Indium (In) Sputtering Target Supplier US

Indium (In) Sputtering Target

Product Code : ST-In-7N-Cu

An indium (In) sputtering target is a material that is used in the process of sputtering, a deposition process used to deposit thin layers of material onto a substrate. The sputtering target consists of pure indium, or an alloy of indium with other elements, such as aluminum, bismuth, or gallium. It is typically formed into a pellet or disk, and bombarded with accelerated ions from an ion source to chip off small particles of the target material, which are then deposited onto the substrate surface. Indium sputtering targets are used in a wide variety of industrial and scientific applications, including fabricating optical thin film coatings, metal contacts for electronic components, and various components in the aerospace, automotive, and medical sectors.

Product Information

Chemical Formula: In
CAS Number: 7440-74-6

Synonyms

Indium sputter target, 40851, 40852, 40853

Indium (In) Sputtering Target Specification

Shape: Disc/Rectangular/Tube

Bonding: Unbonding/Bonding

Per your request or drawing

We can customized as required

Size：

Circular Sputtering Targets	Diameter	1.0”2.0”3.0”4.0”5.0”6.0”up to 21”
Rectangular Sputtering Targets	Width x Length	5” x 12”5” x 15”5” x 20”5” x 22”6” x 20”
Thickness		0.125”, 0.25”

Properties（Theoretical）

Molecular Weight	114.82
Appearance	Silvery
Melting Point	156.6 °C
Boiling Point	2080°C
Density	7310 kg/m³
Solubility in H2O	N/A
Electrical Resistivity	8.37 microhm-cm @ 20°C
Electronegativity	1.7 Paulings
Heat of Vaporization	53.7 K-Cal/gm atom at 2080 °C
Poisson's Ratio	0.4498
Specific Heat	0.056 Cal/g/K @ 25°C
Tensile Strength	N/A
Thermal Conductivity	0.818 W/cm/K @ 298.2 K
Thermal Expansion	(25 °C) 32.1 µm·m^-1·K^-1
Vickers Hardness	<10
Young's Modulus	11 GPa

Sputtering Targets Requirements

General requirements such as size, flatness, purity, impurity content, density, N/O/C/S, grain size, and defect control. Special requirements include surface roughness, resistance value, grain size uniformity, composition and tissue uniformity, magnetic conductivity, ultra-high density, ultra-fine grains, etc.

Application of Indium (In) Sputtering Target

Indium (In) Sputtering Target is mainly used in the electronics and information industry, glass coating field, wear-resistant materials, high-temperature corrosion resistance, high-grade decorative goods, and other industries.

Packing of Indium (In) Sputtering Target

Standard Packing:

Typical bulk packaging includes palletized plastic 5 gallon/25 kg. pails, fiber and steel drums to 1 ton super sacks in full container (FCL) or truck load (T/L) quantities. Research and sample quantities and hygroscopic, oxidizing or other air sensitive materials may be packaged under argon or vacuum. Solutions are packaged in polypropylene, plastic or glass jars up to palletized 440 gallon liquid totes Special package is available on request.

ATTs’Indium (In) Sputtering Target is carefully handled to minimize damage during storage and transportation and to preserve the quality of our products in their original condition.

Chemical Identifiers

Linear Formula	In
MDL Number	MFCD00134048
EC No.	231-180-0
Beilstein/Reaxys No.	N/A
Pubchem CID	N/A
SMILES	[In]
InchI Identifier	InChI=1S/In
InchI Key	APFVFJFRJDLVQX-UHFFFAOYSA-N

Product	Product Code	Purity	Size	Contact Us
Indium (In) Sputtering Target	ST-In-2N-Cu	99%	Customize
Indium (In) Sputtering Target	ST-In-4N-Cu	99.99%	Customize
Indium (In) Sputtering Target	ST-In-6N-Cu	99.9999%	Customize
Indium (In) Sputtering Target	ST-In-7N-Cu	99.99999%	Customize