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Copper Chrome (Cu/Cr) Sputtering Target

Product Code : ST-Cu/Cr)-5N-Cu

Copper Chrome (Cu/Cr) sputtering target is a high-quality material used in the production of thin films and coatings in various industries such as semiconductor, electronics, and optics. It is composed of copper and chromium in a specific ratio and is specially designed to be used in a sputtering process, where atoms are ejected from the target material and deposited onto a substrate to create a thin film.

The Cu/Cr sputtering target is typically made using a powder metallurgy process, which involves blending high-purity copper and chromium powders and then compacting them into a solid form using high-pressure and high-temperature methods. The resulting material has excellent mechanical properties, such as high density, uniform microstructure, and good thermal conductivity, which facilitate efficient sputtering during the coating process.

The use of Cu/Cr sputtering targets in the production of thin films and coatings offers many advantages, such as high deposition rates, good adhesion, and excellent corrosion resistance. This makes it ideal for applications such as electrical contacts, reflective mirrors, and protective coatings. Additionally, the use of Cu/Cr sputtering targets has also been shown to improve the performance and reliability of devices such as solar cells and LEDs.


Please contact us if you need customized services. We will contact you with the price and availability in 24 hours.

Product Product Code Purity Size Contact Us
Copper Chrome (Cu/Cr) Sputtering Target ST-Cu/Cr)-2N-Cu 99% Customize
Copper Chrome (Cu/Cr) Sputtering Target ST-Cu/Cr)-3N-Cu 99.9% Customize
Copper Chrome (Cu/Cr) Sputtering Target ST-Cu/Cr)-4N-Cu 99.99% Customize
Copper Chrome (Cu/Cr) Sputtering Target ST-Cu/Cr)-5N-Cu 99.999% Customize

Product Information

Copper Chrome (Cu/Cr) sputtering target is a high-quality material used in the production of thin films and coatings in various industries such as semiconductor, electronics, and optics. It is composed of copper and chromium in a specific ratio and is specially designed to be used in a sputtering process, where atoms are ejected from the target material and deposited onto a substrate to create a thin film.

The Cu/Cr sputtering target is typically made using a powder metallurgy process, which involves blending high-purity copper and chromium powders and then compacting them into a solid form using high-pressure and high-temperature methods. The resulting material has excellent mechanical properties, such as high density, uniform microstructure, and good thermal conductivity, which facilitate efficient sputtering during the coating process.

The use of Cu/Cr sputtering targets in the production of thin films and coatings offers many advantages, such as high deposition rates, good adhesion, and excellent corrosion resistance. This makes it ideal for applications such as electrical contacts, reflective mirrors, and protective coatings. Additionally, the use of Cu/Cr sputtering targets has also been shown to improve the performance and reliability of devices such as solar cells and LEDs.

Chemical Formula:Cu/Cr


Synonyms

C182, C-182, C18200, Copper chrome, High copper wrought alloy, MIL-C-19311B, Cu:Cr 99:1, CAS 12506-91-1



Copper Chrome (Cu/Cr)  Sputtering Target Specification

Shape: Disc/Rectangular/Tube

Bonding: Unbonding/Bonding

Per your request or drawing

We can customized as required

Size:

Circular   Sputtering TargetsDiameter1.0”2.0”3.0”4.0”5.0”6.0”up to 21”
Rectangular   Sputtering TargetsWidth x Length5” x 12”5” x 15”5” x 20”5” x 22”6” x 20”
Thickness0.125”, 0.25”


Properties(Theoretical)

Compound FormulaCuCr
AppearanceTarget
Melting Point1070-1080 °C
Boiling PointN/A
Density8.89 g/cm3
Solubility in H2ON/A




Sputtering Targets Requirements

General requirements such as size, flatness, purity, impurity content, density, N/O/C/S, grain size, and defect control. Special requirements include surface roughness, resistance value, grain size uniformity, composition and tissue uniformity, magnetic conductivity, ultra-high density, ultra-fine grains, etc.


Application of Copper Chrome (Cu/Cr)   Sputtering Target

Copper Chrome (Cu/Cr)   Sputtering Target is mainly used in the electronics and information industry, glass coating field, wear-resistant materials, high-temperature corrosion resistance, high-grade decorative goods, and other industries.


Packing of  Copper Chrome (Cu/Cr) Sputtering Target

Standard Packing:

Typical bulk packaging includes palletized plastic 5 gallon/25 kg. pails, fiber and steel drums to 1 ton super sacks in full container (FCL) or truck load (T/L) quantities. Research and sample quantities and hygroscopic, oxidizing or other air sensitive materials may be packaged under argon or vacuum. Solutions are packaged in polypropylene, plastic or glass jars up to palletized 440 gallon liquid totes Special package is available on request.

ATTs’Copper Chrome (Cu/Cr)  Sputtering Target is carefully handled to minimize damage during storage and transportation and to preserve the quality of our products in their original condition.



Chemical Identifiers

Linear FormulaCu-Cr
MDL NumberN/A
EC No.N/A
Pubchem CID9833946
IUPAC Namechromium; copper
SMILES[Cr].[Cu]
InchI IdentifierInChI=1S/Cr.Cu
InchI KeyGXDVEXJTVGRLNW-UHFFFAOYSA-N



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