Europium Oxide (Eu2O3) Sputtering Target

Product Information

Europium oxide (Eu2O3) sputtering target is a high-purity material used in thin film deposition applications. It is commonly used in the production of optical coatings, semiconductor devices, and electronic components.

Europium oxide is a white powder that is highly insoluble in water. It is stable under normal conditions and has a high melting point of 2,350 °C (4,262 °F). Europium oxide sputtering targets are typically made by using high-purity europium oxide powders that are pressed and sintered into the desired shape and size.

The sputtering process involves bombarding the target material with energetic ions, which knock atoms from the surface of the target and propel them onto a substrate to form a thin film. Europium oxide sputtering targets are used to deposit thin films of europium oxide onto various substrates.

Europium oxide thin films are used in a range of applications, including phosphors, fluorescent lamps, and scintillators. They are also used in magnetic storage media and in the fabrication of field-effect transistors (FETs).

Europium oxide sputtering targets are available in various shapes and sizes, including circular, rectangular, and custom shapes. They can be manufactured to meet specific customer requirements and are commonly used in research and development, as well as in large-scale production applications.

Chemical Formula:Eu2O3
CAS Number: 1308-96-9

Synonyms

Dieuropium trioxide, Europium(+3) cation; oxygen(-2) anion, Europia, Europium(3+) oxide, Europium sesquioxide, Europium trioxide

Europium Oxide (Eu2O3) Sputtering Target Specification

Shape: Disc/Rectangular/Tube

Bonding: Unbonding/Bonding

Per your request or drawing

We can customized as required

Size：

Properties（Theoretical）

Sputtering Targets Requirements

General requirements such as size, flatness, purity, impurity content, density, N/O/C/S, grain size, and defect control. Special requirements include surface roughness, resistance value, grain size uniformity, composition and tissue uniformity, magnetic conductivity, ultra-high density, ultra-fine grains, etc.

Application of Europium Oxide (Eu2O3) Sputtering Target

Europium Oxide (Eu2O3) Sputtering Target is mainly used in the electronics and information industry, glass coating field, wear-resistant materials, high-temperature corrosion resistance, high-grade decorative goods, and other industries.

Packing of Europium Oxide (Eu2O3) Sputtering Target

Standard Packing:

Typical bulk packaging includes palletized plastic 5 gallon/25 kg. pails, fiber and steel drums to 1 ton super sacks in full container (FCL) or truck load (T/L) quantities. Research and sample quantities and hygroscopic, oxidizing or other air sensitive materials may be packaged under argon or vacuum. Solutions are packaged in polypropylene, plastic or glass jars up to palletized 440 gallon liquid totes Special package is available on request.

ATTs’Europium Oxide (Eu2O3) Sputtering Target is carefully handled to minimize damage during storage and transportation and to preserve the quality of our products in their original condition.

Chemical Identifiers