cobalt Nickel (Co/Ni) Sputtering Target

Standard Packing:

Typical bulk packaging includes palletized plastic 5 gallon/25 kg. pails, fiber and steel drums to 1 ton super sacks in full container (FCL) or truck load (T/L) quantities. Research and sample quantities and hygroscopic, oxidizing or other air sensitive materials may be packaged under argon or vacuum. Solutions are packaged in polypropylene, plastic or glass jars up to palletized 440 gallon liquid totes Special package is available on request.

ATTs’Cobalt Nickel (Co/Ni) Sputtering Target is carefully handled to minimize damage during storage and transportation and to preserve the quality of our products in their original condition.

Chemical Identifiers