Iron Chromium (Fe/Cr) Sputtering Target

Product Information

Iron chromium (Fe/Cr) sputtering target is a composite material used to deposit thin films in various applications, including electronics, optics, and mechanical engineering. The combination of iron and chromium provides excellent mechanical and chemical properties and enhances the anti-corrosive properties of thin films.

One of the primary applications of Fe/Cr sputtering targets is in the production of magnetic thin films for use in hard disk drives, spintronics, and data storage applications. Additionally, Fe/Cr sputtering targets are used to produce protective coatings for mechanical components, such as cutting and drilling tools, to improve their wear resistance and hardness.

Iron chromium (Fe/Cr) sputtering targets are typically produced using the powder metallurgy process. Iron and chromium powders are mixed in a specific ratio and then compacted under high pressure to form a dense and uniform solid solution mixture. The powder compact is then sintered under high temperature and vacuum conditions to form a homogenous target material. The final target is then machined into the desired shape and size according to the requirements of the sputtering system.

Frequently available Fe/Cr sputtering targets have various shapes and sizes, including rectangular, circular, and custom-made shapes. Additionally, the targets are available in bonded or unbonded form, depending on the required sputtering system.

In conclusion, iron chromium (Fe/Cr) sputtering targets are fundamental materials used for sputtering various thin film structures required in numerous electronic, optical, and mechanical engineering applications. The combination of iron and chromium provides exceptional mechanical and chemical properties, making them useful in producing anti-corrosive and hard-wearing thin films.

Chemical Formula:Fe/Cr

CAS Number:  12052-89-0

Synonyms

Iron-chromium, FeCr, Fe-Cr, Ferrochrome, Ferro chrome, Astaloy CrA, Fecralloy, CAS 12018-28-9 (FeCr3), CAS 12017-85-5 (Fe3Cr), CAS 61839-69-8 (Fe2Cr3), CAS 874299-55-5 (FeCr7)

Iron Chromium (Fe/Cr)  Sputtering Target Specification

Shape: Disc/Rectangular/Tube

Bonding: Unbonding/Bonding

Per your request or drawing

We can customized as required

Size：

Properties（Theoretical）

Sputtering Targets Requirements

General requirements such as size, flatness, purity, impurity content, density, N/O/C/S, grain size, and defect control. Special requirements include surface roughness, resistance value, grain size uniformity, composition and tissue uniformity, magnetic conductivity, ultra-high density, ultra-fine grains, etc.

Application of Iron Chromium (Fe/Cr) Sputtering Target

Iron Chromium (Fe/Cr)   Sputtering Target is mainly used in the electronics and information industry, glass coating field, wear-resistant materials, high-temperature corrosion resistance, high-grade decorative goods, and other industries.

Packing of Iron Chromium (Fe/Cr) Sputtering Target

Standard Packing:

Typical bulk packaging includes palletized plastic 5 gallon/25 kg. pails, fiber and steel drums to 1 ton super sacks in full container (FCL) or truck load (T/L) quantities. Research and sample quantities and hygroscopic, oxidizing or other air sensitive materials may be packaged under argon or vacuum. Solutions are packaged in polypropylene, plastic or glass jars up to palletized 440 gallon liquid totes Special package is available on request.

ATTs’Iron Chromium (Fe/Cr)  Sputtering Target is carefully handled to minimize damage during storage and transportation and to preserve the quality of our products in their original condition.

Chemical Identifier