Product Code : ST-Dy-5N-Cu
Dysprosium (Dy) sputtering targets are used in the physical vapor deposition (PVD) process for depositing thin films of dysprosium onto a substrate. Dysprosium is a rare earth metal that has unique magnetic and physical properties, making it attractive for a range of applications, such as magnetic storage, data storage, and advanced optics.
The sputtering process involves dislodging atoms from the target surface using high energy plasma ions, which then deposit onto a substrate to form a thin film. Dysprosium sputtering targets are manufactured using powder metallurgy techniques, where high purity dysprosium metal is shaped into a solid target. The targets are available in various shapes and sizes, including round disks, rectangular tiles, and custom shapes.
Dysprosium sputtering targets are made of high-purity metal that ensures optimal performance and repeatability of the thin film deposition process. The targets have a high melting point, good thermal conductivity, and chemical stability, which make them suitable for high-temperature deposition processes.
Dysprosium sputtering targets are commonly used in the production of magnetic storage media and magnetic memory devices, as well as in the manufacture of optical devices such as laser diodes and optical coatings. They are also used in the production of magnetic sensors, motors, and generators.
Overall, dysprosium sputtering targets are highly valued in the semiconductor industry and other high-tech fields due to their unique properties and a wide range of applications.
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Product Information
Dysprosium (Dy) sputtering targets are used in the physical vapor deposition (PVD) process for depositing thin films of dysprosium onto a substrate. Dysprosium is a rare earth metal that has unique magnetic and physical properties, making it attractive for a range of applications, such as magnetic storage, data storage, and advanced optics.
The sputtering process involves dislodging atoms from the target surface using high energy plasma ions, which then deposit onto a substrate to form a thin film. Dysprosium sputtering targets are manufactured using powder metallurgy techniques, where high purity dysprosium metal is shaped into a solid target. The targets are available in various shapes and sizes, including round disks, rectangular tiles, and custom shapes.
Dysprosium sputtering targets are made of high-purity metal that ensures optimal performance and repeatability of the thin film deposition process. The targets have a high melting point, good thermal conductivity, and chemical stability, which make them suitable for high-temperature deposition processes.
Dysprosium sputtering targets are commonly used in the production of magnetic storage media and magnetic memory devices, as well as in the manufacture of optical devices such as laser diodes and optical coatings. They are also used in the production of magnetic sensors, motors, and generators.
Overall, dysprosium sputtering targets are highly valued in the semiconductor industry and other high-tech fields due to their unique properties and a wide range of applications.
Chemical Formula: Dy
CAS Number: 7429-91-6
Synonyms
Dysprosium sputter target, 45619, 45735, 45927, 46059
Dysprosium (Dy) Sputtering Target Specification
Shape: Disc/Rectangular/Tube
Bonding: Unbonding/Bonding
Per your request or drawing
We can customized as required
Size：
| Circular Sputtering Targets | Diameter | 1.0”2.0”3.0”4.0”5.0”6.0”up to 21” |
| Rectangular Sputtering Targets | Width x Length | 5” x 12”5” x 15”5” x 20”5” x 22”6” x 20” |
| Thickness | 0.125”, 0.25” | |
Properties（Theoretical）
| Molecular Weight | 162.5 |
| Appearance | Silvery |
| Melting Point | 1412°C |
| Boiling Point | 2562°C |
| Density | 8.550 gm/cc |
| Solubility in H2O | N/A |
| Electrical Resistivity | 57.0 microhm-cm @ 25°C |
| Electronegativity | N/A |
| Heat of Vaporization | 67 K-cal/gm atom at 2562 °C |
| Poisson's Ratio | 0.247 |
| Specific Heat | 0.0414 Cal/g/K @ 25°C |
| Tensile Strength | N/A |
| Thermal Conductivity | 0.107 W/cm/K @ 298.2 K |
| Thermal Expansion | (r.t.) (?, poly) 9.9 µm/(m·K) |
| Vickers Hardness | 540 MPa |
| Young's Modulus | (? form) 61.4 GPa |
Sputtering Targets Requirements
General requirements such as size, flatness, purity, impurity content, density, N/O/C/S, grain size, and defect control. Special requirements include surface roughness, resistance value, grain size uniformity, composition and tissue uniformity, magnetic conductivity, ultra-high density, ultra-fine grains, etc.
Application of Dysprosium (Dy) Sputtering Target
Dysprosium (Dy) Sputtering Target is mainly used in the electronics and information industry, glass coating field, wear-resistant materials, high-temperature corrosion resistance, high-grade decorative goods, and other industries.
Packing of Dysprosium (Dy) Sputtering Target
Standard Packing:
Typical bulk packaging includes palletized plastic 5 gallon/25 kg. pails, fiber and steel drums to 1 ton super sacks in full container (FCL) or truck load (T/L) quantities. Research and sample quantities and hygroscopic, oxidizing or other air sensitive materials may be packaged under argon or vacuum. Solutions are packaged in polypropylene, plastic or glass jars up to palletized 440 gallon liquid totes Special package is available on request.
ATTs’Dysprosium (Dy) Sputtering Target is carefully handled to minimize damage during storage and transportation and to preserve the quality of our products in their original condition.
Chemical Identifiers
| Linear Formula | Dy |
| MDL Number | MFCD00010982 |
| EC No. | 231-073-9 |
| Beilstein/Reaxys No. | N/A |
| Pubchem CID | 23912 |
| SMILES | [Dy] |
| InchI Identifier | InChI=1S/Dy |
| InchI Key | KBQHZAAAGSGFKK-UHFFFAOYSA-N |
