Cobalt Nickel Chromium (Co/Ni/Cr) Sputtering Target

Product Information

Cobalt Nickel Chromium (Co/Ni/Cr) sputtering target is a type of thin film deposition target used in physical vapor deposition (PVD) processes to produce thin film coatings on various substrates. The Co/Ni/Cr sputtering target is made by blending cobalt, nickel, and chromium metal powders in a specific ratio, which is then pressed and sintered to produce a high-density target with superior purity and uniformity.

Co/Ni/Cr sputtering targets find a wide range of applications in the manufacturing of surface coatings, corrosion-resistant coatings, and wear-resistant coatings. The Co/Ni/Cr thin films exhibit excellent properties, such as high hardness, corrosion resistance, and wear resistance, making them ideal for use in various surface coating applications.

One of the primary applications of Co/Ni/Cr sputtering targets is in the production of tools and machine parts. The Co/Ni/Cr thin films provide excellent wear resistance and reduce friction, leading to longer tool life and improved performance of the machine parts.

Co/Ni/Cr sputtering targets are also used in the production of decorative and protective coatings. The Co/Ni/Cr thin films can be deposited onto various metal and plastic substrates to provide a corrosion-resistant and scratch-resistant coating, which enhances the durability and appearance of the finished product.

In the aerospace industry, Co/Ni/Cr coatings are used on engine components and turbine blades to provide high-temperature corrosion resistance and wear resistance. Similarly, the Co/Ni/Cr coatings are used in the automotive industry to provide corrosion resistance and improve the engine's performance.

In conclusion, Co/Ni/Cr sputtering targets are a vital material for thin film deposition technology and find a wide range of applications in various industrial fields. They provide excellent properties such as high hardness, corrosion resistance, wear resistance, and improve the performance of the coated components.

Chemical Formula:Co/Ni/Cr

Synonyms

UNS R30035 (2.4999) Co-Ni-Cr-Mo Alloy

Cobalt Nickel Chromium (Co/Ni/Cr) Sputtering Target Specification

Shape: Disc/Rectangular/Tube

Bonding: Unbonding/Bonding

Per your request or drawing

We can customized as required

Size：

Properties（Theoretical）

Sputtering Targets Requirements

General requirements such as size, flatness, purity, impurity content, density, N/O/C/S, grain size, and defect control. Special requirements include surface roughness, resistance value, grain size uniformity, composition and tissue uniformity, magnetic conductivity, ultra-high density, ultra-fine grains, etc.

Application of Cobalt Nickel Chromium (Co/Ni/Cr) Sputtering Target

Cobalt Nickel Chromium (Co/Ni/Cr) Sputtering Target is mainly used in the electronics and information industry, glass coating field, wear-resistant materials, high-temperature corrosion resistance, high-grade decorative goods, and other industries.

Packing of  Cobalt Nickel Chromium (Co/Ni/Cr) Sputtering Target

Standard Packing:

Typical bulk packaging includes palletized plastic 5 gallon/25 kg. pails, fiber and steel drums to 1 ton super sacks in full container (FCL) or truck load (T/L) quantities. Research and sample quantities and hygroscopic, oxidizing or other air sensitive materials may be packaged under argon or vacuum. Solutions are packaged in polypropylene, plastic or glass jars up to palletized 440 gallon liquid totes Special package is available on request.

ATTs’Cobalt Nickel Chromium (Co/Ni/Cr) Sputtering Target is carefully handled to minimize damage during storage and transportation and to preserve the quality of our products in their original condition.