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Cobalt Tungsten (Co/W) Sputtering Target

Product Code : ST-Co/W-5N-Cu

A cobalt tungsten (Co/W) sputtering target is a high-quality material used in the sputtering process, which involves the release of particles from a solid target under bombardment by energetic ions. The Co/W sputtering target consists of a mixture of cobalt and tungsten, which are compressed using high-pressure machinery to create a uniform, high-density disk. The sputtering process helps to coat the target surface on a substrate, which then forms a thin film. The properties of the Co/W sputtering target make it ideal for use in the production of thin-film magnetic heads in the manufacturing of hard disk drives with improved magnetic and thermal stability. The typical Co/W sputtering target material is round, with a diameter of around 100 mm, although it can also come in other sizes to suit the user's specific application. The target's high density, high melting point, and thermal conductivity make it ideal for use in harsh environments where temperature and pressure are intense. These sputtering targets are designed to deliver excellent quality and performance in demanding applications.

Please contact us if you need customized services. We will contact you with the price and availability in 24 hours.

Product Product Code Purity Size Contact Us
Cobalt Tungsten (Co/W) Sputtering Target ST-Co/W-2N-Cu 99% Customize
Cobalt Tungsten (Co/W) Sputtering Target ST-Co/W-3N-Cu 99.9% Customize
Cobalt Tungsten (Co/W) Sputtering Target ST-Co/W-4N-Cu 99.99% Customize
Cobalt Tungsten (Co/W) Sputtering Target ST-Co/W-5N-Cu 99.999% Customize

Product Information

A cobalt tungsten (Co/W) sputtering target is a high-quality material used in the sputtering process, which involves the release of particles from a solid target under bombardment by energetic ions. The Co/W sputtering target consists of a mixture of cobalt and tungsten, which are compressed using high-pressure machinery to create a uniform, high-density disk. The sputtering process helps to coat the target surface on a substrate, which then forms a thin film. The properties of the Co/W sputtering target make it ideal for use in the production of thin-film magnetic heads in the manufacturing of hard disk drives with improved magnetic and thermal stability. The typical Co/W sputtering target material is round, with a diameter of around 100 mm, although it can also come in other sizes to suit the user's specific application. The target's high density, high melting point, and thermal conductivity make it ideal for use in harsh environments where temperature and pressure are intense. These sputtering targets are designed to deliver excellent quality and performance in demanding applications.

Chemical Formula:Co/W


Synonyms

Cobalt, compd. with tungsten, 62431-64-5, WCo



Cobalt Tungsten (Co/W) Sputtering Target Specification

Shape: Disc/Rectangular/Tube

Bonding: Unbonding/Bonding

Per your request or drawing

We can customized as required

Size:

Circular   Sputtering TargetsDiameter1.0”2.0”3.0”4.0”5.0”6.0”up to 21”
Rectangular   Sputtering TargetsWidth x Length5” x 12”5” x 15”5” x 20”5” x 22”6” x 20”
Thickness0.125”, 0.25”



Sputtering Targets Requirements

General requirements such as size, flatness, purity, impurity content, density, N/O/C/S, grain size, and defect control. Special requirements include surface roughness, resistance value, grain size uniformity, composition and tissue uniformity, magnetic conductivity, ultra-high density, ultra-fine grains, etc.


Application of Cobalt Tungsten (Co/W) Sputtering Target

Cobalt Tungsten (Co/W) Sputtering Target is mainly used in the electronics and information industry, glass coating field, wear-resistant materials, high-temperature corrosion resistance, high-grade decorative goods, and other industries.


Packing of  Cobalt Tungsten (Co/W) Sputtering Target

Standard Packing:

Typical bulk packaging includes palletized plastic 5 gallon/25 kg. pails, fiber and steel drums to 1 ton super sacks in full container (FCL) or truck load (T/L) quantities. Research and sample quantities and hygroscopic, oxidizing or other air sensitive materials may be packaged under argon or vacuum. Solutions are packaged in polypropylene, plastic or glass jars up to palletized 440 gallon liquid totes Special package is available on request.

ATTs’Cobalt Tungsten (Co/W) Sputtering Target is carefully handled to minimize damage during storage and transportation and to preserve the quality of our products in their original condition.



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