Product Code : ST-DyF3-5N-Cu
Dysprosium Fluoride (DyF3) Sputtering Target is a specialized thin film deposition material used in physical vapor deposition (PVD) processes. It is commonly employed in industries such as semiconductor, magnetic storage, and optical coating.
DyF3 sputtering targets are made of high-purity Dysprosium Fluoride (DyF3) material and are designed to be compatible with various sputtering systems, such as magnetron sputtering and RF sputtering. These targets are typically circular or rectangular in shape and are available in different sizes and dimensions.
Dysprosium fluoride, with the chemical formula DyF3, is a compound consisting of dysprosium and fluorine. It is known for its high melting point and excellent thermal stability, making it suitable for high-temperature sputtering processes. DyF3 targets are used to deposit thin films of dysprosium fluoride onto substrates, providing them with specific properties, such as magnetic, optical, or electrical characteristics.
Some key properties and advantages of DyF3 sputtering targets include high purity, good film adhesion, excellent uniformity, and controlled stoichiometry. These targets are engineered to have controlled composition and microstructure, ensuring consistent film properties across the deposited layers.
In summary, DyF3 sputtering targets are crucial for the production of advanced thin films and coatings, enabling the development of various electronic, magnetic, and optical devices.
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Product Information
Dysprosium Fluoride (DyF3) Sputtering Target is a specialized thin film deposition material used in physical vapor deposition (PVD) processes. It is commonly employed in industries such as semiconductor, magnetic storage, and optical coating.
DyF3 sputtering targets are made of high-purity Dysprosium Fluoride (DyF3) material and are designed to be compatible with various sputtering systems, such as magnetron sputtering and RF sputtering. These targets are typically circular or rectangular in shape and are available in different sizes and dimensions.
Dysprosium fluoride, with the chemical formula DyF3, is a compound consisting of dysprosium and fluorine. It is known for its high melting point and excellent thermal stability, making it suitable for high-temperature sputtering processes. DyF3 targets are used to deposit thin films of dysprosium fluoride onto substrates, providing them with specific properties, such as magnetic, optical, or electrical characteristics.
Some key properties and advantages of DyF3 sputtering targets include high purity, good film adhesion, excellent uniformity, and controlled stoichiometry. These targets are engineered to have controlled composition and microstructure, ensuring consistent film properties across the deposited layers.
In summary, DyF3 sputtering targets are crucial for the production of advanced thin films and coatings, enabling the development of various electronic, magnetic, and optical devices.
Chemical Formula: DyF3
CAS Number: 13569-80-7
Dysprosium Fluoride (DyF3) Sputtering Target Specification
Shape: Disc/Rectangular/Tube
Bonding: Unbonding/Bonding
Per your request or drawing
We can customized as required
Size:
Circular Sputtering Targets | Diameter | 1.0”2.0”3.0”4.0”5.0”6.0”up to 21” |
Rectangular Sputtering Targets | Width x Length | 5” x 12”5” x 15”5” x 20”5” x 22”6” x 20” |
Thickness | 0.125”, 0.25” |
Porperties(Theoretical)
Compound Formula | DyF3 |
Molecular Weight | 219.5 |
Appearance | White |
Melting Point | 1360 °C (2480 °F) |
Boiling Point | 2200 °C (3992 °F) |
Density | 5.948 g/cm3 |
Solubility in H2O | N/A |
Exact Mass | 220.924 g/mol |
Monoisotopic Mass | 220.92441 Da |
Sputtering Targets Requirements
General requirements such as size, flatness, purity, impurity content, density, N/O/C/S, grain size, and defect control. Special requirements include surface roughness, resistance value, grain size uniformity, composition and tissue uniformity, magnetic conductivity, ultra-high density, ultra-fine grains, etc.
Application of Dysprosium Fluoride (DyF3) Sputtering Target
Dysprosium Fluoride (DyF3) Sputtering Target is mainly used in the electronics and information industry, glass coating field, wear-resistant materials, high-temperature corrosion resistance, high-grade decorative goods, and other industries.
Packing of Dysprosium Fluoride (DyF3) Sputtering Target
Standard Packing:
Typical bulk packaging includes palletized plastic 5 gallon/25 kg. pails, fiber and steel drums to 1 ton super sacks in full container (FCL) or truck load (T/L) quantities. Research and sample quantities and hygroscopic, oxidizing or other air sensitive materials may be packaged under argon or vacuum. Solutions are packaged in polypropylene, plastic or glass jars up to palletized 440 gallon liquid totes Special package is available on request.
ATTs’Dysprosium Fluoride (DyF3) Sputtering Target is carefully handled to minimize damage during storage and transportation and to preserve the quality of our products in their original condition.
Chemical Identifier
Linear Formula | DyF3 |
MDL Number | MFCD00016071 |
EC No. | 236-992-9 |
Beilstein/Reaxys No. | N/A |
Pubchem CID | 83587 |
IUPAC Name | Trifluorodysprosium |
SMILES | F[Dy](F)F |
InchI Identifier | InChI=1S/Dy.3FH/h;3*1H/q+3;;;/p-3 |
InchI Key | FWQVINSGEXZQHB-UHFFFAOYSA-K |