Product Code : ST-In2O3/ZnO-5N-Cu
Indium Zinc Oxide (In2O3/ZnO) sputtering target is a solid material that is used as a source of In2O3/ZnO in sputtering processes. It is commonly used to create highly uniform and high-quality thin films on various substrates for different applications, including solar cells, displays, and transparent conductive coatings.
The manufacturing process of In2O3/ZnO sputtering targets involves the preparation of a target powder mixture of indium oxide (In2O3) and zinc oxide (ZnO) through a process known as solid-state or sol-gel method. The powder mixture is then compacted and sintered to form a homogeneous, dense, and uniform sputtering target.
During sputtering, the target is bombarded with charged particles, causing atoms or ions of In2O3/ZnO to be ejected from its surface and deposited onto the substrate. The resulting thin film is highly controllable with excellent uniformity and high reproducibility.
In2O3/ZnO sputtering targets are widely used for various applications requiring a highly transparent and conductive thin film, such as transparent electrodes, anti-reflection coatings, and touch panels. Due to their unique optical and electrical properties, In2O3/ZnO thin films offer excellent performance characteristics, including high electrical conductivity, high transparency, and stability.
In2O3/ZnO sputtering targets are becoming increasingly popular in the electronic and photovoltaic industries for their superior performance characteristics. There is a growing demand for In2O3/ZnO sputtering targets due to their potential use in various applications, including flexible electronics, solar cells, and displays, among others.
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Product Information
Indium Zinc Oxide (In2O3/ZnO) sputtering target is a solid material that is used as a source of In2O3/ZnO in sputtering processes. It is commonly used to create highly uniform and high-quality thin films on various substrates for different applications, including solar cells, displays, and transparent conductive coatings.
The manufacturing process of In2O3/ZnO sputtering targets involves the preparation of a target powder mixture of indium oxide (In2O3) and zinc oxide (ZnO) through a process known as solid-state or sol-gel method. The powder mixture is then compacted and sintered to form a homogeneous, dense, and uniform sputtering target.
During sputtering, the target is bombarded with charged particles, causing atoms or ions of In2O3/ZnO to be ejected from its surface and deposited onto the substrate. The resulting thin film is highly controllable with excellent uniformity and high reproducibility.
In2O3/ZnO sputtering targets are widely used for various applications requiring a highly transparent and conductive thin film, such as transparent electrodes, anti-reflection coatings, and touch panels. Due to their unique optical and electrical properties, In2O3/ZnO thin films offer excellent performance characteristics, including high electrical conductivity, high transparency, and stability.
In2O3/ZnO sputtering targets are becoming increasingly popular in the electronic and photovoltaic industries for their superior performance characteristics. There is a growing demand for In2O3/ZnO sputtering targets due to their potential use in various applications, including flexible electronics, solar cells, and displays, among others.
Chemical Formula: In2O3/ZnO
CAS Number: 117944-65-7
Synonyms
IZO, InZnO, a-IZO, Amorphous Indium-Zinc-Oxide, In2Zn16O19, 694458-90, In2O3/ ZnO, 90/10 wt%
Indium Zinc Oxide (In2O3/ZnO) Sputtering Target Specification
Shape: Disc/Rectangular/Tube
Bonding: Unbonding/Bonding
Per your request or drawing
We can customized as required
Size：
| Circular Sputtering Targets | Diameter | 1.0”2.0”3.0”4.0”5.0”6.0”up to 21” |
| Rectangular Sputtering Targets | Width x Length | 5” x 12”5” x 15”5” x 20”5” x 22”6” x 20” |
| Thickness | 0.125”, 0.25” | |
Properties（Theoretical）
| Compound Formula | InZnO |
| Molecular Weight | Varies by composition |
| Appearance | Target |
| Melting Point | 1900-1920 °C |
| Boiling Point | N/A |
| Density | N/A |
| Solubility in H2O | N/A |
Sputtering Targets Requirements
General requirements such as size, flatness, purity, impurity content, density, N/O/C/S, grain size, and defect control. Special requirements include surface roughness, resistance value, grain size uniformity, composition and tissue uniformity, magnetic conductivity, ultra-high density, ultra-fine grains, etc.
Application of Indium Zinc Oxide (In2O3/ZnO) Sputtering Target
Indium Zinc Oxide (In2O3/ZnO) Sputtering Target is mainly used in the electronics and information industry, glass coating field, wear-resistant materials, high-temperature corrosion resistance, high-grade decorative goods, and other industries.
Packing of Indium Zinc Oxide (In2O3/ZnO) Sputtering Target
Standard Packing:
Typical bulk packaging includes palletized plastic 5 gallon/25 kg. pails, fiber and steel drums to 1 ton super sacks in full container (FCL) or truck load (T/L) quantities. Research and sample quantities and hygroscopic, oxidizing or other air sensitive materials may be packaged under argon or vacuum. Solutions are packaged in polypropylene, plastic or glass jars up to palletized 440 gallon liquid totes Special package is available on request.
ATTs’Indium Zinc Oxide (In2O3/ZnO) Sputtering Target is carefully handled to minimize damage during storage and transportation and to preserve the quality of our products in their original condition.
Chemical Identifiers
| Linear Formula | In2O3 / ZnO |
| MDL Number | N/A |
| EC No. | N/A |
| Pubchem CID | 92026946 |
