Iridium (Ir) Sputtering Target

Product Information

Iridium (Ir) sputtering targets are used in physical vapor deposition (PVD) processes for depositing thin films of iridium onto a substrate. Iridium is a rare and dense transition metal that has unique mechanical, thermal, electrical, and optical properties, making it attractive for a range of applications in the fields of electronics, optics, catalysis, and high-temperature materials.

The sputtering process involves bombarding the target material with high-energy ions, which dislodge atoms from the target surface and deposit them onto a substrate to form a thin film. Iridium sputtering targets are made of high-purity iridium metal and are available in various shapes and sizes, such as round disks, rectangular tiles, and custom shapes.

Iridium sputtering targets are highly durable and provide consistent, high-quality thin films in PVD processes. They have a high melting point, excellent thermal and electrical conductivity, and chemical stability, which make them suitable for use in high-temperature and corrosive environments.

Iridium sputtering targets are commonly used in the production of electronic devices, such as gate electrodes, conductive thin films, and interconnects. They are also used in the manufacture of optical products, such as mirrors, coatings, and lenses, due to their high reflectivity and optical properties.

In addition, iridium sputtering targets are used as catalysts in a range of chemical reactions, such as the production of fertilizers, pharmaceuticals, and petrochemical products. They are also used in the production of high-temperature materials, such as alloys, superalloys, and heat-resistant ceramics.

Overall, iridium sputtering targets are highly valued in many high-tech industries due to their unique properties, including excellent mechanical, thermal, electrical, and optical properties, and their wide range of applications.

Chemical Formula: Ir
CAS Number:  7439-88-5

Synonyms

N/A

Iridium (Ir) Sputtering Target Specification

Shape: Disc/Rectangular/Tube

Bonding: Unbonding/Bonding

Per your request or drawing

We can customized as required

Size：

Properties（Theoretical）

Sputtering Targets Requirements

General requirements such as size, flatness, purity, impurity content, density, N/O/C/S, grain size, and defect control. Special requirements include surface roughness, resistance value, grain size uniformity, composition and tissue uniformity, magnetic conductivity, ultra-high density, ultra-fine grains, etc.

Application of Iridium (Ir)  Sputtering Target

Iridium (Ir)  Sputtering Target is mainly used in the electronics and information industry, glass coating field, wear-resistant materials, high-temperature corrosion resistance, high-grade decorative goods, and other industries.

Packing of  Iridium (Ir)  Sputtering Target

Standard Packing:

Typical bulk packaging includes palletized plastic 5 gallon/25 kg. pails, fiber and steel drums to 1 ton super sacks in full container (FCL) or truck load (T/L) quantities. Research and sample quantities and hygroscopic, oxidizing or other air sensitive materials may be packaged under argon or vacuum. Solutions are packaged in polypropylene, plastic or glass jars up to palletized 440 gallon liquid totes Special package is available on request.

ATTs’Iridium (Ir)  Sputtering Target is carefully handled to minimize damage during storage and transportation and to preserve the quality of our products in their original condition.

Chemical Identifiers