Hafnium Sputtering Target, Hf Wholesaler

Hafnium Sputtering Target, Hf

Product Code : ST-Hf-5N-Cu

Hafnium (atomic symbol: Hf, atomic number: 72) is a Block D, Group 4, Period 6 element with an atomic weight of 178.49. The number of electrons in each of Hafnium's shells is 2, 8, 18, 32, 10, 2 and its electron configuration is [Xe] 4f14 5d2 6s2. The hafnium atom has a radius of 159 pm and a Van der Waals radius of 212 pm. Hafnium was predicted by Dmitri Mendeleev in 1869 but it was not until 1922 that it was first isolated Dirk Coster and George de Hevesy. In its elemental form, hafnium has a lustrous silvery-gray appearance. Hafnium does not exist as a free element in nature. It is found in zirconium compounds such as zircon. Hafnium is often a component of superalloys and circuits used in semiconductor device fabrication. Its name is derived from the Latin word Hafnia, meaning Copenhagen, where it was discovered.

Product Information

ATT provides high-quality Hafnium Sputtering Target for research and industry purposes at competitive prices. We can provide Hafnium Sputtering Target with different purity, size, and density according to your requirements.

Chemical Formula:Hf
CAS Number: 7440-58-6

Synonyms

N/A

Hafnium Sputtering Target Specification

Size：

Circular Sputtering Targets	Diameter	1.0”2.0”3.0”4.0”5.0”6.0”up to 21”
Rectangular Sputtering Targets	Width x Length	5” x 12”5” x 15”5” x 20”5” x 22”6” x 20”
Thickness		0.125”, 0.25”

Shape: Disc/Rectangular/Tube

Bonding: Unbonding/Bonding

Per your request or drawing

We can customized as required

Properties（Theoretical）

Molecular Weight	178.49
Appearance	Silver
Melting Point	2227°C
Boiling Point	4602°C
Density	13.31 g/cm³
Solubility in H2O	N/A
Electrical Resistivity	35.1 microhm-cm @ 25°C
Electronegativity	1.3 Paulings
Heat of Vaporization	155 K-Cal/gm atom at 4602°C
Poisson's Ratio	0.37
Specific Heat	0.035 Cal/g/K @ 25 °C
Tensile Strength	N/A
Thermal Conductivity	0.230 W/cm/K @ 298.2 K
Thermal Expansion	(25 °C) 5.9 µm·m^-1·K^-1
Vickers Hardness	1760 MPa
Young's Modulus	78 GPa

Sputtering Targets Requirements

General requirements such as size, flatness, purity, impurity content, density, N/O/C/S, grain size, and defect control. Special requirements include surface roughness, resistance value, grain size uniformity, composition and tissue uniformity, magnetic conductivity, ultra-high density, ultra-fine grains, etc.

Packing of Hafnium Sputtering Target

Standard Packing:

Typical bulk packaging includes palletized plastic 5 gallon/25 kg. pails, fiber and steel drums to 1 ton super sacks in full container (FCL) or truck load (T/L) quantities. Research and sample quantities and hygroscopic, oxidizing or other air sensitive materials may be packaged under argon or vacuum. Solutions are packaged in polypropylene, plastic or glass jars up to palletized 440 gallon liquid totes Special package is available on request.

ATTs’Hafnium Sputtering Target is carefully handled to minimize damage during storage and transportation and to preserve the quality of our products in their original condition.

Chemical Identifiers

Linear Formula	Hf
MDL Number	MFCD00011032
EC No.	231-166-4
Beilstein/Reaxys No.	N/A
Pubchem CID	23986
SMILES	[Hf]
InchI Identifier	InChI=1S/Hf
InchI Key	VBJZVLUMGGDVMO-UHFFFAOYSA-N

Product	Product Code	Purity	Size	Contact Us
Hafnium Sputtering Target, Hf	ST-Hf-2N-Cu	99%	Customize
Hafnium Sputtering Target, Hf	ST-Hf-3N-Cu	99.9%	Customize
Hafnium Sputtering Target, Hf	ST-Hf-4N-Cu	99.99%	Customize
Hafnium Sputtering Target, Hf	ST-Hf-5N-Cu	99.999%	Customize