Product Code : ST-Fe/Al-5N-Cu
Iron aluminum (Fe/Al) sputtering target is a composite material made up of iron (Fe) and aluminum (Al), used to deposit films in various electronic, optical, and aerospace industries. It is an effective material with excellent mechanical and thermal properties and is used for sputtering various thin film structures for different applications.
Certain applications of Fe/Al sputtering targets involve the manufacturing of electrical contacts and electronic components, as well as coatings for aerospace parts and thermal barrier applications. Thin films of Fe/Al are also used for magnetic materials and coatings in the automotive industry and in other mechanical lubrication applications.
Fe/Al sputtering targets are manufactured using a powder metallurgy process. Iron and aluminum powders are mixed in the desired ratio and then subjected to high-pressure compaction. Then the compacted powders are sintered at high temperatures to form a dense, uniform target, which is then machined to the desired shape and size that matches the sputtering system.
Fe/Al sputtering targets come in various shapes and sizes, including rectangular, circular, and custom-made shapes. Target thickness can go up to a few millimeters. Additionally, different bonding techniques are used to attach the target to the backing plate of the magnetron. These techniques include diffusion bonding and mechanical clamping.
In summary, iron aluminum (Fe/Al) sputtering targets are effective materials used to deposit thin films in various electronic, optical, and aerospace applications. Their mechanical and thermal properties make them suitable for use in manufacturing electrical contacts and electronic components, coatings for aerospace parts and thermal barrier applications, as well as other applications such as magnetic materials and coatings in the automotive industry.
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Product Information
Iron aluminum (Fe/Al) sputtering target is a composite material made up of iron (Fe) and aluminum (Al), used to deposit films in various electronic, optical, and aerospace industries. It is an effective material with excellent mechanical and thermal properties and is used for sputtering various thin film structures for different applications.
Certain applications of Fe/Al sputtering targets involve the manufacturing of electrical contacts and electronic components, as well as coatings for aerospace parts and thermal barrier applications. Thin films of Fe/Al are also used for magnetic materials and coatings in the automotive industry and in other mechanical lubrication applications.
Fe/Al sputtering targets are manufactured using a powder metallurgy process. Iron and aluminum powders are mixed in the desired ratio and then subjected to high-pressure compaction. Then the compacted powders are sintered at high temperatures to form a dense, uniform target, which is then machined to the desired shape and size that matches the sputtering system.
Fe/Al sputtering targets come in various shapes and sizes, including rectangular, circular, and custom-made shapes. Target thickness can go up to a few millimeters. Additionally, different bonding techniques are used to attach the target to the backing plate of the magnetron. These techniques include diffusion bonding and mechanical clamping.
In summary, iron aluminum (Fe/Al) sputtering targets are effective materials used to deposit thin films in various electronic, optical, and aerospace applications. Their mechanical and thermal properties make them suitable for use in manufacturing electrical contacts and electronic components, coatings for aerospace parts and thermal barrier applications, as well as other applications such as magnetic materials and coatings in the automotive industry.
Chemical Formula:Fe/Al
Iron Aluminum (Fe/Al) Sputtering Target Specification
Shape: Disc/Rectangular/Tube
Bonding: Unbonding/Bonding
Per your request or drawing
We can customized as required
Size：
| Circular Sputtering Targets | Diameter | 1.0”2.0”3.0”4.0”5.0”6.0”up to 21” |
| Rectangular Sputtering Targets | Width x Length | 5” x 12”5” x 15”5” x 20”5” x 22”6” x 20” |
| Thickness | 0.125”, 0.25” | |
Sputtering Targets Requirements
General requirements such as size, flatness, purity, impurity content, density, N/O/C/S, grain size, and defect control. Special requirements include surface roughness, resistance value, grain size uniformity, composition and tissue uniformity, magnetic conductivity, ultra-high density, ultra-fine grains, etc.
Application of Iron Aluminum (Fe/Al)Sputtering Target
Iron Aluminum (Fe/Al) Sputtering Target is mainly used in the electronics and information industry, glass coating field, wear-resistant materials, high-temperature corrosion resistance, high-grade decorative goods, and other industries.
Packing of Iron Aluminum (Fe/Al) Sputtering Target
Standard Packing:
Typical bulk packaging includes palletized plastic 5 gallon/25 kg. pails, fiber and steel drums to 1 ton super sacks in full container (FCL) or truck load (T/L) quantities. Research and sample quantities and hygroscopic, oxidizing or other air sensitive materials may be packaged under argon or vacuum. Solutions are packaged in polypropylene, plastic or glass jars up to palletized 440 gallon liquid totes Special package is available on request.
ATTs’Iron Aluminum (Fe/Al) Sputtering Target is carefully handled to minimize damage during storage and transportation and to preserve the quality of our products in their original condition.
