Germanium (Ge) Sputtering Target

Product Code : ST-Ge-5N-Cu

Germanium sputtering targets are used in physical and industrial vapor deposition processes, often referred to as “sputtering.” Sputtering is a process that involves depositing thin layers of material onto a substrate. Germanium sputtering targets can be made of a variety of Germanium alloys, including pure Germanium, GeOx, and GeNi. Each target has a specific composition and properties, which will determine the properties of the final product. Germanium sputtering targets may be used to coat substrates such as glass, plastic, metal, or ceramic. Germanium sputtering targets are used in applications where high thermal and electrical conductivity, versatility, and optical properties are required. Common applications include coatings for photovoltaic cells, optical systems, and medical device components.

INQUIRY Next Products

Product Information

Chemical Formula: Ge
CAS Number: 7440-56-4

Synonyms

N/A

Germanium (Ge) Sputtering Target Specification

Shape: Disc/Rectangular/Tube

Bonding: Unbonding/Bonding

Per your request or drawing

We can customized as required

Size：

Circular Sputtering Targets	Diameter	1.0”2.0”3.0”4.0”5.0”6.0”up to 21”
Rectangular Sputtering Targets	Width x Length	5” x 12”5” x 15”5” x 20”5” x 22”6” x 20”
Thickness		0.125”, 0.25”

Properties（Theoretical）

Molecular Weight	72.61
Appearance	Black Lump
Melting Point	937.4°C
Boiling Point	2830°C
Density	5.323 g/cm³
Solubility in H2O	N/A
Electrical Resistivity	microhm-cm @ 20°C
Electronegativity	1.8 Paulings
Heat of Vaporization	68 K-cal/gm atom at 2830°C
Poisson's Ratio	0.26
Specific Heat	0.077 Cal/g/K @ 25°C
Tensile Strength	N/A
Thermal Conductivity	0.602 W/cm/K @ 302.93 K
Thermal Expansion	6.0 µm/(m·K)
Vickers Hardness	N/A
Young's Modulus	103 GPa

Sputtering Targets Requirements

General requirements such as size, flatness, purity, impurity content, density, N/O/C/S, grain size, and defect control. Special requirements include surface roughness, resistance value, grain size uniformity, composition and tissue uniformity, magnetic conductivity, ultra-high density, ultra-fine grains, etc.

Application of Germanium (Ge) Sputtering Target

Germanium (Ge) Sputtering Target is mainly used in the electronics and information industry, glass coating field, wear-resistant materials, high-temperature corrosion resistance, high-grade decorative goods, and other industries.

Packing of Germanium (Ge) Sputtering Target

Standard Packing:

Typical bulk packaging includes palletized plastic 5 gallon/25 kg. pails, fiber and steel drums to 1 ton super sacks in full container (FCL) or truck load (T/L) quantities. Research and sample quantities and hygroscopic, oxidizing or other air sensitive materials may be packaged under argon or vacuum. Solutions are packaged in polypropylene, plastic or glass jars up to palletized 440 gallon liquid totes Special package is available on request.

ATTs’Germanium (Ge) Sputtering Target is carefully handled to minimize damage during storage and transportation and to preserve the quality of our products in their original condition.

Chemical Identifiers

Linear Formula	Ge
MDL Number	MFCD00085310
EC No.	231-164-3
Beilstein/Reaxys No.	N/A
Pubchem CID	6326954
SMILES	[Ge]
InchI Identifier	InChI=1S/Ge
InchI Key	GNPVGFCGXDBREM-UHFFFAOYSA-N

Product	Product Code	Purity	Size	Contact Us
Germanium (Ge) Sputtering Target	ST-Ge-2N-Cu	99%	Customize
Germanium (Ge) Sputtering Target	ST-Ge-3N-Cu	99.9%	Customize
Germanium (Ge) Sputtering Target	ST-Ge-4N-Cu	99.99%	Customize
Germanium (Ge) Sputtering Target	ST-Ge-5N-Cu	99.999%	Customize