Product Code : ST-CoO-5N-Cu
Cobalt oxide (CoO) sputtering targets are high-purity materials used for thin film deposition in various industrial applications. These targets are manufactured using advanced techniques to ensure high purity, uniformity, and good density. Cobalt oxide is a greyish-black material that is widely used in the production of magnetic and optical storage media, as well as in the fields of catalysis and energy storage. At the same time, CoO sputtering targets are suitable for use in various deposition processes, including reactive sputtering and magnetron sputtering. They offer excellent resistance to wear and possess remarkable physical and chemical properties that make them an ideal material for use in thin film deposition.
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Product Information
Cobalt oxide (CoO) sputtering targets are high-purity materials used for thin film deposition in various industrial applications. These targets are manufactured using advanced techniques to ensure high purity, uniformity, and good density. Cobalt oxide is a greyish-black material that is widely used in the production of magnetic and optical storage media, as well as in the fields of catalysis and energy storage. At the same time, CoO sputtering targets are suitable for use in various deposition processes, including reactive sputtering and magnetron sputtering. They offer excellent resistance to wear and possess remarkable physical and chemical properties that make them an ideal material for use in thin film deposition.
Chemical Formula:CoO
CAS Number: 1307-96-6
Synonyms
Cobalt(2+) oxide; Cobaltous oxide; Cobalt monoxide; Cobalt oxide CoO
Cobalt Oxide (CoO) Sputtering Target Specification
Shape: Disc/Rectangular/Tube
Bonding: Unbonding/Bonding
Per your request or drawing
We can customized as required
Size:
Circular Sputtering Targets | Diameter | 1.0”2.0”3.0”4.0”5.0”6.0”up to 21” |
Rectangular Sputtering Targets | Width x Length | 5” x 12”5” x 15”5” x 20”5” x 22”6” x 20” |
Thickness | 0.125”, 0.25” |
Properties(Theoretical)
Compound Formula | CoO |
Molecular Weight | 74.9326 g/mol |
Appearance | Gray to black solid |
Melting Point | 1933 °C (3511 °F) |
Boiling Point | N/A |
Density | 6.1 g/cm3 |
Solubility in H2O | N/A |
Exact Mass | 74.9281 g/mol |
Monoisotopic Mass | 74.928115 Da |
Sputtering Targets Requirements
General requirements such as size, flatness, purity, impurity content, density, N/O/C/S, grain size, and defect control. Special requirements include surface roughness, resistance value, grain size uniformity, composition and tissue uniformity, magnetic conductivity, ultra-high density, ultra-fine grains, etc.
Application of Cobalt Oxide (CoO) Sputtering Target
Cobalt Oxide (CoO) Sputtering Target is mainly used in the electronics and information industry, glass coating field, wear-resistant materials, high-temperature corrosion resistance, high-grade decorative goods, and other industries.
Packing of Cobalt Oxide (CoO) Sputtering Target
Standard Packing:
Typical bulk packaging includes palletized plastic 5 gallon/25 kg. pails, fiber and steel drums to 1 ton super sacks in full container (FCL) or truck load (T/L) quantities. Research and sample quantities and hygroscopic, oxidizing or other air sensitive materials may be packaged under argon or vacuum. Solutions are packaged in polypropylene, plastic or glass jars up to palletized 440 gallon liquid totes Special package is available on request.
ATTs’Cobalt Oxide (CoO) Sputtering Target is carefully handled to minimize damage during storage and transportation and to preserve the quality of our products in their original condition.
Chemical Identifiers
Linear Formula | CoO |
MDL Number | MFCD00016031 |
EC No. | 215-154-6 |
Beilstein/Reaxys No. | N/A |
Pubchem CID | 14786 |
IUPAC Name | Oxocobalt |
SMILES | [Co]=O |
InchI Identifier | InChI=1S/Co.O |
InchI Key | IVMYJDGYRUAWML-UHFFFAOYSA-N |