Product Code : ST-Ho-5N-Cu
Holmium is an uncommon, artificial radioactive chemical element. It is a rare earth element and can be used for sputtering targets. It can be used to produce thin films of metal, alloys, oxides, and compounds. Its sputtering target is used in the production of gas sensors, magneto-optic components, ferro-electric thin films, and magnetic thin films. Holmium has a high sputter yield rate and is an excellent target for a number of coated materials. Holmium sputter target is not only cost-effective, but also has good electrical and thermal stability, and high corrosion resistance in demanding environments.
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Product Information
Holmium is an uncommon, artificial radioactive chemical element. It is a rare earth element and can be used for sputtering targets. It can be used to produce thin films of metal, alloys, oxides, and compounds. Its sputtering target is used in the production of gas sensors, magneto-optic components, ferro-electric thin films, and magnetic thin films. Holmium has a high sputter yield rate and is an excellent target for a number of coated materials. Holmium sputter target is not only cost-effective, but also has good electrical and thermal stability, and high corrosion resistance in demanding environments.
Chemical Formula:Ho
CAS Number: 7440-60-0
Synonyms
N/A
Holmium (Ho) Sputtering Target Specification
Shape: Disc/Rectangular/Tube
Bonding: Unbonding/Bonding
Per your request or drawing
We can customized as required
Size：
| Circular Sputtering Targets | Diameter | 1.0”2.0”3.0”4.0”5.0”6.0”up to 21” |
| Rectangular Sputtering Targets | Width x Length | 5” x 12”5” x 15”5” x 20”5” x 22”6” x 20” |
| Thickness | 0.125”, 0.25” | |
Properties（Theoretical）
| Molecular Weight | 164.93 |
| Appearance | Silvery |
| Melting Point | 1474 °C |
| Boiling Point | 2695°C |
| Density | 8.795 gm/cc |
| Solubility in H2O | N/A |
| Electrical Resistivity | 87.0 microhm-cm @ 25°C |
| Electronegativity | 1.2 Paulings |
| Heat of Vaporization | 67 K-Cal/gm atom at 2695°C |
| Poisson's Ratio | 0.231 |
| Specific Heat | 0.0393 Cal/g/ K @ 25 °C |
| Tensile Strength | N/A |
| Thermal Conductivity | 0.162 W/cm/ K @ 298.2 K |
| Thermal Expansion | (r.t.) (poly) 11.2 µm/(m·K) |
| Vickers Hardness | 481 MPa |
| Young's Modulus | 64.8 GPa |
Sputtering Targets Requirements
General requirements such as size, flatness, purity, impurity content, density, N/O/C/S, grain size, and defect control. Special requirements include surface roughness, resistance value, grain size uniformity, composition and tissue uniformity, magnetic conductivity, ultra-high density, ultra-fine grains, etc.
Application of Holmium (Ho) Sputtering Target
Holmium (Ho) Sputtering Target is mainly used in the electronics and information industry, glass coating field, wear-resistant materials, high-temperature corrosion resistance, high-grade decorative goods, and other industries.
Packing of Holmium (Ho) Sputtering Target
Standard Packing:
Typical bulk packaging includes palletized plastic 5 gallon/25 kg. pails, fiber and steel drums to 1 ton super sacks in full container (FCL) or truck load (T/L) quantities. Research and sample quantities and hygroscopic, oxidizing or other air sensitive materials may be packaged under argon or vacuum. Solutions are packaged in polypropylene, plastic or glass jars up to palletized 440 gallon liquid totes Special package is available on request.
ATTs’Holmium (Ho) Sputtering Target is carefully handled to minimize damage during storage and transportation and to preserve the quality of our products in their original condition.
Chemical Identifiers
| Linear Formula | Ho |
| MDL Number | MFCD00011049 |
| EC No. | 231-169-0 |
| Beilstein/Reaxys No. | N/A |
| Pubchem CID | 23988 |
| SMILES | [Ho] |
| InchI Identifier | InChI=1S/Ho |
| InchI Key | KJZYNXUDTRRSPN-UHFFFAOYSA-N |
