Product Code : ST-In2O3-5N-Cu
Indium oxide (In2O3) sputtering target consists of 99.999% pure Indium Oxide powder, and offers superior adhesion, thermal shock and static fatigue resistance. It usually features a metallic In backing. This target can be used in applications such as sputtering display components, bio-laboratory tests, and other thin film processes. It also has excellent resistance to corrosion and high-temperature oxidation.
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Product Information
Indium oxide (In2O3) sputtering target consists of 99.999% pure Indium Oxide powder, and offers superior adhesion, thermal shock and static fatigue resistance. It usually features a metallic In backing. This target can be used in applications such as sputtering display components, bio-laboratory tests, and other thin film processes. It also has excellent resistance to corrosion and high-temperature oxidation.
Chemical Formula:In2O3
CAS Number: 1312-43-2
Synonyms
Indium (3+) oxide, India, Indium trioxide, Indium sesquioxide, Indium(III) oxide, Oxo-oxoindianyloxyindigane, Indium(3+); oxygen(2-), Diindium trioxide
Indium Oxide (In2O3) Sputtering Target Specification
Shape: Disc/Rectangular/Tube
Bonding: Unbonding/Bonding
Per your request or drawing
We can customized as required
Size：
| Circular Sputtering Targets | Diameter | 1.0”2.0”3.0”4.0”5.0”6.0”up to 21” |
| Rectangular Sputtering Targets | Width x Length | 5” x 12”5” x 15”5” x 20”5” x 22”6” x 20” |
| Thickness | 0.125”, 0.25” | |
Properties（Theoretical）
| Compound Formula | In2O3 |
| Molecular Weight | 277.64 |
| Appearance | Yellow Target |
| Melting Point | 1,910° C (3,470° F) |
| Boiling Point | N/A |
| Density | 7.18 g/cm3 |
| Solubility in H2O | N/A |
| Exact Mass | 277.793 g/mol |
| Monoisotopic Mass | 277.793 Da |
Sputtering Targets Requirements
General requirements such as size, flatness, purity, impurity content, density, N/O/C/S, grain size, and defect control. Special requirements include surface roughness, resistance value, grain size uniformity, composition and tissue uniformity, magnetic conductivity, ultra-high density, ultra-fine grains, etc.
Application of Indium Oxide (In2O3) Sputtering Target
Indium Oxide (In2O3) Sputtering Target is mainly used in the electronics and information industry, glass coating field, wear-resistant materials, high-temperature corrosion resistance, high-grade decorative goods, and other industries.
Packing of Indium Oxide (In2O3) Sputtering Target
Standard Packing:
Typical bulk packaging includes palletized plastic 5 gallon/25 kg. pails, fiber and steel drums to 1 ton super sacks in full container (FCL) or truck load (T/L) quantities. Research and sample quantities and hygroscopic, oxidizing or other air sensitive materials may be packaged under argon or vacuum. Solutions are packaged in polypropylene, plastic or glass jars up to palletized 440 gallon liquid totes Special package is available on request.
ATTs’Indium Oxide (In2O3) Sputtering Target is carefully handled to minimize damage during storage and transportation and to preserve the quality of our products in their original condition.
Chemical Identifiers
| Linear Formula | In2O3 |
| MDL Number | MFCD00011060 |
| EC No. | 215-193-9 |
| Beilstein/Reaxys No. | N/A |
| Pubchem CID | 5150906 |
| IUPAC Name | Oxo-oxoindianyloxyindigane |
| SMILES | [O-2].[O-2].[O-2].[In+3].[In+3] |
| InchI Identifier | InChI=1S/2In.3O/q2*+3;3*-2 |
| InchI Key | PJXISJQVUVHSOJ-UHFFFAOYSA-N |
