Product Code : ST-C-5N-Cu
Graphite (C) sputtering targets are widely used in physical vapor deposition (PVD) processes for depositing thin films of carbon onto a substrate. Graphite is a form of carbon that is highly conductive, chemically stable, and has a high melting point, making it ideal for a range of applications, such as in the manufacture of electronic devices, solar cells, and biomedical implants.
The sputtering process involves bombarding the target material with high-energy plasma ions, which dislodge atoms from the target surface and deposit them onto a substrate to form a thin film. Graphite sputtering targets are made of high-purity graphite materials and are available in various shapes and sizes, such as round disks, rectangular tiles, and custom shapes.
Graphite sputtering targets are highly durable and provide consistent, high-quality thin films in PVD processes. They have excellent thermal and electrical conductivity, good adhesion to substrates, and high hardness, which make them suitable for use in high-temperature and high-pressure environments.
Graphite sputtering targets are commonly used in the production of electronic devices, such as integrated circuits, solar cells, and flat panel displays. They are also used in the manufacture of biomedical implants and other medical devices due to their biocompatibility and chemical stability.
In addition, graphite sputtering targets are used in the production of coatings for cutting tools, which need to withstand high temperatures and pressures. They are also used in the aerospace industry for thermal protection and as a lubricating material in high-temperature environments.
Overall, graphite sputtering targets are highly valued in the semiconductor industry and other high-tech fields due to their unique properties and a wide range of applications.
Please contact us if you need customized services. We will contact you with the price and availability in 24 hours.
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Product Information
Graphite (C) sputtering targets are widely used in physical vapor deposition (PVD) processes for depositing thin films of carbon onto a substrate. Graphite is a form of carbon that is highly conductive, chemically stable, and has a high melting point, making it ideal for a range of applications, such as in the manufacture of electronic devices, solar cells, and biomedical implants.
The sputtering process involves bombarding the target material with high-energy plasma ions, which dislodge atoms from the target surface and deposit them onto a substrate to form a thin film. Graphite sputtering targets are made of high-purity graphite materials and are available in various shapes and sizes, such as round disks, rectangular tiles, and custom shapes.
Graphite sputtering targets are highly durable and provide consistent, high-quality thin films in PVD processes. They have excellent thermal and electrical conductivity, good adhesion to substrates, and high hardness, which make them suitable for use in high-temperature and high-pressure environments.
Graphite sputtering targets are commonly used in the production of electronic devices, such as integrated circuits, solar cells, and flat panel displays. They are also used in the manufacture of biomedical implants and other medical devices due to their biocompatibility and chemical stability.
In addition, graphite sputtering targets are used in the production of coatings for cutting tools, which need to withstand high temperatures and pressures. They are also used in the aerospace industry for thermal protection and as a lubricating material in high-temperature environments.
Overall, graphite sputtering targets are highly valued in the semiconductor industry and other high-tech fields due to their unique properties and a wide range of applications.
Chemical Formula: C
Synonyms
N/A
Graphite (C) Sputtering Target Specification
Shape: Disc/Rectangular/Tube
Bonding: Unbonding/Bonding
Per your request or drawing
We can customized as required
Size：
| Circular Sputtering Targets | Diameter | 1.0”2.0”3.0”4.0”5.0”6.0”up to 21” |
| Rectangular Sputtering Targets | Width x Length | 5” x 12”5” x 15”5” x 20”5” x 22”6” x 20” |
| Thickness | 0.125”, 0.25” | |
Sputtering Targets Requirements
General requirements such as size, flatness, purity, impurity content, density, N/O/C/S, grain size, and defect control. Special requirements include surface roughness, resistance value, grain size uniformity, composition and tissue uniformity, magnetic conductivity, ultra-high density, ultra-fine grains, etc.
Application of Graphite (C) Sputtering Target
Graphite (C) Sputtering Target is mainly used in the electronics and information industry, glass coating field, wear-resistant materials, high-temperature corrosion resistance, high-grade decorative goods, and other industries.
Packing of Graphite (C) Sputtering Target
Standard Packing:
Typical bulk packaging includes palletized plastic 5 gallon/25 kg. pails, fiber and steel drums to 1 ton super sacks in full container (FCL) or truck load (T/L) quantities. Research and sample quantities and hygroscopic, oxidizing or other air sensitive materials may be packaged under argon or vacuum. Solutions are packaged in polypropylene, plastic or glass jars up to palletized 440 gallon liquid totes Special package is available on request.
ATTs’Graphite (C) Sputtering Target is carefully handled to minimize damage during storage and transportation and to preserve the quality of our products in their original condition.
